公开(公告)号：US20080311309A1

公开(公告)日：2008-12-18

申请号：US11629195

申请日：2005-06-17

Applicant: Andreas Daiss ,  Erich Beck ,  Manfred Biehler

Inventor： Andreas Daiss ,  Erich Beck ,  Manfred Biehler

IPC: B05D3/06 ,  B01J19/12

CPC classification number: G21K5/02 ,  B05D3/0254 ,  B05D3/0486 ,  B05D3/066 ,  B05D3/067 ,  B05D3/068

Abstract: The invention relates to an apparatus and a method of producing molding materials and coatings on substrates by curing radiation-curable materials under an inert gas atmosphere by exposure to high-energy radiation.

Abstract translation: 本发明涉及通过暴露于高能量辐射下在惰性气体气氛下固化可辐射固化材料的方法来在基底上生产模塑材料和涂层的装置和方法。

公开(公告)号：US07431959B1

公开(公告)日：2008-10-07

申请号：US10631116

申请日：2003-07-31

Applicant: Houdin Dehnad

Inventor： Houdin Dehnad

IPC: B05D3/00

CPC classification number: B05D3/14 ,  B05D1/002 ,  B05D1/02 ,  B05D3/0254 ,  B05D3/06 ,  B05D3/068 ,  Y10T428/31678

Abstract: A method and system for modifying a drug eluting polymeric substrate for an implantable device, such as a stent, is disclosed.

Abstract translation: 公开了用于修改可植入装置（例如支架）的药物洗脱聚合物基底的方法和系统。

公开(公告)号：US20080241478A1

公开(公告)日：2008-10-02

申请号：US12034130

申请日：2008-02-20

Applicant: Darryl J Costin ,  Darryl Costin ,  Richard C. Fishburn

Inventor： Darryl J Costin ,  Darryl Costin ,  Richard C. Fishburn

IPC: B32B3/10 ,  B05D3/06 ,  B44C1/22

CPC classification number: B44F9/02 ,  B05D3/068 ,  B05D5/06 ,  B05D7/02 ,  B05D7/06 ,  B05D7/14 ,  B05D7/52 ,  B41M5/24 ,  B44C1/228 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/24851

Abstract: A painted surface is processed by a laser beam to remove at least one layer of paint. The surface that is exposed may be the raw substrate material, e.g., wood or wood laminate, or may be another painted surface. The laser may engrave a pattern, e.g. a wood grain pattern.

Abstract translation: 涂漆的表面由激光束处理以去除至少一层油漆。 暴露的表面可以是原始基材，例如木材或木材层压材料，或者可以是另一个涂漆表面。 激光器可以雕刻图案，例如 木纹图案。

公开(公告)号：US20080081131A1

公开(公告)日：2008-04-03

申请号：US11865152

申请日：2007-10-01

Applicant: Makoto MURAMATSU

Inventor： Makoto MURAMATSU

IPC: B05D3/06 ,  C08F30/08

CPC classification number: C09D183/04 ,  B05D3/067 ,  B05D3/068 ,  C08L53/00 ,  C09D4/00 ,  C08L2666/02

Abstract: A production method of an insulating film includes (1) a process of applying, onto a substrate, a film forming composition comprising a compound having a cage structure to form a film and then drying the film; and (2) a process of irradiating the film with an electron beam or an electromagnetic wave having a wavelength greater than 200 nm.

Abstract translation: 绝缘膜的制造方法包括：（1）在基材上涂布包含具有保持架结构的化合物的成膜组合物以形成膜然后干燥所述膜的方法; 和（2）用电子束或波长大于200nm的电磁波照射薄膜的方法。

公开(公告)号：US20080076850A1

公开(公告)日：2008-03-27

申请号：US11853325

申请日：2007-09-11

Applicant: Akira ASANO

Inventor： Akira ASANO

IPC: C08F2/46

CPC classification number: H01L21/02118 ,  B05D3/0209 ,  B05D3/0254 ,  B05D3/067 ,  B05D3/068 ,  C08F2/46 ,  C08J3/28 ,  H01L21/02345 ,  H01L21/02348 ,  H01L21/02351 ,  H01L21/31058 ,  H01L21/312 ,  H01L21/76801

Abstract: A production method of an insulating film includes a process of applying a film forming composition to form a film; and a process of irradiating the film with at least two kinds of high energy rays to cure the film.

Abstract translation: 绝缘膜的制造方法包括施加成膜组合物以形成膜的方法; 以及用至少两种高能射线照射薄膜以使薄膜固化的工艺。

公开(公告)号：US07288309B2

公开(公告)日：2007-10-30

申请号：US10949898

申请日：2004-09-24

Applicant: Robert J. Fleming ,  Joseph M. McGrath ,  Christopher S. Lyons

Inventor： Robert J. Fleming ,  Joseph M. McGrath ,  Christopher S. Lyons

IPC: B32B3/30

CPC classification number: B05D1/60 ,  B05D3/067 ,  B05D3/068 ,  B05D3/147 ,  Y10T428/24355 ,  Y10T428/24364 ,  Y10T428/2438 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/24529 ,  Y10T428/25 ,  Y10T428/252

Abstract: A method of making a polymer coating on a microstructured substrate. The method may be performed by vaporizing a liquid monomer or other pre-polymer composition and condensing the vaporized material onto a microstructured substrate, followed by curing. The resulting article may possess a coating that preserves the underlying microstructural feature profile. Such a profile-preserving polymer coating can be used to change or enhance the surface properties of the microstructured substrate while maintaining the function of the structure.

Abstract translation: 在微结构化基底上制备聚合物涂层的方法。 该方法可以通过蒸发液体单体或其它预聚物组合物并将蒸发的材料冷凝到微结构化基材上，然后固化来进行。 所得到的制品可以具有保留下面的微结构特征轮廓的涂层。 这种保留轮廓的聚合物涂层可以用于改变或增强微结构化基材的表面性质，同时保持结构的功能。

公开(公告)号：US20070200147A1

公开(公告)日：2007-08-30

申请号：US11659282

申请日：2005-07-28

Applicant: Shigeaki Ohtani ,  Makoto Satoh ,  Toshihiko Maekawa ,  Mayumi Suzuki ,  Yuuichi Fukushige

Inventor： Shigeaki Ohtani ,  Makoto Satoh ,  Toshihiko Maekawa ,  Mayumi Suzuki ,  Yuuichi Fukushige

IPC: H01L27/10

CPC classification number: B29D11/0073 ,  B05C5/0254 ,  B05C9/06 ,  B05C9/14 ,  B05D3/0486 ,  B05D3/067 ,  B05D3/068 ,  B05D5/083 ,  B05D7/04 ,  B05D2201/02 ,  B05D2252/02 ,  B29C43/222 ,  B29C55/06 ,  B29K2001/00 ,  B29K2001/12 ,  B29K2029/04 ,  B29K2995/0034 ,  B29L2007/008 ,  B29L2011/00 ,  G02B1/111 ,  G02B5/3025

Abstract: A method for manufacturing an optical film comprising a transparent substrate and at least one functional layer on or above the transparent substrate, wherein said at least one functional layer to be laminated on the transparent substrate is formed by a layer-forming method comprising the following steps (1) and (2): (1) step of applying a coated layer on the transparent substrate, and (2) step of curing the coated layer by irradiating ionizing radiation in an oxygen environment in which the oxygen concentration is lower than an atmospheric oxygen concentration.

Abstract translation: 一种用于制造包括透明基板和在透明基板上或上方的至少一个功能层的光学膜的方法，其中要层压在透明基板上的所述至少一个功能层通过层形成方法形成，所述层形成方法包括以下步骤 （1）和（2）：（1）在透明基板上涂覆涂层的步骤，（2）通过在氧气浓度低于大气压的氧环境中照射电离辐射来固化涂层的步骤 氧气浓度。

公开(公告)号：US20070154703A1

公开(公告)日：2007-07-05

申请号：US11611301

申请日：2006-12-15

Applicant: Clinton P. Waller ,  Douglas Eugene Weiss

Inventor： Clinton P. Waller ,  Douglas Eugene Weiss

IPC: B32B27/00

CPC classification number: B32B5/24 ,  B01D39/1623 ,  B01D39/1692 ,  B01D67/0018 ,  B01D67/0093 ,  B01D71/34 ,  B01D2239/0414 ,  B01D2239/0478 ,  B01D2239/10 ,  B01D2323/02 ,  B01D2323/30 ,  B01D2323/34 ,  B05D1/42 ,  B05D3/068 ,  B05D7/04 ,  B05D7/52 ,  B05D7/56 ,  B32B5/022 ,  B32B7/06 ,  B32B27/08 ,  B32B27/12 ,  B32B27/304 ,  B32B27/36 ,  B32B2262/0223 ,  B32B2262/0238 ,  B32B2307/728 ,  C08J7/16 ,  C08J7/18 ,  C08J9/405 ,  C08J2327/16 ,  D01D5/0985 ,  D01F6/12 ,  D01F6/30 ,  D01F6/34 ,  D04H1/56 ,  D06M14/02 ,  D06M14/08 ,  D06M14/10 ,  D06M14/18 ,  D06M14/20 ,  D06M14/26 ,  D06M14/28 ,  Y10T428/249987 ,  Y10T428/249991 ,  Y10T428/249992 ,  Y10T428/249993

Abstract: Functionalized substrates, methods of making functionalized substrates, and methods of using functionalized substrates are disclosed.

Abstract translation: 公开了功能化基材，制备官能化基材的方法和使用官能化基材的方法。

公开(公告)号：US20070109333A1

公开(公告)日：2007-05-17

申请号：US10586102

申请日：2005-01-24

Applicant: Francois Coeuret ,  Geraldine Rames-Langlade ,  Andrea Spizzica

Inventor： Francois Coeuret ,  Geraldine Rames-Langlade ,  Andrea Spizzica

IPC: B41J2/01

CPC classification number: F26B21/14 ,  B05D3/0486 ,  B05D3/067 ,  B05D3/068 ,  F26B3/28 ,  F26B13/005

Abstract: The invention concerns an installation wherein is performed a crosslinking operation for a coating such as an ink or a varnish through ultraviolet radiation or electronic beam, in the presence of a gas mixture with controlled oxygen residual content. The installation comprises a chamber including one or more UV lamps or a source of accelerated electrons, required for performing the crosslinking operation, and is characterized in that it comprises an input device adjacent the chamber comprising at least the following three components, viewed successively by the product moving to be treated: a labyrinth system, means for injecting an inert gas forming a gas knife and a channel.

Abstract translation: 本发明涉及一种在具有受控氧残留含量的气体混合物的存在下通过紫外线辐射或电子束对涂层例如油墨或清漆进行交联操作的装置。 该装置包括一个包括一个或多个UV灯或加速电子源的室，用于进行交联操作，其特征在于，其包括邻近室的输入装置，该输入装置至少包括以下三个组件， 移动待处理的产品：迷宫系统，用于注入形成气刀和通道的惰性气体的装置。

公开(公告)号：US20070104957A1

公开(公告)日：2007-05-10

申请号：US10583328

申请日：2004-12-16

Applicant: Wojciech Wilczak

Inventor： Wojciech Wilczak

IPC: B05D7/00 ,  B32B27/20 ,  B32B27/38 ,  B32B27/30

CPC classification number: B05D7/542 ,  B05D1/36 ,  B05D1/62 ,  B05D3/067 ,  B05D3/068 ,  B05D7/546 ,  B41M1/04 ,  B41M1/06 ,  B41M1/10 ,  B41M5/52 ,  B41M5/5254 ,  B41M7/0081 ,  C08J7/18 ,  D06P5/2011 ,  Y10T428/31511 ,  Y10T428/31536 ,  Y10T428/31935

Abstract: A plasma polymer having residual functional (reactive) groups is formed on a substrate, a radiation curable coating composition is applied to the plasma polymer-coated substrate, and the radiation curable composition is radiation cured. The radiation curable composition contains a component which forms a polymer with the reactive groups of the plasma polymer, anchoring the cured composition to the plasma polymer which is anchored to the substrate.

Abstract translation: 在基板上形成具有残留功能（反应性）基团的等离子体聚合物，将可辐射固化涂料组合物施加到等离子体聚合物涂覆的基材上，并且辐射固化组合物被辐射固化。 可辐射固化组合物含有与等离子体聚合物的反应性基团形成聚合物的组分，将固化的组合物锚定到锚定于基底上的等离子体聚合物。