公开(公告)号：US20190033231A1

公开(公告)日：2019-01-31

申请号：US16050319

申请日：2018-07-31

Applicant: United States of America as represented by the Administrator of NASA

Inventor： John W. Connell ,  Frank L. Palmieri ,  William T. Yost ,  John W. Hopkins ,  Rodolfo I Ledesma

IPC: G01N21/94 ,  H05H1/00 ,  G01J3/443 ,  B23K26/50 ,  B23K26/12 ,  B23K26/08

CPC classification number: G01N21/94 ,  B08B7/0042 ,  B23K26/0622 ,  B23K26/0884 ,  B23K26/127 ,  B23K26/50 ,  G01J3/443 ,  G01N21/718 ,  H05H1/0037

Abstract: Systems, methods, and devices of the various embodiments may enable simultaneous preparation of a substrate for adhesive bonding and detection of minute contaminants on the substrate. Various embodiments may enable detection of contaminants on a surface of a substrate while the surface of the substrate is being prepared for adhesive bonding by laser ablation. Various embodiments may provide an integrated laser treatment and measurement system.

公开(公告)号：US20190011427A1

公开(公告)日：2019-01-10

申请号：US16025494

申请日：2018-07-02

Applicant: ARKRAY, Inc.

Inventor： Kentaro Kiriyama

IPC: G01N33/493 ,  G01N21/73 ,  G01N21/25 ,  G01N1/38 ,  G01J3/443

CPC classification number: G01N33/493 ,  G01J3/443 ,  G01N1/38 ,  G01N21/25 ,  G01N21/69 ,  G01N21/73

Abstract: The disclosure provides plasma spectroscopy analysis methods using a preparatory process of diluting a urine sample assumed to contain mercury or lead as an analyte metal species, and then adding a known concentration of thallium as a control metal species to the diluted urine sample; a concentration process of introducing the urine sample containing the control metal species to a measurement container, and applying an electric current across a pair of electrodes disposed in the measurement container to concentrate the analyte metal species and the control metal species present in the urine sample in a vicinity of at least one of the electrodes; a detection process; a correction process; and a quantification process.

公开(公告)号：US20180360390A1

公开(公告)日：2018-12-20

申请号：US16008444

申请日：2018-06-14

Applicant: The University of Massachusetts

Inventor： Rosalba Gaudiuso ,  Ebo Ewusi-Annan ,  Noureddine Melikechi ,  Benyuan Liu

IPC: A61B5/00 ,  A61B5/20 ,  A61B5/08 ,  A61B5/02

CPC classification number: A61B5/7267 ,  A61B5/0071 ,  A61B5/02 ,  A61B5/08 ,  A61B5/20 ,  A61B5/4088 ,  A61B5/4222 ,  A61B5/4325 ,  A61B5/444 ,  A61B5/4842 ,  G01J3/443 ,  G01N21/718

Abstract: Systems and methods for diagnosing or monitoring progress of a pathology using laser induced breakdown spectroscopy (LIBS) and machine learning are disclosed.

公开(公告)号：US20180240661A1

公开(公告)日：2018-08-23

申请号：US15897663

申请日：2018-02-15

Applicant: Radom Corporation

Inventor： Jovan Jevtic ,  Ashok Menon ,  Velibor Pikelja

IPC: H01J49/10 ,  H01J49/04

CPC classification number: G01N21/73 ,  G01J3/0208 ,  G01J3/443 ,  G01N2201/0221 ,  H01J37/244 ,  H01J37/32201 ,  H01J37/32247 ,  H01J37/32449 ,  H01J49/0404 ,  H01J49/105

Abstract: A plasma unit for a mass spectroscopy machine generates plasma using a microwave coupled dielectric ring held within a microwave cavity employing part of the mass spectrometer structure to define the microwave cavity, thereby permitting improved proximity of the plasma and plasma ionized sample material to the mass spectrometer aperture.

公开(公告)号：US20180238807A1

公开(公告)日：2018-08-23

申请号：US15897684

申请日：2018-02-15

Applicant: Radom Corporation

Inventor： Ashok Menon ,  Velibor Pikelja ,  Jovan Jevtic

IPC: G01N21/73 ,  H01J37/32 ,  H01J37/244 ,  G01J3/443 ,  G01J3/02

CPC classification number: G01N21/73 ,  G01J3/0208 ,  G01J3/443 ,  G01N2201/0221 ,  H01J37/244 ,  H01J37/32201 ,  H01J37/32247 ,  H01J37/32449 ,  H01J49/0404 ,  H01J49/105

Abstract: A portable, modular plasma source allows the production of an emission spectrometer by combination with a common portable fiber optic spectrograph by channeling emitted light through a fiber optic coupling communicating light from the plasma source to the portable fiber optic spectrograph.

公开(公告)号：US20180238736A1

公开(公告)日：2018-08-23

申请号：US15903197

申请日：2018-02-23

Applicant: SHIMADZU CORPORATION

Inventor： TATSUYA KAIHATSU

IPC: G01J3/443 ,  G01N21/67

CPC classification number: G01J3/443 ,  G01J3/027 ,  G01J3/28 ,  G01J2003/2879 ,  G01N21/274 ,  G01N21/67

Abstract: An emission spectroscopy instrumentation is easily operated and includes a calculation element 154 that calculates a variation of the measurement values of every detector relative to a plurality of measurements of a standard; a determination element 155 that determines whether any an additional measurement is required when a variation relative to all detectors is within an acceptable value and an addition measurement is required when a variation relative to any one detector is out of an acceptable value; a notification element 156 that notifies to an operator a determination result according to the determination element 155, and a calculation-determination control element 153 that controls the calculation element 154 and the determination element 155 that calculates the variation and makes a determination at the timing when the measurement of the standard sample is executed at predetermined times, and calculates a variation and makes a determination at every one additional measurement when the additional measurement is needed.

公开(公告)号：US20180197797A1

公开(公告)日：2018-07-12

申请号：US15835889

申请日：2017-12-08

Applicant: Skyworks Solutions, Inc.

Inventor： Elena Becerra Woodard ,  Daniel Kwadwo Amponsah Berkoh ,  Kelly Yuji Kimura

IPC: H01L21/66 ,  H01J37/32 ,  G01J3/02 ,  G01J3/443 ,  H01L21/3065

CPC classification number: H01L22/26 ,  G01J3/0218 ,  G01J3/443 ,  H01J37/32853 ,  H01J37/3288 ,  H01J37/32963 ,  H01L21/3065

Abstract: An endpoint booster transports an optical signal from inside of a plasma etch chamber through a viewport to an optical cable outside of the plasma etch chamber. The optical signal is analyzed to determine an endpoint of a plasma process. The endpoint booster inhibits process byproducts from accumulating on the viewport during the plasma process, which increases the time between chamber cleanings. The reduction in chamber downtime for cleaning increases production throughput.

公开(公告)号：US10018508B2

公开(公告)日：2018-07-10

申请号：US15262061

申请日：2016-09-12

Applicant: Spectro Analytical Instruments GmbH

Inventor： Wolfram Bohle ,  Alexander Morlang

IPC: G01J3/28 ,  G01J3/02 ,  G02B7/18 ,  G02B7/182 ,  G01J3/443 ,  G01J3/18

CPC classification number: G01J3/021 ,  G01J3/0286 ,  G01J3/06 ,  G01J3/18 ,  G01J3/20 ,  G01J3/443 ,  G01J2003/064 ,  G02B7/181 ,  G02B7/1827

Abstract: A spectrometer for examining the spectrum of an optical emission source may include: an optical base body, a light entry aperture connected to the optical base body to couple light into the spectrometer, at least one dispersion element to receive the light as a beam of rays and generate a spectrum, and at least one detector for measuring the generated spectrum. A light path may run from the light entry aperture to the detector. A mirror group with at least two mirrors may be provided in a section of the light path between the light entry aperture and the at least one detector, in which the beam does not run parallel, which may compensate for temperature effects. In the mirror group, at least one mirror or the entire mirror group may be moveable relative to the optical base body and may be coupled to a temperature-controlled drive.

公开(公告)号：US20180136118A1

公开(公告)日：2018-05-17

申请号：US15802286

申请日：2017-11-02

Applicant: Verity Instruments, Inc.

Inventor： Andrew Weeks Kueny ,  Mike Whelan ,  Mark Anthony Meloni ,  John D. Corless ,  Rick Daignault ,  Sean Lynes

IPC: G01N21/27 ,  H01J37/32 ,  G01J3/443 ,  G01J3/28 ,  H01L21/68 ,  G01N21/66 ,  H05H1/00 ,  H01L21/66

CPC classification number: G01N21/274 ,  G01J3/0289 ,  G01J3/0297 ,  G01J3/10 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/66 ,  G01N21/73 ,  G01N2021/8416 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/2482 ,  H01L21/681 ,  H01L22/26 ,  H05H1/0006

Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.

公开(公告)号：US20180130651A1

公开(公告)日：2018-05-10

申请号：US15727198

申请日：2017-10-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： VLADIMIR VOLYNETS ,  Protopopov Vladimir ,  Young Do Kim ,  Yuri Barsukov ,  Sang Heon Lee ,  Sung Ho Jang

IPC: H01J49/40 ,  G01J3/443 ,  H01J49/10 ,  H01J49/00 ,  H01J49/12 ,  H01L21/02 ,  C23C16/455 ,  H01J37/32 ,  H01L29/786

CPC classification number: H01J49/40 ,  C23C16/45502 ,  G01J3/2889 ,  G01J3/443 ,  H01J37/32963 ,  H01J49/0031 ,  H01J49/10 ,  H01J49/12 ,  H01J2237/327 ,  H01L21/02274 ,  H01L29/78696

Abstract: A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.