公开(公告)号：US07923686B2

公开(公告)日：2011-04-12

申请号：US12330128

申请日：2008-12-08

Applicant: Kurio Fukushima

Inventor： Kurio Fukushima

IPC: H01J37/26

CPC classification number: H01J37/18 ,  H01J37/09 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/0451 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/206 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2605 ,  H01J2237/2614

Abstract: An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas around the surface of the specimen through both a gas flow rate controller and a gas nozzle, a vacuum pump for evacuating the inside of the specimen chamber, an objective lens including upper and lower polepieces, a detector for detecting electrons transmitted through the specimen, a display device for displaying a transmission image of the specimen, orifice plates having minute holes, holders supporting the orifice plates, a drive mechanism for driving the holders, and a motion controller. The orifice plates can be moved in a direction crossing the optical axis of the beam on the upper and lower surfaces of the upper and lower polepieces of the objective lens.

Abstract translation: 允许高角度环形暗场（HAADF）成像的装置包括电子枪，其中设置有样本的样本室，用于通过气体流量控制器通过样品的表面周围提供环境气体的气瓶 以及气体喷嘴，用于抽空试样室内部的真空泵，包括上下杆的物镜，用于检测通过试样的电子的检测器，用于显示试样的透射图像的显示装置，孔板 具有微孔，支撑孔板的支架，用于驱动保持器的驱动机构和运动控制器。 孔板可以在与物镜的上下极的上表面和下表面上的光束的光轴交叉的方向上移动。

公开(公告)号：US20090050820A1

公开(公告)日：2009-02-26

申请号：US12219526

申请日：2008-07-23

Applicant: Minoru Ikeda ,  Toshio Iida

Inventor： Minoru Ikeda ,  Toshio Iida

IPC: G21K1/10 ,  G21G5/00 ,  B05D1/10

CPC classification number: C23C14/48 ,  H01J37/09 ,  H01J2237/0451 ,  H01J2237/31701

Abstract: Aimed at providing an ion implantation apparatus elongated in period over which failure of a target work, due to deposition and release of ion species typically to and from the inner surface of a through-hole shaping a beam shape of ion beam, may be avoidable, reduced in frequency of exchange of an aperture component, and consequently improved in productivity, an aperture component shaping a beam shape has a taper opposed to the ion beam, in at least a part of inner surface of at least the through-hole, and has a thick thermal-sprayed film formed so as to cover the inner surface and therearound of the through-hole.

Abstract translation: 旨在提供一种延长的离子注入装置，其中由于离子种类的沉积和释放通常到达和离开形成离子束的束形状的通孔的内表面，在该时间段内可以避免目标工作的故障， 降低孔径分量的交换频率，从而提高生产率，成形波束形状的孔径部件在至少通孔的内表面的至少一部分中具有与离子束相对的锥形，并且具有 形成为覆盖通孔的内表面和周围的厚的热喷涂膜。

公开(公告)号：US20240258065A1

公开(公告)日：2024-08-01

申请号：US18424034

申请日：2024-01-26

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Kai Wicker ,  Bjoern Gamm ,  Yauheni Novikau ,  Ralf Wolleschensky

IPC: H01J37/21 ,  G06T7/00 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/153 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/21 ,  G06T7/0002 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/222 ,  H01J37/28 ,  G06T2207/10148 ,  G06T2207/20221 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/24578

Abstract: Particle beam systems, for example electron beam microscopes, exhibit improved resolution in a first direction by manipulating a beam of charged particles so that the beam has a non-circular beam profile in a focal plane of an objective lens. Multiple images of a sample can be recorded at different orientations of the beam profile relative to the sample, and the recorded images can be synthesized using non-uniform spatial-frequency weights to obtain an image of the sample having improved resolution in any direction. The orientation of the beam profile can be adjusted to a target orientation depending on a structure on a sample prior to recording an image of the sample, thereby making it possible to achieve highest resolution in a selected direction of interest.

公开(公告)号：US20240136148A1

公开(公告)日：2024-04-25

申请号：US18461180

申请日：2023-09-04

Applicant: NuFlare Technology, Inc.

Inventor： Yasutaka SATO ,  Hironori MIZOGUCHI ,  Toru HINATA ,  Toshiki KIMURA ,  Kiminobu AKENO

IPC: H01J37/244 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/1501 ,  H01J2237/24564

Abstract: In one embodiment, a beam detector includes a first aperture plate including a first passage hole, a second aperture plate including a second passage hole that allows a single detection target beam passing through the first passage hole to pass therethrough, and a sensor detecting a beam current of the detection target beam passing through the second passage hole. The second aperture plate includes an electrically conductive material, a plurality of third passage holes are formed around the second passage hole, and the plurality of third passage holes allow light to pass therethrough.

公开(公告)号：US20130112875A1

公开(公告)日：2013-05-09

申请号：US13808134

申请日：2011-07-11

Applicant: Kuniyasu Nakamura ,  Hiromi Inada

Inventor： Kuniyasu Nakamura ,  Hiromi Inada

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/1501 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope equipped with an aberration corrector is capable of automatically aligning the position of a convergence aperture with the center of an optical axis irrespective of skill and experience of an operator. The scanning transmission electron microscope system includes an electron source; a condenser lens configured to converge an electron beam emitted from the electron source; a deflector configured to cause the electron beam to perform scanning on a sample; an aberration correction device configured to correct an aberration of the electron beam; a convergence aperture configured to determine a convergent angle of the electron beam; and a detector configured to detect electrons passing through or diffracted by the sample. The system acquires information on contrast of a Ronchigram formed by the electron beam passing through the sample, and determines a position of the convergence aperture on the basis of the information.

Abstract translation: 配备有像差校正器的扫描透射电子显微镜能够自动地将会聚孔的位置与光轴的中心对齐，而与操作者的技术和经验无关。 扫描透射电子显微镜系统包括电子源; 聚光透镜，被配置为会聚从电子源发射的电子束; 配置成使电子束对样品进行扫描的偏转器; 被配置为校正电子束的像差的像差校正装置; 收敛孔，被配置为确定电子束的收敛角; 以及检测器，其被配置为检测通过所述样品的衍射的电子。 该系统获取通过通过样本的电子束形成的罗尼克拉姆的对比度的信息，并且基于该信息确定会聚孔径的位置。

公开(公告)号：US08293126B2

公开(公告)日：2012-10-23

申请号：US11864461

申请日：2007-09-28

Applicant: Ruairidh MacCrimmon ,  Nicolaus J. Hofmeester ,  Steven P. Caliendo

Inventor： Ruairidh MacCrimmon ,  Nicolaus J. Hofmeester ,  Steven P. Caliendo

IPC: G01L21/30

CPC classification number: H01J37/3023 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/0451 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/0812 ,  H01J2237/20228 ,  H01J2237/2485 ,  H01J2237/30461 ,  H01J2237/30477 ,  H01J2237/30488

Abstract: A method and system of location specific processing on a substrate is described. The method comprises acquiring metrology data for a substrate, and computing correction data for adjusting a first region of the metrology data on the substrate. Thereafter, a first gas cluster ion beam (GCIB) for treating the high gradient regions is established, and the first GCIB is applied to the substrate according to the correction data. The method further comprises optionally acquiring second metrology data following the applying of the first GCIB, and computing second correction data for adjusting a second region of the metrology data, or the second metrology data, or both on the substrate. Thereafter, a second gas cluster ion beam (GCIB) for treating the second region is established, and the second GCIB is applied to the substrate according to the second correction data.

Abstract translation: 描述了在衬底上的位置特定处理的方法和系统。 该方法包括获取衬底的度量数据，以及计算用于调整衬底上度量数据的第一区域的校正数据。 此后，建立了用于处理高梯度区域的第一气体簇离子束（GCIB），并且根据校正数据将第一GCIB施加到衬底。 该方法还包括可选地在应用第一GCIB之后获取第二计量数据，以及计算第二校正数据，用于调整测量数据的第二区域，或第二测量数据或二者在衬底上。 此后，建立了用于处理第二区域的第二气体簇离子束（GCIB），并且根据第二校正数据将第二GCIB施加到衬底。

公开(公告)号：US20110204252A1

公开(公告)日：2011-08-25

申请号：US12931993

申请日：2011-02-15

Applicant: Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

Inventor： Takashi Ogawa ,  Kenichi Nishinaka ,  Yoshihiro Koyama

IPC: H01J3/14

CPC classification number: H01J37/08 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0807 ,  H01J2237/083 ,  H01J2237/24535 ,  H01J2237/28 ,  H01J2237/31749

Abstract: A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.

Abstract translation: 聚焦离子束装置包括具有发射极尖端的离子枪单元，向尖端供应气体的气体供应单元和离子源气体供应源。 提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。 阴极将离子加速到样品。 孔部件具有从离子枪单元喷出的离子束的一部分通过的开口，透镜系统将离子束聚焦到样品上。

公开(公告)号：US20100266959A1

公开(公告)日：2010-10-21

申请号：US12662402

申请日：2010-04-15

Applicant: Sang-Hee Lee ,  Jin Choi ,  Byung-Gook Kim ,  Hee-Bom Kim

Inventor： Sang-Hee Lee ,  Jin Choi ,  Byung-Gook Kim ,  Hee-Bom Kim

IPC: G03F7/20

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  G03F1/78 ,  H01J37/3174 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/31771 ,  H01J2237/31776

Abstract: A pattern forming method includes providing a resist, irradiating a first electron beam to a first region of the resist, and irradiating a second electron beam to a second region which is defined along a boundary of the first region of the resist, wherein the first electron beam has a first cross section having a polygonal shape, and the second electron beam has a second cross section having a polygonal shape.

Abstract translation: 图案形成方法包括提供抗蚀剂，将第一电子束照射到抗蚀剂的第一区域，并且将第二电子束照射到沿着抗蚀剂的第一区域的边界限定的第二区域，其中第一电子 梁具有具有多边形形状的第一横截面，并且第二电子束具有具有多边形形状的第二横截面。

公开(公告)号：US3847689A

公开(公告)日：1974-11-12

申请号：US37442473

申请日：1973-06-28

Applicant: NASA

Inventor： FLETCHER J ,  HEINEMANN K

IPC: G01Q30/02 ,  H01J37/04 ,  C23F1/02

CPC classification number: H01J37/04 ,  H01J2237/0451 ,  H01J2237/0453

Abstract: An electron microscope including an electron source, a condenser lens having either a circular aperture for focusing a solid cone of electrons onto a specimen or an annular aperture for focusing a hollow cone of electrons onto the specimen, and an objective elns having an annular objective aperture, for focusing electrons passing through the specimen onto an image plane. The invention also entails a method of making the annular objective aperture using electron imaging, electrolytic deposition and ion etching techniques.

Abstract translation: 包括电子源的电子显微镜，具有用于将固体电子锥聚焦到样本上的圆形孔的聚光透镜或用于将中空圆锥电子聚焦到样本上的环形孔，以及具有环形物镜孔 ，用于将通过样本的电子聚焦到图像平面上。 本发明还涉及使用电子成像，电解沉积和离子蚀刻技术制造环形物镜孔的方法。

公开(公告)号：US20160276050A1

公开(公告)日：2016-09-22

申请号：US15075031

申请日：2016-03-18

Applicant: Battelle Memorial Institute

Inventor： Andrew J. Stevens ,  Libor Kovarik ,  Nigel D. Browning ,  Andrey V. Liyu

IPC: G21K1/02 ,  G03F7/30 ,  G03F7/20

CPC classification number: H01J37/222 ,  G03F7/20 ,  G03F7/30 ,  H01J37/244 ,  H01J37/26 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/226 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: Transmission microscopy imaging systems include a mask and/or other modulator situated to encode image beams, e.g., by deflecting the image beam with respect to the mask and/or sensor. The beam is modulated/masked either before or after transmission through a sample to induce a spatially and/or temporally encoded signal by modifying any of the beam/image components including the phase/coherence, intensity, or position of the beam at the sensor. For example, a mask can be placed/translated through the beam so that several masked beams are received by a sensor during a single sensor integration time. Images associated with multiple mask displacements are then used to reconstruct a video sequence using a compressive sensing method. Another example of masked modulation involves a mechanism for phase-retrieval, whereby the beam is modulated by a set of different masks in the image plane and each masked image is recorded in the diffraction plane.

Abstract translation: 透射显微镜成像系统包括掩模和/或其它调制器，其位于编码图像束，例如通过相对于掩模和/或传感器偏转图像束。 在通过样本传输之前或之后，波束被调制/屏蔽，以通过修改包括传感器上的波束的相位/相干性，强度或位置的任何波束/图像分量来诱导空间和/或时间编码的信号。 例如，可以通过光束放置/平移掩模，使得在单个传感器积分时间期间，传感器接收多个屏蔽光束。 然后使用与多个掩模位移相关联的图像来使用压缩感测方法重建视频序列。 掩模调制的另一示例涉及相位检索的机制，由此通过图像平面中的一组不同的掩模来调制光束，并且每个被掩蔽的图像被记录在衍射平面中。