Apparatus for analyzing elements in liquid with controlled amount of gas supply for plasma generation

    公开(公告)号:US09677940B2

    公开(公告)日:2017-06-13

    申请号:US14184233

    申请日:2014-02-19

    CPC classification number: G01J3/443 G01N21/67 G01N21/69

    Abstract: An elemental analysis apparatus 101 includes a treatment vessel 108 of which at least a part is optically transparent, a first electrode 104 covered by insulator 103, a second electrode 102, a bubble-generating part which generates a bubble 106, a gas-supplying apparatus 105 which supplies gas to the bubble-generating part in an amount necessary for generating the bubble 106, a power supply 101 which applies voltage between the first electrode 104 and the second electrode 102, and an optical detection device 110 which determines an emission spectrum of plasma that is generated by application of the voltage, and the apparatus conducts qualitatively or quantitatively analysis of a component contained in the liquid 109 based on the emission spectrum determined by the optical detection device 110.

    High speed spectroscopic sensor assembly and system
    225.
    发明授权
    High speed spectroscopic sensor assembly and system 有权
    高速光谱传感器组装及系统

    公开(公告)号:US09557216B2

    公开(公告)日:2017-01-31

    申请号:US14909213

    申请日:2014-07-31

    Applicant: TSI, Inc.

    Abstract: A laser-based spectroscopy system that combines a distance/proximity standoff sensor, a high-repetition rate laser spectroscopy system, and software with a decision-making algorithm embedded in a processing unit which in combination performs selective firing of the laser when the target object is within an interrogation zone. In a related embodiment, the system provides selective sorting of spectroscopic signals based on information from the standoff signal and from information contained in the spectral signals themselves. The laser emission can be actively controlled while keeping the laser firing, thereby preserving the thermal stability and hence the power of the laser; and the standoff sensor information and the spectral information can be combined to determine the proper relative weighting or importance of each piece of spectral information.

    Abstract translation: 一种基于激光的光谱系统,其将距离/接近距离传感器,高重复率激光光谱系统和软件与嵌入在处理单元中的决策算法组合,所述处理单元在目标物体上组合执行激光的选择性点火 在询问区内。 在相关实施例中,系统基于来自间隔信号的信息和从包含在频谱信号本身中的信息提供对光谱信号的选择性分类。 可以在保持激光烧制的同时主动地控制激光发射,从而保持激光的热稳定性和因此的功率; 并且可以组合对立传感器信息和光谱信息以确定每条光谱信息的适当的相对权重或重要性。

    Laser Induced Breakdown Spectroscopy (LIBS) Apparatus with Dual CCD Spectrometer
    226.
    发明申请
    Laser Induced Breakdown Spectroscopy (LIBS) Apparatus with Dual CCD Spectrometer 有权
    具有双CCD光谱仪的激光诱导击穿光谱(LIBS)装置

    公开(公告)号:US20160334335A1

    公开(公告)日:2016-11-17

    申请号:US14708638

    申请日:2015-05-11

    CPC classification number: G01N21/718 G01J3/443

    Abstract: This invention discloses a compact laser induced breakdown spectroscopy (LIBS) apparatus suitable for field operations. The LIBS apparatus comprises a Q-switched laser with laser pulse energy between several tens and several thousands of micro joules (μJ), which is significantly lower than that of traditional LIBS lasers. The spectrograph of the LIBS apparatus employs a dual CCD (charge coupled device) design, which maintains compact size and in the meantime offers large spectral coverage and high spectral resolution.

    Abstract translation: 本发明公开了一种适用于现场操作的紧凑型激光诱发击穿光谱(LIBS)装置。 LIBS装置包括具有几十到几千微焦耳(μJ)之间的激光脉冲能量的Q开关激光器,其显着低于传统LIBS激光器。 LIBS装置的光谱仪采用双CCD(电荷耦合器件)设计,其保持紧凑的尺寸,并且同时提供大的光谱覆盖和高的光谱分辨率。

    APPARATUS FOR OPTICAL EMISSION SPECTROSCOPY AND PLASMA TREATMENT APPARATUS
    228.
    发明申请
    APPARATUS FOR OPTICAL EMISSION SPECTROSCOPY AND PLASMA TREATMENT APPARATUS 有权
    用于光发射光谱和等离子体处理装置的装置

    公开(公告)号:US20160300699A1

    公开(公告)日:2016-10-13

    申请号:US15089520

    申请日:2016-04-02

    Abstract: Disclosed is an apparatus for optical emission spectroscopy which includes a light measuring unit measuring light in a process chamber performing a plasma process on a substrate, a light analyzing unit receiving light collected from the light measuring unit to analyze a plasma state, a control unit receiving an output signal of the light analyzing unit to process the output signal, and a light collecting controller disposed between the process chamber and the light measuring unit so as to be combined with the light measuring unit. The light collecting controller controls the light collected to the light measuring unit.

    Abstract translation: 本发明公开了一种用于光发射光谱的装置,其包括:测量在基板上执行等离子体处理的处理室中的光的光测量单元;光分析单元,接收从光测量单元收集的光以分析等离子体状态;控制单元, 所述光分析单元的输出信号处理所述输出信号;以及集光控制器,设置在所述处理室和所述光测量单元之间,以便与所述光测量单元组合。 集光控制器将收集的光控制到光测量单元。

    Plasma processing apparatus and analyzing apparatus
    229.
    发明授权
    Plasma processing apparatus and analyzing apparatus 有权
    等离子体处理装置和分析装置

    公开(公告)号:US09464936B2

    公开(公告)日:2016-10-11

    申请号:US14023831

    申请日:2013-09-11

    CPC classification number: G01J3/443 G01N21/68 H01J37/32972 H01J2237/334

    Abstract: An etching apparatus calculates an emission intensity in the vicinity of each of a plurality of wavelengths, at which a specified element should emit light, from information indicating light emission measured by an optical emission spectroscope during etching processing and, if it is determined that the calculated emission intensity information and emission intensity information stored in a storage unit are similar, extracts a wavelength, corresponding to the calculated emission intensity, with the wavelength associated with the element.

    Abstract translation: 蚀刻装置从蚀刻处理期间的由发光分光器测定的发光的信息的信息中计算出特定元素应发光的多个波长中的每一个附近的发光强度,如果确定计算出的 存储在存储单元中的发光强度信息和发光强度信息相似,以与元件相关联的波长提取对应于计算的发射强度的波长。

    LIBS ANALYZER SAMPLE PRESENCE DETECTION SYSTEM AND METHOD
    230.
    发明申请
    LIBS ANALYZER SAMPLE PRESENCE DETECTION SYSTEM AND METHOD 有权
    LIBS分析仪样品存在检测系统和方法

    公开(公告)号:US20160252397A1

    公开(公告)日:2016-09-01

    申请号:US14632419

    申请日:2015-02-26

    Applicant: SciAps, Inc.

    CPC classification number: G01J3/443 G01J3/027 G01J3/10

    Abstract: A LIBS analyzer, preferably handheld, includes a laser configured to produce a plasma on a sample and a spectrometer responsive to radiation emitted from the plasma and configured to produce a spectrum. A controller subsystem is configured to control energizing the laser and to analyze the resulting spectrum from each laser pulse to determine if the laser is aimed at a sample. If the analyzed spectrum reveals the laser is not aimed at the sample, the controller subsystem halts the laser puke sequence.

    Abstract translation: LIBS分析仪,优选是手持式的,包括配置成在样品上产生等离子体的激光器和响应于从等离子体发射的辐射而被配置成产生光谱的光谱仪。 控制器子系统被配置为控制对激光器通电并且从每个激光脉冲分析所得到的光谱以确定激光器是否瞄准样品。 如果分析的光谱显示激光器不针对样品,则控制器子系统停止激光脉冲序列。

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