公开(公告)号：US20170120282A1

公开(公告)日：2017-05-04

申请号：US15403974

申请日：2017-01-11

Applicant: LG Display Co., Ltd.

Inventor： Tae-Kyun JEONG ,  Kyong-Deuk JEONG ,  Jong-Ik PARK ,  Myung-Shik KIM ,  Hyoung-Won KIM ,  Dong-Ki SHIN ,  Jeong-Hak CHOI

IPC: B05B15/02 ,  G03F7/16 ,  B05C13/00 ,  B05D1/02 ,  B05B3/12

CPC classification number: B05B15/52 ,  B05B3/12 ,  B05B15/5223 ,  B05B15/55 ,  B05B15/70 ,  B05C3/09 ,  B05C3/10 ,  B05C11/11 ,  B05C13/00 ,  B05D1/005 ,  B05D1/02 ,  B05D1/26 ,  B41J2/16547 ,  C03C17/002 ,  G03F7/16 ,  G11B7/266 ,  H01L21/67051 ,  Y10S134/902 ,  Y10S135/902

Abstract: A coating apparatus includes: a nozzle having a nozzle front end configured to spray a coating solution and a head configured to store the coating solution; a movement axis configured to cause the nozzle to move back and forth in a straight line; a rotating connection member configured to connect the movement axis with the nozzle and allow the nozzle to rotate; a stage disposed under the movement axis; and a cleaning means disposed at an end of the movement axis, and having a nozzle front end insertion unit in a concave shape of the nozzle front end and a base fixing the insertion unit, wherein the nozzle is fixed in a normal direction of a surface of the stage by the movement axis, moves back and forth in an extension direction of the movement axis, and rotates with respect to the movement axis.

公开(公告)号：US09616443B2

公开(公告)日：2017-04-11

申请号：US14396933

申请日：2013-04-23

Applicant: Tresu A/S

Inventor： Mads Kylling ,  Marko Ryynänen ,  Erik Gydesen ,  Petri Sirviö

IPC: B05C1/02 ,  B05C13/02 ,  B05D1/28 ,  B41F19/00 ,  B41F33/00 ,  B41F35/00 ,  B05B9/03 ,  B05C13/00 ,  B41F35/04 ,  B41F21/00 ,  B41F33/06 ,  B41F33/12 ,  B41F33/08 ,  B41F33/16 ,  B41F35/02 ,  B41F23/08 ,  B05D1/00 ,  B41F23/00

CPC classification number: B05B9/03 ,  B05C1/025 ,  B05C1/027 ,  B05C13/00 ,  B05C13/02 ,  B05D1/005 ,  B05D1/28 ,  B05D2203/22 ,  B05D2252/04 ,  B41F19/001 ,  B41F19/002 ,  B41F21/00 ,  B41F23/00 ,  B41F23/08 ,  B41F33/00 ,  B41F33/06 ,  B41F33/08 ,  B41F33/12 ,  B41F33/16 ,  B41F35/00 ,  B41F35/02 ,  B41F35/04 ,  B41P2235/242 ,  B41P2235/244 ,  B41P2235/246 ,  B41P2235/26

Abstract: A coating unit is located after a sheet-fed digital printer on a manufacturing line. As a response to a workpiece entering the coating unit from the printer, coating substance is dosed onto a plate cylinder, and said plate cylinder is rotated to transfer said coating substance onto the workpiece, which is then transferred further on the manufacturing line. As a response to a first time limit expiring after transferring the workpiece further without a subsequent workpiece entering the coating unit, the rotation of the plate cylinder is stopped.

公开(公告)号：US09597294B2

公开(公告)日：2017-03-21

申请号：US14514464

申请日：2014-10-15

Applicant: GlaxoSmithKline LLC

Inventor： Frederick Henry Fiesser

IPC: A61K9/50 ,  B05C3/05 ,  B05C19/02 ,  B05C5/02 ,  B05C9/08 ,  B05C13/00 ,  B01J2/00 ,  B05B13/02 ,  B05D1/02 ,  B01J2/18 ,  A61J3/00 ,  A01C1/06 ,  A23G3/26 ,  B05D1/22 ,  B05D3/12

CPC classification number: A61K9/5089 ,  A01C1/06 ,  A23G3/26 ,  A61J3/005 ,  B01J2/006 ,  B01J2/18 ,  B05B13/0257 ,  B05C3/05 ,  B05C5/0216 ,  B05C5/022 ,  B05C9/08 ,  B05C13/00 ,  B05C19/02 ,  B05D1/02 ,  B05D1/22 ,  B05D3/12 ,  B05D2258/00

Abstract: A continuous dosage form coating apparatus uses vibrational impulses to maintain a dosage forms in a fluid state to expose them to a coating material atomized by spraying.

公开(公告)号：US09579905B2

公开(公告)日：2017-02-28

申请号：US15047458

申请日：2016-02-18

Applicant: Kateeva, Inc.

Inventor： Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Conor F. Madigan ,  Eugene Rabinovich ,  Nahid Harjee ,  Christopher Buchner ,  Gregory Lewis

IPC: B05C5/00 ,  B05C13/00 ,  B05D5/00 ,  H01L51/50 ,  H01L51/52 ,  B41J11/00 ,  B05C15/00 ,  H01L21/67 ,  H01L51/00 ,  B41J3/407 ,  H01L51/56 ,  H01L21/677

CPC classification number: B05B15/60 ,  B05C13/00 ,  B05C15/00 ,  B05D5/00 ,  B41J2/01 ,  B41J3/407 ,  B41J11/0015 ,  B41J11/002 ,  H01L21/67115 ,  H01L21/6715 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/6776 ,  H01L21/67784 ,  H01L51/00 ,  H01L51/0005 ,  H01L51/5253 ,  H01L51/56

Abstract: Apparatus and techniques for use in manufacturing a light emitting device, such as an organic light emitting diode (OLED) device can include using one or more modules having a controlled environment. The controlled environment can be maintained at a pressure at about atmospheric pressure or above atmospheric pressure. The modules can be arranged to provide various processing regions and to facilitate printing or otherwise depositing one or more patterned organic layers of an OLED device, such as an organic encapsulation layer (OEL) of an OLED device. In an example, uniform support for a substrate can be provided at least in part using a gas cushion, such as during one or more of a printing, holding, or curing operation comprising an OEL fabrication process. In another example, uniform support for the substrate can be provided using a distributed vacuum region, such as provided by a porous medium.

Abstract translation: 用于制造发光器件（例如有机发光二极管（OLED））器件的装置和技术可以包括使用具有受控环境的一个或多个模块。 受控环境可以保持在大气压或大气压以上的压力。 这些模块可以被布置成提供各种处理区域并且便于印刷或以其它方式沉积OLED器件（例如OLED器件的有机封装层（OEL））的一个或多个图案化的有机层。 在一个示例中，可以至少部分地使用气垫来提供对基底的均匀支撑，例如在包括OEL制造工艺的一个或多个印刷，保持或固化操作期间。 在另一个实例中，可以使用诸如由多孔介质提供的分布式真空区域来提供对基底的均匀支撑。

公开(公告)号：US09486821B2

公开(公告)日：2016-11-08

申请号：US14431434

申请日：2013-08-27

Applicant: NISSAN MOTOR CO., LTD.

Inventor： Kenichi Toyoshima ,  Kei Ono ,  Masaya Yamamoto ,  Norifumi Horibe ,  Takayuki Terasaki

IPC: B05B5/14 ,  B05C13/02 ,  B05C5/00 ,  H01M8/00 ,  B05B13/02 ,  H01M4/88 ,  B65H5/00 ,  B65G47/92 ,  B05C5/02 ,  H01M8/10 ,  B05C13/00

CPC classification number: B05B5/14 ,  B05B13/02 ,  B05C5/02 ,  B05C5/0245 ,  B05C5/0254 ,  B05C5/0283 ,  B05C13/00 ,  B65G47/92 ,  B65H5/004 ,  H01M4/881 ,  H01M2008/1095 ,  Y02E60/50

Abstract: [Object] To provide a coating apparatus that can prevent distortion of the shape of a coating area on a sheet member.[Solution Means] A coating apparatus 50 includes a suction roller peripheral wall 114a (base plate 70) on which a flexible electrolyte membrane 21 shaped like a thin film (sheet member 60) is placed, drawing unit 80 that draws the electrolyte membrane on the suction roller peripheral wall, and a coating mechanism 90 that applies catalyst ink 91 (material) onto the electrolyte membrane drawn on the suction roller peripheral wall by the drawing unit.The electrolyte membrane has, in a range from a center portion to a portion on an inner side of an outer peripheral edge 61, a coating area 62 where the catalyst ink is applied. The drawing unit draws the electrolyte membrane on the suction roller peripheral wall in the coating area where the catalyst ink is applied, and also draws the electrolyte membrane on the suction roller peripheral wall 114a in a range 63 extending outward beyond the coating area.

Abstract translation: 电解质膜在从外周边缘61的中心部分到内侧的一部分的范围内具有施加催化剂油墨的涂布区域62。 拉伸单元将电解质膜吸附在涂覆有催化剂油墨的涂布区域中的抽吸辊周壁上，并且将抽吸辊周壁114a上的电解质膜拉伸到向外延伸超出涂覆区域的范围63内。

公开(公告)号：US20160159113A1

公开(公告)日：2016-06-09

申请号：US15047458

申请日：2016-02-18

Applicant: Kateeva, Inc.

Inventor： Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Conor F. Madigan ,  Eugene Rabinovich ,  Nahid Harjee ,  Christopher Buchner ,  Gregory Lewis

IPC: B41J11/00

CPC classification number: B05B15/60 ,  B05C13/00 ,  B05C15/00 ,  B05D5/00 ,  B41J2/01 ,  B41J3/407 ,  B41J11/0015 ,  B41J11/002 ,  H01L21/67115 ,  H01L21/6715 ,  H01L21/67184 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/6776 ,  H01L21/67784 ,  H01L51/00 ,  H01L51/0005 ,  H01L51/5253 ,  H01L51/56

Abstract: Apparatus and techniques for use in manufacturing a light emitting device, such as an organic light emitting diode (OLED) device can include using one or more modules having a controlled environment. The controlled environment can be maintained at a pressure at about atmospheric pressure or above atmospheric pressure. The modules can be arranged to provide various processing regions and to facilitate printing or otherwise depositing one or more patterned organic layers of an OLED device, such as an organic encapsulation layer (OEL) of an OLED device. In an example, uniform support for a substrate can be provided at least in part using a gas cushion, such as during one or more of a printing, holding, or curing operation comprising an OEL fabrication process. In another example, uniform support for the substrate can be provided using a distributed vacuum region, such as provided by a porous medium.

公开(公告)号：US20160121360A1

公开(公告)日：2016-05-05

申请号：US14993154

申请日：2016-01-12

Applicant: The Procter & Gamble Company

Inventor： Darrell Ian Brown ,  John Andrew Strasemeier

IPC: B05C13/00 ,  B05C5/02

CPC classification number: B05C13/00 ,  A61F13/15593 ,  A61F13/531 ,  B05C1/0808 ,  B05C5/0212 ,  B05C5/0254 ,  B05C11/1002

Abstract: Aspects of the methods and apparatuses herein involve applying fluids onto an advancing substrate. The apparatuses and methods herein may provide for the application of viscous fluids, such as adhesives, in pre-determined patterns to an advancing substrate. The fluid application apparatus may include a slot die applicator and a substrate carrier. The slot die applicator may include a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip. And the substrate carrier may be adapted to advance the substrate past the slot die applicator as the slot die applicator discharges adhesive onto the substrate. In operation, when a first surface of the substrate is disposed on the substrate carrier, the substrate carrier advances a second surface of the substrate past the slot opening of the slot die applicator.

Abstract translation: 本文的方法和装置的方面涉及将流体施加到前进基底上。 这里的装置和方法可以提供将预定图案中的粘性流体（例如粘合剂）应用于前进基底。 流体施加装置可以包括狭槽模具施加器和衬底载体。 狭槽模具施加器可以包括狭槽开口，第一唇缘和第二唇缘，所述​​狭槽开口位于第一唇缘和第二唇缘之间。 并且当狭缝模具施加器将粘合剂排放到基板上时，衬底载体可以适于使衬底超过槽模具施加器。 在操作中，当基板的第一表面设置在基板载体上时，基板载体使基板的第二表面通过狭槽模具施加器的狭槽开口。

公开(公告)号：US20160079099A1

公开(公告)日：2016-03-17

申请号：US14952657

申请日：2015-11-25

Applicant: SCREEN Semiconductor Solutions Co., Ltd.

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: H01L21/67 ,  G03F7/26 ,  B05C13/02

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating method for treating substrates with a substrate treating apparatus having an indexer section, a treating section and an interface section includes performing resist film forming treatment in parallel on a plurality of stories provided in the treating section and performing developing treatment in parallel on a plurality of stories provided in the treating section.

Abstract translation: 用具有分度器部分，处理部分和界面部分的基板处理装置处理基板的基板处理方法包括在设置在处理部分中的多个故事层并行地进行抗蚀剂膜形成处理，并且在 在治疗部分设置多个故事。

公开(公告)号：US20160008841A1

公开(公告)日：2016-01-14

申请号：US14863375

申请日：2015-09-23

Applicant: Screen Semiconductor Solutions Co., Ltd.

Inventor： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05C13/00 ,  B05C11/08 ,  B05C9/12 ,  G03F7/16

CPC classification number: B05C13/00 ,  B05C9/12 ,  B05C11/08 ,  B05C13/02 ,  C23C14/568 ,  G03F7/16 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/135

Abstract: A substrate treating apparatus includes a first treating block and a second treating block disposed adjacent to the first treating block. Each of the first treating block and the second treating block include a plurality of stories arranged vertically. Each of the plurality of stories includes treating units for treating substrates and a main transport mechanism for transporting the substrates to and from the treating units. The substrates are transportable between the stories of the first treating block and the stories of the second treating block at same heights as corresponding stories of the first treating block. The substrates are transportable between the stories of the first treating block and the stories of the second treating block at different heights from corresponding stories of the first treating block.

Abstract translation: 基板处理装置包括第一处理块和邻近第一处理块设置的第二处理块。 第一处理块和第二处理块中的每一个包括垂直布置的多个故事。 多个故事中的每一个包括用于处理基板的处理单元和用于将基板输送到处理单元和从处理单元传送基板的主输送机构。 基底可以在第一处理块的故事和第二处理块的故事之间以与第一处理块的相应故事相同的高度传送。 基板可以在第一处理块的故事和第二处理块的故事之间在与第一处理块的相应故事不同的高度处运输。

公开(公告)号：US20150336126A1

公开(公告)日：2015-11-26

申请号：US14759359

申请日：2013-12-19

Applicant: GENERAL ELECTRIC COMPANY

Inventor： John H. BARBER ,  Hai YANG ,  Chen WANG ,  Zhixun LIU

IPC: B05C3/02 ,  B05C3/109 ,  B05D1/18

CPC classification number: B05C3/02 ,  B05C3/09 ,  B05C3/10 ,  B05C3/109 ,  B05C9/08 ,  B05C13/00 ,  B05D1/18

Abstract: A dip coating apparatus includes a sealed case assembly for containing at least one workpiece to be coated; an air pump communicated with the sealed case assembly, for pumping air from the sealed case assembly and injecting air into the sealed case assembly; and a coating solution container containing a coating solution and communicated with the sealed case assembly, for injecting the coating solution to the sealed case assembly and retrieving the coating solution from the sealed case assembly.

Abstract translation: 浸涂装置包括用于容纳至少一个待涂覆的工件的密封壳体组件; 与密封的壳体组件连通的空气泵，用于从密封的壳体组件抽取空气并将空气注入到密封的壳体组件中; 以及包含涂料溶液并与密封的壳体组件连通的涂布溶液容器，用于将涂布溶液注入到密封的壳体组件中并从密封的壳体组件中回收涂布溶液。