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    Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography
    22.
    发明授权
    Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography 有权
    提供用于自组装嵌段共聚物的图案化外延模板用于器件光刻的方法

    公开(公告)号：US09513553B2

    公开(公告)日：2016-12-06

    申请号：US14387186

    申请日：2013-03-19

    Applicant: ASML Netherlands B.V.

    Inventor： Sander Frederik Wuister ,  Vadim Yevgenyevich Banine ,  Jozef Maria Finders ,  Roelof Koole ,  Emiel Peeters ,  Harmeet Singh

    IPC: G03F7/20 ,  G03F7/26 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B05D1/32 ,  B05D3/10

    CPC classification number: G03F7/26 ,  B05D1/32 ,  B05D3/107 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/20 ,  G03F7/2022

    Abstract: A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features.

    Abstract translation: 公开了一种在衬底上形成图案化外延模板以引导用于器件光刻的嵌段共聚物的自组装的方法。 基板上的抗蚀剂层通过光刻法选择性地用光化（例如UV或DUV）曝光，以提供布置成在形状之间留下未曝光的抗蚀剂部分的接触或重叠形状的规则格子图案的暴露部分。 用剩余的抗蚀剂部分除去曝光或未曝光的抗蚀剂，为用于可自组装嵌段共聚物取向的图案化外延模板提供六边形或正方形阵列的基础。 该方法允许简单的直接UV光刻形成具有亚分辨率特征的图案化外延模板。

    Making imprinted multi-layer biocidal particle structure
    24.
    发明授权
    Making imprinted multi-layer biocidal particle structure 有权
    制作多层杀菌颗粒结构印迹

    公开(公告)号：US09415419B2

    公开(公告)日：2016-08-16

    申请号：US14526619

    申请日：2014-10-29

    Applicant: Eastman Kodak Company

    Inventor： Ronald Steven Cok

    IPC: B29C59/00 ,  B44C1/22 ,  B05D7/00

    CPC classification number: B05D7/542 ,  A01N25/34 ,  B05D1/28 ,  B05D3/107 ,  B05D3/12 ,  B05D3/148 ,  B05D5/00 ,  B05D5/02 ,  B29C35/0805 ,  B29C59/026 ,  B29C59/14 ,  B29C2059/023 ,  B29C2059/027 ,  B29C2059/028 ,  B29K2105/0011 ,  B29K2995/0003 ,  B29K2995/0005 ,  B29K2995/0007

    Abstract: A method of making a multi-layer biocidal structure includes providing a support and locating a first curable layer on the support. A second curable layer is located on the first curable layer, the second curable layer having multiple biocidal particles dispersed within the second curable layer. The first curable layer and the second curable layer are imprinted in a single step with an imprinting stamp having a structure with a depth greater than the thickness of the second curable layer. The first curable layer and the second curable layer are cured in a single step to form a first cured layer and a second cured layer. The imprinting stamp is removed.

    Abstract translation: 制造多层杀生物结构的方法包括提供载体并将第一可固化层定位在载体上。 第二可固化层位于第一可固化层上，第二可固化层具有分散在第二可固化层内的多个杀生物颗粒。 第一可固化层和第二可固化层用一个具有深度大于第二可固化层的厚度的结构的压印印模在一个步骤中印刷。 第一可固化层和第二可固化层在一个步骤中固化以形成第一固化层和第二固化层。 印记邮票被删除。

    Image recording method
    25.
    发明授权
    Image recording method 有权
    图像记录方法

    公开(公告)号：US09399241B2

    公开(公告)日：2016-07-26

    申请号：US14450093

    申请日：2014-08-01

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Mamiko Kaji ,  Takashi Imai

    IPC: B05D1/36 ,  B05D3/10 ,  B05D1/26 ,  B05D1/02 ,  B05D1/28 ,  C09D11/107 ,  C09D11/38 ,  B41M5/00 ,  B41M7/00

    CPC classification number: B05D1/36 ,  B05D1/02 ,  B05D1/26 ,  B05D1/28 ,  B05D3/107 ,  B41M5/0017 ,  B41M7/0018 ,  C09D11/107 ,  C09D11/38

    Abstract: An image recording method includes applying an ink containing a pigment and polymer particles to a region of a recording medium, and applying a liquid composition capable of destabilizing the dispersion of the pigment in the ink to the recording medium so as to cover at least part of the region of the recording medium. The liquid composition contains 6.0% by mass or more of at least one surfactant selected from the group consisting of the compounds expressed by General Formula (1) and the compounds expressed by General Formula (2) relative to the total mass of the liquid composition. The content of the polymer particles in the ink is 1.0% by mass or more relative to the total mass of the ink.

    Abstract translation: 图像记录方法包括将含有颜料和聚合物颗粒的油墨施加到记录介质的区域，并将能够使油墨中颜料的分散体不稳定的液体组合物涂覆到记录介质上，以便覆盖至少部分 记录介质的区域。 液体组合物含有相对于液体组合物的总质量为6.0质量％以上的至少一种选自通式（1）表示的化合物和通式（2）表示的化合物的表面活性剂。 油墨中的聚合物颗粒的含量相对于油墨的总质量为1.0质量％以上。

    ANTIMICROBIAL PHT COATINGS
    26.
    发明申请
    ANTIMICROBIAL PHT COATINGS 有权
    抗微生物涂料

    公开(公告)号：US20160143286A1

    公开(公告)日：2016-05-26

    申请号：US15013399

    申请日：2016-02-02

    Applicant: International Business Machines Corporation

    Inventor： Dylan J. BODAY ,  Jeannette M. GARCIA ,  James L. HEDRICK ,  Rudy J. WOJTECKI

    IPC: A01N55/02 ,  A01N43/66

    CPC classification number: A01N55/02 ,  A01N35/02 ,  A01N43/64 ,  A01N43/66 ,  A01N59/16 ,  B05D3/104 ,  B05D3/107 ,  B05D5/00 ,  C09D5/14 ,  C09D5/16 ,  C09D5/1693 ,  A01N25/12 ,  A01N59/20

    Abstract: Antimicrobial materials and methods for making antimicrobial materials are described herein. Antimicrobial materials and antimicrobial material precursors are formed from hexahydrotriazine and/or a hemiaminal material and a non-fouling material and adhesive material may be incorporated into the antimicrobial materials and antimicrobial material precursors. The hexahydrotriazine and/or hemiaminal material may be made from a diamine and an aldehyde. Metal ions are also incorporated into the antimicrobial material precursors to form an antimicrobial material.

    Abstract translation: 本文描述了用于制备抗微生物材料的抗微生物材料和方法。 抗微生物材料和抗微生物材料前体由六氢三嗪和/或半固体材料形成，并且非结垢材料和粘合剂材料可以并入抗微生物材料和抗微生物材料前体中。 六氢三嗪和/或噻嗪类材料可以由二胺和醛制成。 金属离子也并入抗微生物材料前体以形成抗微生物材料。

    Method of formulating perovskite solar cell materials
    27.
    发明授权
    Method of formulating perovskite solar cell materials 有权
    配制钙钛矿太阳能电池材料的方法

    公开(公告)号：US09305715B2

    公开(公告)日：2016-04-05

    申请号：US14711330

    申请日：2015-05-13

    Applicant: Hunt Energy Enterprises, L.L.C.

    Inventor： Michael D. Irwin ,  Jerred A. Chute ,  Vivek V. Dhas

    IPC: B05D1/38 ,  H01G9/20 ,  H01L31/032 ,  B05D3/10

    CPC classification number: H01L51/4206 ,  B05D1/38 ,  B05D3/107 ,  H01G9/2045 ,  H01L31/0304 ,  H01L51/0003 ,  H01L51/0026 ,  H01L51/0077 ,  H01L51/422 ,  Y02E10/542 ,  Y02E10/549

    Abstract: A method for preparing photoactive perovskite materials. The method comprises the step of preparing a lead halide precursor ink. Preparing a lead halide precursor ink comprises the steps of: introducing a lead halide into a vessel, introducing a first solvent to the vessel, and contacting the lead halide with the first solvent to dissolve the lead halide. The method further comprises depositing the lead halide precursor ink onto a substrate, drying the lead halide precursor ink to form a thin film, annealing the thin film, and rinsing the thin film with a second solvent and a salt.

    Abstract translation: 一种制备光活性钙钛矿材料的方法。 该方法包括制备卤化铅前体油墨的步骤。 制备卤化铅前体油墨包括以下步骤：将卤化铅引入容器中，将第一溶剂引入容器，并将卤化铅与第一溶剂接触以溶解卤化铅。 该方法还包括将卤化铅前体油墨沉积在基材上，干燥卤化铅前体油墨以形成薄膜，退火薄膜，并用第二溶剂和盐冲洗薄膜。

    Methods of reducing defects in directed self-assembled structures
    29.
    发明授权
    Methods of reducing defects in directed self-assembled structures 有权
    减少定向自组装结构缺陷的方法

    公开(公告)号：US09159558B2

    公开(公告)日：2015-10-13

    申请号：US13840880

    申请日：2013-03-15

    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

    Inventor： Joy Cheng ,  Daniel P. Sanders ,  Melia Tjio

    IPC: B05D1/38 ,  B05D1/32 ,  B05D3/10 ,  H01L21/027 ,  H01L21/033 ,  H01L21/3105 ,  B81C1/00

    CPC classification number: H01L21/0273 ,  B05D1/32 ,  B05D1/38 ,  B05D3/107 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  G03F7/0035 ,  H01L21/0337 ,  H01L21/31058

    Abstract: Methods are disclosed for reducing the number of defects in a directed self-assembled structure formed on a guiding pre-pattern (e.g., a chemical pre-pattern) on a substrate. A first layer comprising a first self-assembly material is applied onto the guiding pre-pattern, with the first self-assembly material forming domains whose alignment and orientation are directed by the guiding pre-pattern; as a result, a first self-assembled structure is formed. The first self-assembled structure is washed away, and a second layer comprising a second self-assembly material is then applied. The second self-assembly material forms a second self-assembled structure having fewer defects than the first self-assembled structure.

    Abstract translation: 公开了减少在衬底上形成的引导预图案（例如，化学预图案）上的定向自组装结构中的缺陷数量的方法。 包括第一自组装材料的第一层被施加到引导预制图案上，其中第一自组装材料形成其取向和取向由引导预图案指向的区域; 结果，形成第一自组装结构。 第一自组装结构被冲走，然后施加包括第二自组装材料的第二层。 第二自组装材料形成具有比第一自组装结构更少的缺陷的第二自组装结构。

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