公开(公告)号：US4564763A

公开(公告)日：1986-01-14

申请号：US517394

申请日：1983-07-26

Applicant: Michel Bruel ,  Jean-Francois Michaud

Inventor： Michel Bruel ,  Jean-Francois Michaud

IPC: H01J3/26 ,  H01J37/147 ,  H01J37/317 ,  G21K1/08 ,  H01J3/00

CPC classification number: H01J37/1475 ,  H01J3/26 ,  H01J37/317

Abstract: Process and apparatus for varying the deflection of the path of a charged particle beam over a path of length l in a space volume V, where there is a magnetic induction B (x,y,z), wherein a relative displacement of volume V with respect to the beam is produced in such a way as to vary the magnitude .intg.BDl calculated along the path and characterizing the deflection undergone by the beam on passing through volume V. In some of the embodiments rotating magnetic pole pieces are employed to vary the path. Fixed inclined faced pole pieces are also employed.

Abstract translation: 用于改变空间体积V中具有长度为l的路径上的带电粒子束的路径的偏转的方法和装置，其中存在磁感应B（x，y，z），其中体积V与 产生相对于光束的方式，以改变沿着路径计算的幅度INTEGRAL BD1并且表征通过光束通过体积V时所经受的偏转。在一些实施例中，使用旋转磁极片来改变路径 。 也采用固定的倾斜面极片。

公开(公告)号：US20150029593A1

公开(公告)日：2015-01-29

申请号：US14338542

申请日：2014-07-23

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo

IPC: G02B27/00

CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08941077B2

公开(公告)日：2015-01-27

申请号：US13280162

申请日：2011-10-24

Applicant: Nicholas White ,  Zhimin Wan ,  Erik Collart

Inventor： Nicholas White ,  Zhimin Wan ,  Erik Collart

IPC: H01J1/88 ,  H01J3/26 ,  H01J3/04 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.

Abstract translation: 公开了一种减速装置，能够使短点光束或高色带光束减速。 在任一种情况下，都会控制趋向于降低光束轮廓形状的效果。 提供了用于将离子束屏蔽到外部电位的盖子。 其位置和电位可调的电极设置在梁的相对两侧，以确保减速和偏转电场的形状不会显着偏离最佳形状，即使存在显着的空间电荷高 目前低能量的重离子束。

公开(公告)号：US08927942B2

公开(公告)日：2015-01-06

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J27/00 ,  H01J37/08 ,  H01J27/02 ,  H01J27/22 ,  H01J3/18 ,  H01J3/26 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：腔室，用于将物质注入到腔室中的注射器，其中所述物质包括至少第一物质，具有位于所述腔室中的顶点的尖端，其中所述顶点具有由金属第二物质制成的表面， 用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述腔室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US08922122B2

公开(公告)日：2014-12-30

申请号：US13308614

申请日：2011-12-01

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J7/24

CPC classification number: H01J37/026 ,  H01J3/02 ,  H01J3/022 ,  H01J3/26 ,  H01J37/06 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/31705

Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

Abstract translation: 本公开提供了控制电子发射的各种有利的方法和装置。 本公开的更广泛形式之一涉及电子发射元件，其包括电子发射器，其包括设置在栅电极和阴极之间的电子发射区。 阳极设置在电子发射区域的上方，并且在阳极上设置电压组。 施加在栅电极和阴极之间的第一电压控制从电子发射区产生的电子量。 施加到阳极的第二电压提取产生的电子。 施加到电压组的第三电压控制通过阳极提取的电子的方向。

公开(公告)号：US20140239200A1

公开(公告)日：2014-08-28

申请号：US14186366

申请日：2014-02-21

Applicant: NuFlare Technology, Inc

Inventor： Nobuo MIYAMOTO

IPC: H01J37/304 ,  H01J37/317

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

Abstract: A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source.

Abstract translation: 阴极工作温度调节方法包括获取接近于使用阴极的电子束源中的发射电流值与在发射电流下偏置电压饱和的阴极的工作温度之间的相关性的近似方程，测量电流密度 当在电子束源中设置第n个发射电流值和第n个阴极操作温度的状态下，确定所测量的电流密度是否处于第一公差范围内，从而改变阴极的电子束 当测量的电流密度不在第一公差范围内时，将第n发射电流值设置为第（n + 1）个发射电流值，通过以下方式计算与第（n + 1）个发射电流值对应的阴极的工作温度： 近似等式，并将计算出的工作温度设定为电子束源中的第（n + 1）个阴极工作温度。

公开(公告)号：US08785878B2

公开(公告)日：2014-07-22

申请号：US13680759

申请日：2012-11-19

Applicant: Canon Kabushiki Kaisha

Inventor： Keiichi Arita ,  Masahito Shinohara

IPC: G21K5/04 ,  H01J37/30 ,  H01J37/317 ,  H01J3/26 ,  H01J29/70

CPC classification number: H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/10 ,  H01J3/26 ,  H01J29/70 ,  H01J37/244 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/24542 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle beams, and a controller. The measurement device includes a plate including knife edges, and a sensor configured to detect a charged particle beam incident thereon via the plate. The controller causes one charged particle beam, selected from the charged particle beams, to perform a scan relative to the measurement device so that the one charged particle beam traverses at least two knife edges among the plurality of knife edges, and to generate correction information for correcting a measurement error of the measurement device due to deformation of the plate, based on an output from the sensor upon the scan.

Abstract translation: 一种装置，包括被配置为对物体照射带电粒子束的照射装置，被配置为测量每个带电粒子束的特性的测量装置和控制器。 该测量装置包括一个包括刀刃的板，以及一个传感器，被配置成检测通过该板入射到其上的带电粒子束。 所述控制器使从所述带电粒子束中选出的一个带电粒子束相对于所述测量装置执行扫描，使得所述一个带电粒子束在所述多个刀刃之间穿过至少两个刀刃，并产生用于 基于扫描时的传感器的输出，校正由于板的变形引起的测量装置的测量误差。

公开(公告)号：US08710451B2

公开(公告)日：2014-04-29

申请号：US13251174

申请日：2011-09-30

Applicant: Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having a plurality of first defection electrodes 51a, 51b, 51c and a plurality of second deflection electrodes 52a, 52b, 52c wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plurality of second deflection electrodes such that electric deflection fields between the plurality of second deflection electrodes and the plurality of opposite first deflection electrodes have a common orientation. The ion beam system has a high kinetic energy mode in which a distribution of the electric deflection fields has a greater width, and a low kinetic energy mode in which a distribution of the electric deflection fields has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和具有多个第一偏移电极51a，51b，51c和多个第二偏转电极52a，52b，52c的至少一个光束偏转器39，其中电压供应系统被配置为供应 对多个第二偏转电极的不同的可调偏转电压使得多个第二偏转电极和多个相对的第一偏转电极之间的电偏转场具有共同的取向。 离子束系统具有高动能模式，其中电偏转场的分布具有较大的宽度，以及低动能模式，其中电偏转场的分布具有较小的宽度。

公开(公告)号：US08624206B2

公开(公告)日：2014-01-07

申请号：US13655129

申请日：2012-10-18

Applicant: FEI Company

Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

IPC: H01J3/26

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需要的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。

公开(公告)号：US20130256554A1

公开(公告)日：2013-10-03

申请号：US13722774

申请日：2012-12-20

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J3/26

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。