公开(公告)号：US5828175A

公开(公告)日：1998-10-27

申请号：US764724

申请日：1996-12-10

Applicant: Siegfried Straemke

Inventor： Siegfried Straemke

IPC: C23C8/36 ,  H01J37/32 ,  H01J7/30 ,  B23K9/06

CPC classification number: H01J37/32018 ,  C23C8/36 ,  H01J37/32027 ,  H01J37/32045

Abstract: The circuitry for operating a glow discharge path (GES) comprises a bridge circuit (BC) comprising a polarity switch (S1) and an ignition pulse circuit (ZIS1) in a first bridge branch (B1) and a polarity switch (S2) and an ignition pulse circuit (ZIS2) in a second bridge branch (B2). The glow discharge path (GES) formed between two electrodes (E1, E2) is located in the transverse branch of the bridge circuit (BC). For changing the polarity of the glow discharge path (GES), the polarity switch (S1) of the one bridge branch (B1) can be operated together with the ignition pulse circuit (ZIS2) of the other bridge branch (B2). Thus, each of the two electrodes (E1, E2) of the glow discharge path (GES) can be used as a cathode. The cathode of the glow discharge path is cleaned by the impinging ions.

Abstract translation: 用于操作辉光放电路径（GES）的电路包括在第一桥接支路（B1）和极性开关（S2）中包括极性开关（S1）和点火脉冲电路（ZIS1）的桥接电路（BC）和 点火脉冲电路（ZIS2）在第二桥接支路（B2）中。 在两个电极（E1，E2）之间形成的辉光放电路径（GES）位于桥接电路（BC）的横向分支中。 为了改变辉光放电路径（GES）的极性，一个桥接支路（B1）的极性开关（S1）可以与另一个桥接支路（B2）的点火脉冲电路（ZIS2）一起工作。 因此，辉光放电路径（GES）的两个电极（E1，E2）中的每一个可以用作阴极。 辉光放电路径的阴极被冲击离子清洗。

公开(公告)号：US5576939A

公开(公告)日：1996-11-19

申请号：US435211

申请日：1995-05-05

Applicant: Geoffrey N. Drummond

Inventor： Geoffrey N. Drummond

IPC: H01J37/32 ,  H02M3/28 ,  H02M3/335

CPC classification number: H01J37/32018 ,  H01J37/32027 ,  H01J37/32045 ,  H02M3/28 ,  H01J2237/0206

Abstract: An enhanced DC plasma processing system which acts to immediately stop current from flowing through the plasma allows a variety of alternative embodiments for varying applications. In one embodiment, a tapped inductor is switched to ground to achieve substantial voltage reversal of about 10% upon detection of an arc condition through voltage and/or rate of voltage change techniques. This reversal of voltage is maintained long enough to allow restoration of uniform charge density within the plasma prior to restoration of the initial driving condition. A technique for preventing arc discharges involving periodically applying a reverse voltage is effected through a timer system in the power supply.

Abstract translation: 用于立即停止电流流过等离子体的增强型DC等离子体处理系统允许用于不同应用的各种替代实施例。 在一个实施例中，抽头电感器被切换到地，以通过电压和/或电压变化技术的速率检测到电弧条件时实现大约10％的实质电压反转。 电压的这种反转保持足够长以允许在恢复初始驾驶状况之前在等离子体内恢复均匀的电荷密度。 用于防止电弧放电的技术包括周期性地施加反向电压通过电源中的定时器系统来实现。

公开(公告)号：US5221416A

公开(公告)日：1993-06-22

申请号：US708870

申请日：1991-05-31

Applicant: Toshinori Kishi ,  Michiyoshi Nagashima ,  Fumiaki Ueno ,  Taro Nambu ,  Hiroyuki Ogawa

Inventor： Toshinori Kishi ,  Michiyoshi Nagashima ,  Fumiaki Ueno ,  Taro Nambu ,  Hiroyuki Ogawa

IPC: G03F7/42 ,  H01J37/32

CPC classification number: H01J37/32018 ,  G03F7/427 ,  H01J37/32027 ,  H01J37/32045 ,  H01J2237/3342

Abstract: In a plasma surface treating method, a sample to be treated is supported on a first electrode within a vacuum vessel and a second electrode is caused to confront the first electrode. Active species of negative ions are then generated by means of a direct current glow discharge produced in an abnormal glow discharge region and are subsequently impinged upon a surface of the sample to induce a chemical reaction with the sample.

Abstract translation: 在等离子体表面处理方法中，待处理样品被支撑在真空容器内的第一电极上，并且使第二电极与第一电极相对。 然后通过在异常辉光放电区产生的直流辉光放电产生负离子的活性物质，随后撞击在样品的表面上以引起与样品的化学反应。

公开(公告)号：US11948774B2

公开(公告)日：2024-04-02

申请号：US17223941

申请日：2021-04-06

Applicant: Servomex Group Limited

Inventor： Bahram Alizadeh ,  Martin Lopez

IPC: H01J37/32 ,  G01J3/443 ,  G01N21/67 ,  G01N21/68 ,  H05H1/00 ,  H05H1/24 ,  H05H1/46

CPC classification number: H01J37/32045 ,  G01J3/443 ,  G01N21/67 ,  G01N21/68 ,  H01J37/32018 ,  H01J37/32449 ,  H01J37/32926 ,  H01J37/32935 ,  H01J37/32981 ,  H05H1/0037 ,  H05H1/4697 ,  H01J37/32568 ,  H01J37/32972 ,  H01J37/3299 ,  H01J2237/334

Abstract: Methods and apparatus for determination of the gas composition of a sample gas using glow discharge optical emission spectroscopy, in which the method comprises: generating one or more oscillating electromagnetic fields within a plasma cell to excite particles within the cell, to produce a glow discharge plasma in the plasma cell, and controlling the operating conditions for the plasma cell while flowing a gas mixture through the plasma cell to maintain glow discharge optical emissions from the plasma within a desired operating range; and monitoring one or more glow discharge optical emissions from the plasma in the plasma cell by measuring the optical emissions, or measuring a signal that correlates with the optical emissions, at twice the plasma excitation frequency; and processing the signal during each excitation cycle of the electromagnetic excitation, to determine the concentration of a gas within a gas mixture flowing through the plasma cell.

公开(公告)号：US11810757B1

公开(公告)日：2023-11-07

申请号：US18149893

申请日：2023-01-04

Applicant: VELVETCH LLC

Inventor： Samir John Anz ,  David Irwin Margolese ,  William Andrew Goddard ,  Stewart Francis Sando

IPC: H01J37/32 ,  H01L21/3065

CPC classification number: H01J37/32045 ,  H01J37/32027 ,  H01L21/3065 ,  H01J2237/3341

Abstract: Atomic layer etching of a substrate using a wafer scale wave of precisely controlled electrons is presented. A volume of gaseous plasma including diluent and reactive species and electrons of a uniform steady state composition is generated in a positive column of a DC plasma proximate the substrate. A corrosion layer is formed on the substrate by adsorption of the reactive species to atoms at the surface of the substrate. The substrate is positively biased to draw electrons from the volume to the surface of the substrate and impart an energy to the electrons so to stimulate electron transitions in the corrosion layer species, resulting in ejection of the corrosion layer species via electron stimulation desorption (ESD). The substrate is negatively biased to repel the electrons from the surface of the substrate back to the volume, followed by a zero bias to restore the steady state composition of the volume.

公开(公告)号：US11651937B2

公开(公告)日：2023-05-16

申请号：US17086414

申请日：2020-11-01

Applicant: FYZIKALNI USTAV AV CR, V.V.I

Inventor： Zden{hacek over (e)}k Hubi{hacek over (c)}ka ,  Martin {hacek over (C)}ada ,  Petra K{hacek over (s)}írová ,  Miloslav Klinger

IPC: H01J37/32 ,  C23C14/04 ,  C23C14/34

CPC classification number: H01J37/32027 ,  C23C14/046 ,  C23C14/3407 ,  C23C14/3485 ,  H01J37/32045 ,  H01J37/32091 ,  H01J37/32394 ,  H01J37/32596 ,  H01J2237/002 ,  H01J2237/332

Abstract: The present invention resides in the unifying idea of synchronizing a positive voltage pulse supplied to an electrically conductive or ferromagnetic tube and a exciting negative voltage pulse on a hollow cathode induced on the background of a high-frequency capacitive discharge.
In one embodiment, the invention relates to a method of generating low-temperature plasma in a vacuum chamber comprising a hollow cathode and an electrode, the method comprising the step of igniting the pulsed DC discharge in the hollow cathode wherein the positive voltage pulse at least partially overlaps with the negative voltage pulse, and the positive voltage pulse at least partially overlaps with the negative voltage pulse on the hollow cathode.
In another embodiment, the present invention relates to a method of coating the inner walls of hollow tubes which utilizes the above-mentioned low-temperature plasma generation process.
In another embodiment, the invention relates to a low-temperature plasma generating device comprising a hollow cathode located in the vacuum chamber, a RF plasma source, a pulse DC burst source, and a bipolar pulse source.
In another embodiment, an object of the invention is an apparatus adapted to coat the inner sides of hollow tubes comprising a low-temperature plasma generating device.

公开(公告)号：US20180226225A1

公开(公告)日：2018-08-09

申请号：US15424405

申请日：2017-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： TRAVIS KOH ,  PHILIP ALLAN KRAUS ,  LEONID DORF ,  PRABU GOPALRAJA

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/67

CPC classification number: H01J37/32045 ,  H01J37/32027 ,  H01J37/32697 ,  H01J37/32715 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6833

Abstract: Systems and methods for tunable workpiece biasing in a plasma reactor are provided herein. In some embodiments, a system includes: a plasma chamber that performs plasma processing on a workpiece, a first pulsed voltage source, coupled directly to a workpiece, a second pulsed voltage source, coupled capacitively to the workpiece, and a biasing controller comprising one or more processors, and memory, wherein the memory comprises a set of computer instructions that when executed by the one or more processors, independently controls the first pulsed voltage source and the second pulsed voltage source based on one or more parameters of the first pulsed voltage source and the second pulsed voltage source in order to tailor ion energy distribution of the flux of ions directed to the workpiece.

公开(公告)号：US09922802B2

公开(公告)日：2018-03-20

申请号：US14376697

申请日：2013-02-19

Applicant: Tokyo Electron Limited

Inventor： Taichi Hirano ,  Fumitoshi Kumagai

IPC: H01J37/32 ,  H05H1/46 ,  H01L21/311 ,  G05B11/01 ,  H01L21/768

CPC classification number: H01J37/32045 ,  G05B11/01 ,  H01J37/32027 ,  H01J37/32091 ,  H01J37/32935 ,  H01J2237/06 ,  H01J2237/3343 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76802 ,  H05H1/46 ,  H05H2001/4682 ,  Y10T307/367

Abstract: A power supply system 90 includes high frequency power supplies 92 and 93 that supply a high frequency power for plasma generation; a DC power supply 91 that supplies a DC voltage to be applied to an electrode; and control unit 94 that controls the high frequency power supplies 92 and 93 and the DC power supply 91 including a first DC power supply unit 101 that supplies a first negative DC voltage V1, a second DC power supply unit 102 that supplies a second negative DC voltage V2 having a higher absolute value than the first negative DC voltage V1, and a selecting circuit 103 that selectively connects the first DC power supply unit 101 and the second DC power supply unit 102 to the electrode; and a discharging circuit 104 connected with a node 109 between the first DC power supply unit 101 and the selecting circuit 103.

公开(公告)号：US20160358752A1

公开(公告)日：2016-12-08

申请号：US15169768

申请日：2016-06-01

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： YOSHIHIRO SAKAGUCHI ,  SHIN-ICHI IMAI

IPC: H01J37/32 ,  C02F1/48 ,  A61L2/14

CPC classification number: H01J37/32064 ,  A61L2/14 ,  C02F1/4608 ,  C02F2303/04 ,  H01J37/32036 ,  H01J37/32045 ,  H01J37/32816 ,  H01J37/32825 ,  H05H1/48 ,  H05H2001/4682

Abstract: A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage.

Abstract translation: 一种等离子体产生装置包括：一对电极，其通过施加在该对电极之间的电压使大气压产生等离子体; 以及包括具有0.9以上且0.9999以下的耦合系数的升压变压器并产生电压的电源。

公开(公告)号：US09379636B2

公开(公告)日：2016-06-28

申请号：US14388807

申请日：2013-03-29

Applicant: GEO27 S.A.R.L.

Inventor： Fabrice Cubaines

IPC: H02M7/06 ,  H03K3/021 ,  H01J37/32

CPC classification number: H02M7/06 ,  H01J37/32027 ,  H01J37/32045 ,  H03K3/021

Abstract: A method for generating current pulses and a current generator having a plurality of secondary stages. Each secondary stage has a DC voltage source and a switching circuit having four switches, connected together so as to form a line. One secondary stage being designated as a regulator stage has a regulator circuit having a smoothing inductor, a switch arranged between a terminal of the smoothing inductor and the DC voltage source, and a circuit for connecting the terminal of the smoothing inductor to the switching circuit when the switch of the regulator circuit is in a locked state. A control circuit of the current generator controls the switches of the switching circuits and the switch of the regulator circuit.

Abstract translation: 一种用于产生电流脉冲的方法和具有多个次级级的电流发生器。 每个次级具有DC电压源和具有四个开关的开关电路，连接在一起形成一条线。 被指定为调节器级的一个次级具有调节器电路，其具有平滑电感器，布置在平滑电感器的端子与直流电压源之间的开关和用于将平滑电感器的端子连接到开关电路的电路， 调节器电路的开关处于锁定状态。 电流发生器的控制电路控制开关电路的开关和调节器电路的开关。