公开(公告)号：US20200234914A1

公开(公告)日：2020-07-23

申请号：US15757333

申请日：2018-02-07

Applicant: Focus-eBeam Technology (Beijing) Co., Ltd.

Inventor： Shuai Li ,  Wei He

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/145 ,  H01J37/147

Abstract: A low voltage scanning electron microscope is disclosed, which includes: an electron source configured to generate an electron beam; an electron beam accelerator configured to accelerate the electron beam; a compound objective lens configured to converge the electron beams accelerated by the electron beam accelerator; a deflection device arranged between the inner wall of the magnetic lens and the optical axis of the electron beam and configured to deflect the electron beam; a detection device comprising a first sub-detection device for receiving secondary and backscattered electrons from the specimen, a second sub-detection device for receiving backscattered electrons, and a control device for changing the trajectories of the secondary electrons and the backscattered electrons; an electrostatic lens comprising the second sub-detection device, a specimen stage, and a control electrode for reducing the moving speed of the electron beam and changing the moving directions of the secondary and the backscattered electrons.

公开(公告)号：US20200227231A1

公开(公告)日：2020-07-16

申请号：US16743250

申请日：2020-01-15

Applicant: Tzu-Yi Kuo ,  Yu-Kuang Tseng

Inventor： Tzu-Yi Kuo ,  Yu-Kuang Tseng

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/147 ,  H01L21/687

Abstract: An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.

公开(公告)号：US20200176216A1

公开(公告)日：2020-06-04

申请号：US16686316

申请日：2019-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Atsushi ANDO ,  Munehiro OGASAWARA

IPC: H01J37/145 ,  H01J37/20 ,  H01J37/28

Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power source connected to the electrodes.

公开(公告)号：US10593510B2

公开(公告)日：2020-03-17

申请号：US16294017

申请日：2019-03-06

Applicant: International Business Machines Corporation

Inventor： Rudolf M. Tromp

IPC: H01J37/153 ,  H01J37/29 ,  H01J37/145 ,  H01J37/147

Abstract: An electron microscope system and a method of measuring an aberration of the electron microscope system are disclosed. A method of controlling an aberration of an electron microscope includes obtaining a dispersed energy distribution for electrons at a diffraction plane of the electron microscope and placing an aperture at a selected location of the dispersed energy distribution in the diffraction plane. The method measures displacement of an image of the aperture in an image plane of the electron microscope for the selected location of the aperture. The method determines an aberration coefficient of the electron microscope from the measured displacement and the selected location of the aperture and alters a parameter of an element of the electron microscope to control the aberration of the electron microscope based at least in part on the determined aberration coefficient.

公开(公告)号：US09953805B2

公开(公告)日：2018-04-24

申请号：US15364060

申请日：2016-11-29

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mhH

Inventor： Matthias Firnkes ,  Stefan Lanio ,  Dieter Winkler

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/22 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145

CPC classification number: H01J37/244 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/0453 ,  H01J2237/1202 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: A secondary charged particle imaging system for imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The system includes a detector arrangement, and an adaptive secondary charged particle optics. The detector arrangement comprises a first detection element for detecting a first secondary charged particle sub-beam of the secondary charged particle beam, and a second detection element for detecting a second secondary charged particle sub-beam of the secondary charged particle beam. The adaptive secondary charged particle optics comprises an aperture plate including a first opening for letting the first secondary charged particle sub-beam pass through and a second opening for letting the second secondary charged particle sub-beam pass through; a lens system for mapping the secondary charged particle beam onto the aperture plate, the lens system comprising a first lens and a second lens; and a controller for controlling the excitation of the first lens and the excitation of the second lens. The controller is configured to independently control the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the aperture plate so that the first secondary charged particle sub-beam passes through the first opening and the second secondary charged particle sub-beam passes through the second opening independent of a variation of at least one first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample.

公开(公告)号：US20160351371A1

公开(公告)日：2016-12-01

申请号：US14940102

申请日：2015-11-12

Applicant: Shuai Li ,  Wei He ,  Zhongwei Chen

Inventor： Shuai Li ,  Wei He ,  Zhongwei Chen

IPC: H01J37/145 ,  H01J37/28 ,  H01J37/21 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/2802

Abstract: The present invention provides a scanning transmission electron microscope (STEM). In the STEM, a specimen is sandwiched between a variable axis objective lens and a variable axis collection lens. The axis of the collection lens varies along with the variation of the objective lens axis in a coordinated manner. The STEM of the invention exhibits technical merits such as large scanning field, high image resolution across the entire scanning field, and high throughput, among others.

Abstract translation: 本发明提供扫描透射电子显微镜（STEM）。 在STEM中，将样本夹在可变轴物镜和可变轴收集透镜之间。 收集透镜的轴线随着物镜轴的协调变化而变化。 本发明的STEM具有如扫描场大，整个扫描场的高图像分辨率，高通量等技术优点。

公开(公告)号：US09165745B2

公开(公告)日：2015-10-20

申请号：US14196190

申请日：2014-03-04

Applicant: Tao Luo

Inventor： Tao Luo

IPC: H01J37/145 ,  H01J37/14 ,  H01J37/143 ,  H01J3/20

CPC classification number: H01J37/14 ,  H01J3/20 ,  H01J37/143 ,  H01J37/145 ,  H01J2237/1405

Abstract: An apparatus includes a magnetic adjustment lens positioned at the electron beam path between the electron source and sample, the magnetic adjustment lens excited by an electric coil, and a permanent magnet lens positioned below the magnetic adjustment lens to focus the electron beam onto the sample surface, the permanent magnet lens excited by one or more permanent ring magnets enclosed except on a bottom surface by a magnetic field conductor. The magnetic adjustment lens may be excited to eliminate magnetic field leakage of the permanent magnet lens.

Abstract translation: 一种设备包括位于电子源和样品之间的电子束路径处的磁调节透镜，由电线圈激励的磁调节透镜和位于磁调节透镜下方的永磁体透镜，以将电子束聚焦到样品表面上 由一个或多个永久环形磁体激励的永磁体透镜，除了在磁场表面之外被磁场导体所包围。 可以激励磁调节透镜以消除永磁体透镜的磁场泄漏。

公开(公告)号：US09159533B2

公开(公告)日：2015-10-13

申请号：US14334837

申请日：2014-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: A61N5/00 ,  G21G5/00 ,  H01J37/28 ,  H01J37/145 ,  G01N23/225

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US08319192B2

公开(公告)日：2012-11-27

申请号：US12862590

申请日：2010-08-24

Applicant: Weiming Ren

Inventor： Weiming Ren

IPC: H01J37/145

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28

Abstract: An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion lens orients its gap between an inner pole piece and an outer pole piece to specimen's surface, and uses a magnetic specimen stage. The electrostatic immersion lens comprises three or four electrodes which apply suitable retarding field to a primary beam of the charged particle device for reducing its landing energy on specimen surface and further eliminating imaging aberrations.

Abstract translation: 本发明提供一种用于带电粒子装置的电磁复合物镜，特别是作为低电压扫描电子显微镜（LVSEM）的物镜，其包括磁浸透镜和静电浸没透镜。 磁性浸没透镜将内极片和外极片之间的间隙定位到标本表面，并使用磁性样品台。 静电浸没透镜包括三个或四个电极，其将适当的延迟场施加到带电粒子装置的主光束，以降低其在样本表面上的着陆能量，并进一步消除成像像差。

公开(公告)号：US08164060B2

公开(公告)日：2012-04-24

申请号：US12832127

申请日：2010-07-08

Applicant: Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

Inventor： Xuedong Liu ,  Xu Zhang ,  Joe Wang ,  Edward Tseng ,  Zhongwei Chen

IPC: H01J37/244 ,  H01J37/145

CPC classification number: H01J37/145 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/24485 ,  H01J2237/2807

Abstract: System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

Abstract translation: 带电粒子束的系统和方法。 根据实施例，本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。