SPECTRAL FILTER AND SPECTROMETRIC DEVICE
    31.
    发明申请

    公开(公告)号:US20180095207A1

    公开(公告)日:2018-04-05

    申请号:US15559908

    申请日:2016-03-28

    CPC classification number: G02B5/28 G01J3/26 G01J3/28 G01J3/36

    Abstract: A spectral filter (10) is provided with a long-pass filter (12) and a short-pass filter (13). The long-pass filter (12) has a film thickness gradient GL wherein film thickness increases monotonically in a single direction, and transmits light of a wavelength region longer than a cut-off wavelength WL. The short-pass filter (13) has a film thickness gradient GS wherein film thickness increases monotonically in a single direction, and transmits light of a wavelength region shorter than a cut-off wavelength WS. The long-pass filter (12) and the short-pass filter (13) are overlapped such that the single directions match each other. At the positions in the single directions, a transmittance peak is formed by the cut-off wavelength WL being shorter than the cut-off wavelength WS. The film thickness gradient GL is greater than the film thickness gradient GS.

    MEASURING DEVICE AND MEASURING METHOD
    32.
    发明申请

    公开(公告)号:US20180087966A1

    公开(公告)日:2018-03-29

    申请号:US15714016

    申请日:2017-09-25

    Inventor: Tsugio GOMI

    CPC classification number: G01J3/46 B41F33/0036 G01J3/26 G01J3/50 G01J3/524

    Abstract: A measuring device is a measuring device that performs colorimetry of an evaluation patch formed on a medium and a paper white patch that is a portion exposed by the medium. The measuring device has a light source portion that irradiates the medium with an illumination light, a measurement portion that acquires an amount of light from the medium as a measurement value, a memory that holds a paper white standard value that is a reference measurement value of the paper white patch, and a colorimetry unit that corrects a measurement value of the evaluation patch based on the measurement value of the paper white patch and the paper white standard value. Even in a case where a measurement position is changed, a reflectance of the evaluation patch is accurately calculated and a chromaticity of the evaluation patch can be accurately acquired.

    CALIBRATION FOR FABRY PEROT SPECTRAL MEASUREMENTS

    公开(公告)号:US20180080825A1

    公开(公告)日:2018-03-22

    申请号:US15709370

    申请日:2017-09-19

    CPC classification number: G01J3/26 G01J3/0297 G01J3/28

    Abstract: A system for determining a calibrated spectral measurement includes a tunable Fabry-Perot etalon, a detector, and a processor. The tunable Fabry-Perot etalon has a settable gap. The detector measures light intensity transmitted through the tunable Fabry-Perot etalon. The processor is configured to determine the calibrated spectral measurement. The calibrated spectral measurement is based at least in part on a measurement set of detected light intensities for a plurality of settable gaps and a reconstruction matrix. The reconstruction matrix is based at least in part on calibration measurements using multiple source wavelengths and multiple settable gaps.

    DETECTOR FOR SPECTROMETRY SYSTEM
    36.
    发明申请

    公开(公告)号:US20180031468A1

    公开(公告)日:2018-02-01

    申请号:US15727291

    申请日:2017-10-06

    Applicant: Verifood, Ltd.

    Inventor: Ori Aphek

    Abstract: A compact spectrometer system comprising an improved detector is provided herein. The spectrometer system herein disclosed can comprises a filter, a Fourier transform optical element, and a detector. The detector can comprise a custom detector having a shape that corresponds to the pattern of light incident on the detector. The custom detector may comprise a plurality of separate detection areas, each area configured to detect a portion of the light pattern incident on the detector. The custom detector may comprise a material capable of detecting wavelengths in the short-wavelength infrared (SWIR) range. The custom detector may be configured to require a relatively low number of electrical connections such that it may be implemented using standard, low-cost electronic packaging techniques. An improved, custom detector as described herein can provide the functionality of a two-dimensional pixel array detector while being relatively simple and inexpensive to manufacture.

    Proximity focus imaging interferometer

    公开(公告)号:US09857223B2

    公开(公告)日:2018-01-02

    申请号:US14947238

    申请日:2015-11-20

    CPC classification number: G01J3/26 B81B7/00 G01J3/2803

    Abstract: An interferometer system comprising an optical detector including a substrate and a two-dimensional array of pixels disposed on the substrate is provided. The interferometer system may further comprise an interferometer disposed proximate the optical detector without an optical element between the interferometer and the optical detector. The interferometer may include a first plate positioned proximate the substrate and extending over the two-dimensional array of pixels, a second plate spaced apart from the first plate, the first and second plates defining an optical gap between them, and at least one actuatable spacer positioned between the first plate and the second plate and configured to space apart the first and second plates from one another and to selectively alter a thickness of the optical gap.

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