公开(公告)号：US20070151842A1

公开(公告)日：2007-07-05

申请号：US11610665

申请日：2006-12-14

Applicant: Richard DeVito ,  Martin Klein ,  Piero Sferlazzo

Inventor： Richard DeVito ,  Martin Klein ,  Piero Sferlazzo

IPC: C23C14/00 ,  C23C14/32

CPC classification number: C23C14/0073 ,  C23C14/0052 ,  C23C14/044 ,  C23C14/35 ,  C23C14/46 ,  C23C14/568 ,  H01J37/185 ,  H01J37/3178 ,  H01J37/3233 ,  H01J37/32761 ,  H01J37/34 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/3146

Abstract: A reactive sputtering system includes a vacuum chamber and a reactive ion source that is positioned inside the vacuum chamber. The reactive ion source generates a reactive ion beam from a reactant gas. A sputtering chamber is positioned in the vacuum chamber. The sputtering chamber includes a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber. A transport mechanism transports a substrate under the reactive ion source and through the sputtering chamber. The substrate is exposed to the reactive ion beam while passing under the reactive ion source and then is exposed to sputtering flux while passing through the sputtering chamber.

Abstract translation: 反应性溅射系统包括真空室和位于真空室内的反应离子源。 反应离子源从反应气体产生反应离子束。 溅射室位于真空室中。 溅射室包括溅射源，其具有产生溅射焊剂的溅射靶，含有惰性气体的壁和阻止反应气体进入溅射室的密封件，并阻止惰性气体和溅射材料逸出到真空中 房间。 输送机构将反应离子源下方的基板输送到溅射室。 当反应离子源通过时，将衬底暴露于反应离子束，然后在通过溅射室的同时暴露于溅射焊剂。

公开(公告)号：US4524261A

公开(公告)日：1985-06-18

申请号：US533822

申请日：1983-09-19

Applicant: Paul F. Petric ,  Michael S. Foley

Inventor： Paul F. Petric ,  Michael S. Foley

IPC: B01J3/00 ,  H01J37/18 ,  H01J37/317 ,  H01L21/027 ,  B23K15/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/18 ,  H01J37/3174 ,  H01J2237/0264 ,  H01J2237/162 ,  H01J2237/188 ,  H01J2237/2006

Abstract: Localized vacuum envelope apparatus includes a housing member having a bottom plate with a downwardly extending first sleeve and an upwardly extending flange. The flange includes ports for vacuum pumping and is adapted for attachment to an electron beam column. The apparatus further includes a lower plate having a second downwardly extending sleeve and an upper plate having a third downwardly extending sleeve. The first, second and third sleeves, which can have a truncated conical shape and are concentric, define vacuum zones. Channels are provided for connecting the vacuum zones to individual ports. The tips of the sleeves are coplanar and form the tip of the vacuum envelope. A noncontacting graded vacuum seal is formed between the tip of the vacuum envelope and a workpiece. The housing member and the upper plate can be ferromagnetic material to provide double magnetic shielding.

Abstract translation: 局部真空包封装置包括具有底板的壳体构件，底板具有向下延伸的第一套筒和向上延伸的凸缘。 凸缘包括用于真空泵送的端口，并且适于附接到电子束柱。 该装置还包括具有第二向下延伸套筒的下板和具有第三向下延伸套筒的上板。 可以具有截头圆锥形并且同心的第一，第二和第三套筒限定了真空区域。 提供通道用于将真空区域连接到各个端口。 袖子的尖端是共面的并形成真空外壳的尖端。 在真空外壳的尖端和工件之间形成非接触式分级真空密封。 外壳构件和上板可以是铁磁材料，以提供双重磁屏蔽。

公开(公告)号：US12040156B2

公开(公告)日：2024-07-16

申请号：US17609693

申请日：2020-09-24

Applicant: SHANGHAI NEMOR OPTOELECTRONIC TECHNOLOGY CO., LTD

Inventor： Xuan Tang ,  Jingwei Shen

IPC: H01J37/20 ,  H01J37/18

CPC classification number: H01J37/20 ,  H01J37/185 ,  H01J2237/2006 ,  H01J2237/204

Abstract: A sample protection device for a scanning electron microscope, the sample protection device comprising: a shell; an accommodating part having an accommodating space for accommodating a sample, the accommodating part being arranged in the shell in such a manner that the accommodating part can move relative to the shell, such that the accommodating part at least partially enters the shell or moves out of the shell; a sealing part connected to the accommodating part and configured to seal between the accommodating part and the shell when the accommodating part is at least partially accommodated in the shell; and a driving member configured to drive relative movement of the shell relative to the accommodating part.

公开(公告)号：US09865427B2

公开(公告)日：2018-01-09

申请号：US14704453

申请日：2015-05-05

Applicant: FEI COMPANY

Inventor： Martinus Petrus Maria Bierhoff ,  Bart Buijsse ,  Cornelis Sander Kooijman ,  Hugo Van Leeuwen ,  Hendrik Gezinus Tappel ,  Colin August Sanford ,  Sander Richard Marie Stoks ,  Steven Berger ,  Ben Jacobus Marie Bormans ,  Koen Arnoldus Wilhelmus Driessen ,  Johannes Antonius Hendricus W. G. Persoon

IPC: H01J37/26 ,  H01J37/18 ,  H01J37/21 ,  H01J37/302 ,  H01J37/16 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively.

公开(公告)号：US20170212428A1

公开(公告)日：2017-07-27

申请号：US15481619

申请日：2017-04-07

Applicant: Carl Zeiss SMT GmbH

Inventor： Matthias Roos ,  Eugen Foca

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/70841 ,  G03F7/70916 ,  H01J2237/022 ,  H01J2237/2006 ,  H01J2237/20221

Abstract: A vacuum linear feed-through (20), e.g., for an EUV lithography system, includes: a vacuum diaphragm bellows (21), which has a first end (21a) attaching a component and a second end (21b), opposite the first end, attaching to a vacuum housing, and an actuator device (27) generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (30, 30′), connected to the bellows at the first end, and at least one second shield (31, 31′), connected to the bellows at the second end. The first and second shield annularly surround the bellows, and the first and second shield overlap in the longitudinal direction of the bellows (21). At least one first shield and at least one second shield are formed of a permanently magnetic material, and/or the feed-through has a voltage-generating device (33) generating an electric field (E) between the first shield and the second shield.

公开(公告)号：US20160155606A1

公开(公告)日：2016-06-02

申请号：US15014516

申请日：2016-02-03

Applicant: B-NANO LTD.

Inventor： Dov SHACHAL

IPC: H01J37/285 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/20 ,  H01J37/285 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

公开(公告)号：US20150255244A1

公开(公告)日：2015-09-10

申请号：US14438691

申请日：2013-10-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Hiroyuki Suzuki

IPC: H01J37/16 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006 ,  H01J2237/20221 ,  H01J2237/20235 ,  H01J2237/28

Abstract: A sample storage container of the present invention includes: a storage container (100) that stores a sample (6) under an atmosphere different from an atmosphere of an outside; a diaphragm (10) through which a charged particle beam passes through or transmits; a sample stage (103) that is arranged inside the storage container (100) and that is capable of moving a relative position of the sample (6) to the diaphragm (10) in a horizontal direction and in a vertical direction under an atmospheric state where the atmospheric states inside the storage container and outside the storage container are different each other; and an operating section (104) that moves the sample stage (103) from an outside of the storage container (100), wherein the sample storage container is set in a state where the sample (6) is stored in a vacuum chamber of a charged particle beam apparatus.

Abstract translation: 本发明的样品储存容器包括：储存容器（100），其在不同于外部气氛的气氛下存储样品（6）; 带电粒子束穿过或透过的隔膜（10）; 布置在储存容器（100）的内部并且能够在大气压下沿水平方向和垂直方向将样品（6）的相对位置移动到隔膜（10）的样品台（103） 存储容器内部和储存容器外的大气状态彼此不同; 以及从所述存储容器（100）的外部移动所述样品台（103）的操作部（104），其中，所述样本收纳容器被设定为将样品（6）储存在所述储存容器 带电粒子束装置。

公开(公告)号：US08779358B2

公开(公告)日：2014-07-15

申请号：US13449392

申请日：2012-04-18

Applicant: Dov Shachal

Inventor： Dov Shachal

IPC: G01N23/00

CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

公开(公告)号：US20140158907A1

公开(公告)日：2014-06-12

申请号：US14101460

申请日：2013-12-10

Applicant: JEOL Ltd.

Inventor： Mitsuru Hamochi

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/0216 ,  H01J2237/2006 ,  H01J2237/202 ,  H01J2237/204

Abstract: A specimen positioning device (100) is for use in or with a charged particle beam system having a specimen chamber (1) and has: a base (10) provided with a hole (12) in operative communication with the specimen chamber (1); a specimen holder (20) movably mounted in the hole (12) and having a first portion (22) and a second portion (24); and a first portion support portion (40) supporting the first portion (22) in the specimen chamber (1). The second portion (24) supports the first portion (22) via a resilient member (34).

Abstract translation: 一种试样定位装置（100）用于具有试样室（1）的带电粒子束系统中或与其一起使用，具有：具有与试样室（1）可操作连通的孔（12）的基座（10） ; 可移动地安装在孔（12）中并且具有第一部分（22）和第二部分（24）的样本保持器（20）; 以及支撑所述标本室（1）中的所述第一部分（22）的第一部分支撑部分（40）。 第二部分（24）经由弹性构件（34）支撑第一部分（22）。

公开(公告)号：US20120241608A1

公开(公告)日：2012-09-27

申请号：US13449392

申请日：2012-04-18

Applicant: Dov Shachal

Inventor： Dov Shachal

IPC: H01J37/28

CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。