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    Charged particle beam device
    36.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US11929231B2

    公开(公告)日：2024-03-12

    申请号：US17725151

    申请日：2022-04-20

    Applicant: HITACHI HIGH-TECH CORPORATION

    Inventor： Akito Tanokuchi ,  Seiichiro Kanno ,  Kei Shibayama

    IPC: H01J37/20 ,  H01J37/28

    CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/202

    Abstract: A charged particle beam device suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. The charged particle beam device includes the electrostatic chuck mechanism; a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.

    Sample Holder, Intermembrane Distance Adjustment Mechanism, and Charged Particle Beam Device
    37.
    发明公开
    Sample Holder, Intermembrane Distance Adjustment Mechanism, and Charged Particle Beam Device 审中-公开

    公开(公告)号：US20240079201A1

    公开(公告)日：2024-03-07

    申请号：US17767595

    申请日：2019-10-10

    Applicant: Hitachi High-Tech Corporation ,  National Institute of Advanced Industrial Science and Technology

    Inventor： Michio HATANO ,  Mitsuhiro NAKAMURA ,  Toshihiko OGURA

    IPC: H01J37/20

    CPC classification number: H01J37/20 ,  H01J37/28

    Abstract: A sample holder reliably holds a liquid or gel sample, and the yield of observation with a charged particle beam device is improved. A sample holder 101 includes a first member 102 that has a lid member 111 and a first chip 105 provided with a first window 123 where a laminated film including a first insulating thin film 104 is formed, and a second member 103 that has a base material 127 having a first bottom seal surface 203 and a second bottom seal surface 200, an electrode 108 disposed on the base material, and a second chip 107 provided with a second window 124 where a second insulating thin film 106 is formed and held on the second bottom seal surface via a second seal material 119 such that the second window faces the electrode, in which a region inside a first seal material is maintained airtightly from a region outside the first seal material by the first member and the second member being combined and the first seal material being crushed between the first bottom seal surface and an upper seal surface of the lid member.

    Application Management For Charged Particle Microscope Devices
    38.
    发明公开
    Application Management For Charged Particle Microscope Devices 审中-公开

    公开(公告)号：US20240071717A1

    公开(公告)日：2024-02-29

    申请号：US17823669

    申请日：2022-08-31

    Applicant: FEI Company

    Inventor： Pavel Potocek ,  Maurice Peemen ,  Remco Schoenmakers

    IPC: H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/265 ,  H01J37/28 ,  H01J2237/31745

    Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, an example method may comprise receiving, by a first device located at a premises and from a second device located external to the premises, and via a network, configuration data for a charged particle microscope located at the premises. The method may comprise updating, by the first device and based on the configuration data, one or more configuration settings associated with the charged particle microscope. The method may comprise causing, based on the updated one or more configuration settings, one or more operations associated with the charged particle microscope to be performed.

    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
    39.
    发明公开
    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS 审中-公开

    公开(公告)号：US20240071713A1

    公开(公告)日：2024-02-29

    申请号：US18270707

    申请日：2021-12-09

    Applicant: ASML Netherlands B.V.

    Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

    IPC: H01J37/20

    CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

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