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    Mid-infrared lens and manufacturing method thereof
    34.
    发明授权
    Mid-infrared lens and manufacturing method thereof 有权

    公开(公告)号：US11703615B2

    公开(公告)日：2023-07-18

    申请号：US17212357

    申请日：2021-03-25

    Applicant: Chih-Wei Yuan ,  Kuo-Tai Huang

    Inventor： Chi-Chou Yuan

    IPC: B05D1/18 ,  G02B3/04 ,  G02B1/10 ,  B05D3/02 ,  G02C7/02

    CPC classification number: G02B3/04 ,  B05D1/18 ,  B05D3/0263 ,  G02B1/10 ,  G02C7/02

    Abstract: The present invention relates to a manufacturing method for a mid-infrared lens, which includes the following steps: placing a lens in the path of a far-infrared radiation source, enabling the lens to receive the far infrared rays; immersing the lens in a hardening liquid, causing the hardening liquid to coat the lens, wherein the hardening liquid is an intermixture of silicone and isopropanol or an intermixture of silicone and methanol, and a far-infrared material or a far-infrared composite material is additionally added to the hardening liquid; placing the lens coated with the hardening liquid in a drying space to dry, causing the hardening liquid to dry and harden and form a hardened layer on the surface of the lens. The temperature of the drying space lies between 80 and 120° C., and the drying time lies between 1 and 10 hours.

    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    38.
    发明申请
    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS 有权

    公开(公告)号：US20230101475A1

    公开(公告)日：2023-03-30

    申请号：US17947747

    申请日：2022-09-19

    Applicant: SCREEN Holdings Co., Ltd.

    Inventor： Takashi IZUTA ,  Hiroki TAJIRI ,  Masayuki ORISAKA

    IPC: B05D1/18 ,  B05C3/04 ,  B05C11/10

    Abstract: A substrate processing method is executed by a substrate processing apparatus. The substrate processing apparatus includes a processing tank, and a bubble supply pipe disposed in the processing tank. In the substrate processing method, a substrate holding section immerses a substrate in an alkaline processing liquid stored in the processing tank. A bubble supply section supplies bubbles to the alkaline processing liquid from below the substrate with the substrate immersed in the alkaline processing liquid, the bubbles being supplied from a plurality of bubble holes provided in the bubble supply pipe.

    MONOLAYER DEPOSITION OF NANOPARTICLES
    39.
    发明申请
    MONOLAYER DEPOSITION OF NANOPARTICLES 有权

    公开(公告)号：US20230095274A1

    公开(公告)日：2023-03-30

    申请号：US17794429

    申请日：2021-01-21

    Applicant: NanoClear Technologies, Inc.

    Inventor： Harold Frank GREER ,  Rehan KAPADIA ,  Angelica SAENZ ,  David WEBBER

    IPC: B05D1/18 ,  C09D7/40 ,  B05D3/12 ,  B05D7/00

    Abstract: Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.

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