公开(公告)号：US20120049064A1

公开(公告)日：2012-03-01

申请号：US12862590

申请日：2010-08-24

Applicant: WEIMING REN

Inventor： WEIMING REN

IPC: H01J37/145 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/28

Abstract: An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion lens orients its gap between an inner pole piece and an outer pole piece to specimen's surface, and uses a magnetic specimen stage. The electrostatic immersion lens comprises three or four electrodes which apply suitable retarding field to a primary beam of the charged particle device for reducing its landing energy on specimen surface and further eliminating imaging aberrations.

Abstract translation: 本发明提供一种用于带电粒子装置的电磁复合物镜，特别是作为低电压扫描电子显微镜（LVSEM）的物镜，其包括磁浸透镜和静电浸没透镜。 磁性浸没透镜将内极片和外极片之间的间隙定位到标本表面，并使用磁性样品台。 静电浸没透镜包括三个或四个电极，其将适当的延迟场施加到带电粒子装置的主光束，以降低其在样本表面上的着陆能量，并进一步消除成像像差。

公开(公告)号：US06949745B2

公开(公告)日：2005-09-27

申请号：US10438145

申请日：2003-05-14

Applicant: Akira Yonezawa

Inventor： Akira Yonezawa

IPC: H01J37/244 ,  H01J37/145 ,  H01J37/28 ,  G21K7/00 ,  G01K1/08

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/2449

Abstract: An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with the optical axis for focusing the electron beam onto a sample which is subjected to a negative voltage so that secondary electrons are emitted from the sample. The magnetic field lens has a conductive cylinder surrounding a part of the optical axis to permit the passage therethrough of an electron beam from the electron beam source. A first detector detects secondary electrons emitted by the sample in a direction away from the optical axis and is disposed at a position generally confronting the conductive cylinder. A second detector is disposed over the conductive cylinder. A Wien filter deflector deflects secondary electrons emitted by the sample toward and for detection by the second detector. The Wien filter deflector is disposed on the optical axis and between the conductive cylinder and the second detector.

Abstract translation: 电子束装置具有光轴，用于产生沿着光轴定向的电子束的电子束源和具有与光轴重合的轴的磁场透镜，用于将电子束聚焦到经受 负电压使得二次电子从样品发射。 磁场透镜具有围绕光轴的一部分的导电圆柱体，以允许电子束从电子束源通过。 第一检测器检测样品沿远离光轴的方向发射的二次电子，并且设置在通常面对导电圆柱体的位置。 第二检测器设置在导电圆柱体上。 维恩滤波器偏转器将由样本发射的二次电子偏转并由第二检测器检测。 维恩滤波器偏转器设置在光轴上并且在导电圆柱体和第二检测器之间。

公开(公告)号：US20050104006A1

公开(公告)日：2005-05-19

申请号：US10990498

申请日：2004-11-18

Applicant: Takaho Yoshida ,  Takeshi Kawasaki

Inventor： Takaho Yoshida ,  Takeshi Kawasaki

IPC: G21K1/08 ,  G21K5/04 ,  H01J37/12 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J37/153

Abstract: The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus. An intermediate potential region different from the ground potential of an aberration corrector is provided in the space between the stages of multipole lenses constructing the aberration corrector to adjust a potential. Using this, when selecting an incident (outgoing) condition, an outgoing (incident) condition can be adjusted.

Abstract translation: 本发明提供一种像差校正器，其在装入的带电粒子束装置的设定光学条件之外的条件下起作用。 在构成像差校正器的多极透镜的阶段之间的空间中设置与像差校正器的接地电位不同的中间电位区域，以调整电位。 使用此方法，当选择事件（输出）条件时，可以调整输出（事件）条件。

公开(公告)号：US5973332A

公开(公告)日：1999-10-26

申请号：US98432

申请日：1998-06-17

Applicant: Masato Muraki ,  Susumu Gotoh

Inventor： Masato Muraki ,  Susumu Gotoh

IPC: G21K5/10 ,  H01J37/145 ,  H01J37/153 ,  H01J37/302 ,  H01J37/317

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/153 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/1534

Abstract: An electron beam exposure apparatus which minimizes the influence of the space charge effect and aberrations of a reduction electron optical system, and simultaneously, increases the exposure area which can be exposed at once, thereby increasing the throughput. An electron beam exposure apparatus having a source for emitting an electron beam and a reduction electron optical system for reducing and projecting, on a target exposure surface, an image of the source, includes a correction electron optical system which is arranged between the source and the reduction electron optical system to form a plurality of intermediate images of the source along a direction perpendicular to the optical axis of the reduction electron optical system, and corrects in advance aberrations generated when the intermediate images are reduced and projected on the target exposure surface by the reduction electron optical system.

Abstract translation: 减小电子光学系统的空间电荷效应和像差的影响最小化的电子束曝光装置，同时增加可以一次曝光的曝光面积，从而提高生产量。 具有用于发射电子束的电子束曝光装置和用于在目标曝光表面上减少和投影源的图像的还原电子光学系统包括校正电子光学系统，其布置在源和 还原电子光学系统，以沿着与还原电子光学系统的光轴垂直的方向形成源的多个中间图像，并且预先校正当中间图像被减少并投影在目标曝光表面上时的像差 还原电子光学系统。

公开(公告)号：US5895917A

公开(公告)日：1999-04-20

申请号：US877601

申请日：1997-06-18

Applicant: Koshi Ueda ,  Toshimichi Iwai ,  Gerald Schonecker ,  Jurgen Frosien

Inventor： Koshi Ueda ,  Toshimichi Iwai ,  Gerald Schonecker ,  Jurgen Frosien

IPC: H01J37/141 ,  H01J37/145 ,  H01J37/12

CPC classification number: H01J37/145 ,  H01J2237/2594

Abstract: The invention relates to a detector objective lens and a charged particle am device with such a detector objective lens containing a main lens for focussing a charged particle beam on a specimen, which consists of a magnetic lens (60) and an electrostatic lens (61) and a detector (62) disposed in front of the magnetic lens (60) in the direction of the charged particle beam (2) for detecting the charged particles released at the specimen (8). An additional lens is provided for influencing the released charged particles, which generates an electrostatic and/or magnetic field and is disposed between the main lens and the detector, the fields of the main lens and said additional lens being substantially separated from each other.

Abstract translation: 本发明涉及一种具有这种检测器物镜的检测器物镜和带电粒子束装置，该检测器物镜包含用于将带电粒子束聚焦在由磁性透镜（60）和静电透镜（61）组成的样本上的主透镜， 以及检测器（62），其沿着带电粒子束（2）的方向设置在磁性透镜（60）的前方，用于检测在样本（8）处释放的带电粒子。 提供了附加透镜来影响释放的带电粒子，其产生静电场和/或磁场，并且设置在主透镜和检测器之间，主透镜和所述附加透镜的场基本上彼此分离。

公开(公告)号：US5780859A

公开(公告)日：1998-07-14

申请号：US791091

申请日：1997-01-29

Applicant: Hans-Peter Feuerbaum ,  Jurgen Frosien ,  Koshi Ueda ,  Toshimichi Iwai ,  Gerald Schonecker

Inventor： Hans-Peter Feuerbaum ,  Jurgen Frosien ,  Koshi Ueda ,  Toshimichi Iwai ,  Gerald Schonecker

IPC: H01J37/145 ,  G01Q30/20 ,  H01J49/06

CPC classification number: H01J37/145 ,  H01J49/067 ,  H01J2237/2594

Abstract: An electrostatic-magnetic lens arrangement is for focusing charged particles as well as a charged particle beam device with such a lens arrangement which has a magnetic lens and an electrostatic lens incorporated into the magnetic lens, the magnetic lens being constructed as a single-pole lens.

Abstract translation: 静电磁性透镜装置用于聚焦带电粒子以及具有这种透镜装置的带电粒子束装置，该透镜装置具有并入到磁性透镜中的磁性透镜和静电透镜，该磁性透镜被构造为单极透镜 。

公开(公告)号：US5371371A

公开(公告)日：1994-12-06

申请号：US112802

申请日：1993-08-27

Applicant: Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Takamitsu Nagai

Inventor： Yuichiro Yamazaki ,  Motosuke Miyoshi ,  Takamitsu Nagai

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/145 ,  H01J37/15

CPC classification number: H01J37/073 ,  H01J2237/06316

Abstract: A magnetic immersion field emission electron gun has a vacuum vessel having a central axis in a predetermined direction, a cathode arranged along the central axis of the vacuum vessel for generating an electron beam, an anode for forming an electron beam path by accelerating a generated electron beam in the central axis direction, an electrostatic lens arranged between the cathode and anode for generating an electric field which focuses an accelerated electron beam toward the central axis, a magnetic field generating element arranged around the electron beam path for generating a magnetic field for focusing the electron beam in order to preventing a diameter of the electron beam from expansion by an aberration of the electrostatic lens, and a moving mechanism for moving the magnetic field generating element at a position where a peak point of a strength of the magnetic field generated by the magnetic field generating element coincides with a portion where the aberration of the electrostatic lens becomes most conspicuous. The electron gun having such a configuration can provide an effect of reducing a spherical and chromatic aberration by efficiently providing a lens characteristic to the electrostatic lens even though the entire length of electrostatic lens is long.

Abstract translation: 磁浸式场致发射电子枪具有沿预定方向具有中心轴的真空容器，沿着真空容器的中心轴布置的用于产生电子束的阴极，用于通过加速产生的电子形成电子束路径的阳极 在中心轴方向上形成光束，静电透镜，其布置在阴极和阳极之间，用于产生将加速电子束朝向中心轴聚焦的电场;围绕电子束路径设置的磁场产生元件，用于产生用于聚焦的磁场 电子束，以防止电子束的直径由于静电透镜的像差而膨胀;以及移动机构，用于使磁场产生元件移动到由磁场产生元件产生的磁场的强度的峰值点 磁场产生元件与电极的像差部分重合 tatic镜头变得最显眼。 具有这种结构的电子枪即使静电透镜的整个长度都很长，也可以通过有效地向静电透镜提供透镜特性来提供减小球面和色差的效果。

公开(公告)号：US4785176A

公开(公告)日：1988-11-15

申请号：US30964

申请日：1987-03-27

Applicant: Juergen Frosien ,  Erich Plies

Inventor： Juergen Frosien ,  Erich Plies

IPC: H01J37/12 ,  G01Q30/02 ,  H01J37/10 ,  H01J37/141 ,  H01J37/145 ,  H01J49/06

CPC classification number: H01J37/10 ,  H01J37/145

Abstract: An electrostatic-magnetic lens is provided having either a symmetrical or asymmetrical magnetic lens which is overlaid with an electrostatic immersion lens. One electrode of the immersion lens is formed as a hollow cylinder, which is within an upper pole piece of the magnetic lens concentrically relative to the axis of symmetry thereof and extending into the region of the pole piece gap. The lower pole piece of the magnetic lens is preferably at a ground potential and clad with the beam guiding tube for protection against contamination and forming the lower electrode of the electrostatic immersion lens.

Abstract translation: 提供具有与静电浸没透镜重叠的对称或非对称磁性透镜的静电磁透镜。 浸没透镜的一个电极形成为中空圆柱体，其位于磁性透镜的上极片内，相对于其对称轴线同心并延伸到极片间隙的区域中。 磁透镜的下极片优选为接地电位，并与光束引导管一起包围以防止污染并形成静电浸没透镜的下电极。

公开(公告)号：US20240258065A1

公开(公告)日：2024-08-01

申请号：US18424034

申请日：2024-01-26

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas ,  Kai Wicker ,  Bjoern Gamm ,  Yauheni Novikau ,  Ralf Wolleschensky

IPC: H01J37/21 ,  G06T7/00 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/153 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/21 ,  G06T7/0002 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/222 ,  H01J37/28 ,  G06T2207/10148 ,  G06T2207/20221 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/1534 ,  H01J2237/24578

Abstract: Particle beam systems, for example electron beam microscopes, exhibit improved resolution in a first direction by manipulating a beam of charged particles so that the beam has a non-circular beam profile in a focal plane of an objective lens. Multiple images of a sample can be recorded at different orientations of the beam profile relative to the sample, and the recorded images can be synthesized using non-uniform spatial-frequency weights to obtain an image of the sample having improved resolution in any direction. The orientation of the beam profile can be adjusted to a target orientation depending on a structure on a sample prior to recording an image of the sample, thereby making it possible to achieve highest resolution in a selected direction of interest.

公开(公告)号：US12027342B2

公开(公告)日：2024-07-02

申请号：US18363284

申请日：2023-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/14 ,  H01J37/12 ,  H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.