Spectrometer
    41.
    发明授权
    Spectrometer 有权
    光谱仪

    公开(公告)号:US09541451B2

    公开(公告)日:2017-01-10

    申请号:US14188276

    申请日:2014-02-24

    Abstract: A spectrometer includes: a tungsten lamp which emits light with no peak wavelength within a wavelength range of visible light and having a light amount increasing as the wavelength becomes longer; a violet LED which emits light having a peak wavelength within the wavelength range of visible light; a light mixer which mixes light emitted from the tungsten lamp and the violet LED; an etalon which receives light mixed by the light mixer and transmits light contained in the received mixed light and having a particular wavelength; a light receiving unit which receives light transmitted by the etalon; and a measurement control unit which changes the wavelength of light that can pass through the etalon and measures spectral characteristics of the light having passed through the etalon based on the light received by the light receiving unit.

    Abstract translation: 光谱仪包括:在可见光的波长范围内发射没有峰值波长的光并随着波长变长而光量增加的钨灯; 发出在可见光的波长范围内具有峰值波长的光的紫色LED; 将来自钨灯发出的光与紫色LED混合的光混合器; 接收由所述光混合器混合并发射包含在所述混合光中并具有特定波长的光的标准准则; 接收由标准具传输的光的光接收单元; 以及测量控制单元,其改变可以通过标准具的光的波长,并且基于由光接收单元接收的光来测量已经通过标准具的光的光谱特性。

    FLUORESCENCE HYPERSPECTRAL MICROSCOPY SYSTEM FEATURING STRUCTURED ILLUMINATION AND PARALLEL RECORDING
    44.
    发明申请
    FLUORESCENCE HYPERSPECTRAL MICROSCOPY SYSTEM FEATURING STRUCTURED ILLUMINATION AND PARALLEL RECORDING 有权
    荧光超高效显微镜系统特征结构照明与平行记录

    公开(公告)号:US20160320305A1

    公开(公告)日:2016-11-03

    申请号:US14741629

    申请日:2015-06-17

    Abstract: A fluorescence hyperspectral microscopy system featuring structured illumination and parallel recording includes a light projection sub-system, a detection sub-system, and an electrical controller. The light projection sub-system includes a digital light processing (DLP) module for generating linear excitation light, a first lens set, an optical path allocation element, and an objective lens. The detection sub-system includes a second lens set, a frequency-dividing reflection element, a two-dimensional light detector, and a light collection element. With the detection sub-system performing detection in conjunction with the light projection sub-system, and the electrical controller controlling the DLP module, a two-dimensional moving platform, and the two-dimensional light detector, the fluorescence hyperspectral microscopy system provides increased resolution and can obtain accurate information in spatial and spectral dimensions and hence a four-dimensional hyperspectral image of the object under detection.

    Abstract translation: 具有结构照明和并行记录的荧光高光谱显微系统包括光投影子系统,检测子系统和电控制器。 光投影子系统包括用于产生线性激发光的数字光处理(DLP)模块,第一透镜组,光路分配元件和物镜。 检测子系统包括第二透镜组,分频反射元件,二维光检测器和光收集元件。 通过检测子系统与光投影子系统进行检测,控制DLP模块的电气控制器,二维移动平台和二维光检测器,荧光高光谱显微系统提供更高的分辨率 并且可以在空间和光谱维度上获得准确的信息,并因此获得被检测物体的四维高光谱图像。

    MOBILE REFLECTANCE OPTICAL SPECTROSCOPY DEVICE AND PROCESS OF USING AND ASSEMBLING MOBILE REFLECTANCE OPTICAL SPECTROSCOPY DEVICE
    45.
    发明申请
    MOBILE REFLECTANCE OPTICAL SPECTROSCOPY DEVICE AND PROCESS OF USING AND ASSEMBLING MOBILE REFLECTANCE OPTICAL SPECTROSCOPY DEVICE 有权
    移动反射光学光学设备及其使用和组装移动光反射光学设备的方法

    公开(公告)号:US20160296118A1

    公开(公告)日:2016-10-13

    申请号:US14684638

    申请日:2015-04-13

    Applicant: ATOPTIX, LLC

    Abstract: Devices for reflectance spectroscopy, processes of assembling devices for reflectance spectroscopy, and health care processes of using reflectance optical spectroscopy devices are disclosed. The devices include a light source arranged and disposed to apply broadband light to sample, and a light-receiving feature configured to receive reflected light produced by the applying of the broadband light to the sample. The light-receiving feature is arranged and disposed to direct the reflected light to an optical detection system and isolate the reflected light from the broadband light. The optical detection system is capable of differentiating individual frequencies of the reflected light. The processes of assembling include removably positioning the devices on electronic devices. The health care processes include positioning the devices.

    Abstract translation: 公开了用于反射光谱的装置,用于反射光谱装配装置的工艺和使用反射光谱装置的保健工艺。 这些装置包括布置和布置以将样品宽带光应用的光源和被配置为接收通过将宽带光施加到样品产生的反射光的光接收特征。 光接收特征被布置和布置成将反射光引导到光学检测系统并将反射光与宽带光隔离。 光学检测系统能够区分反射光的各个频率。 组装过程包括将设备可拆卸地定位在电子设备上。 保健过程包括定位设备。

    SPECTROSCOPIC SENSOR AND ELECTRONIC APPARATUS
    48.
    发明申请
    SPECTROSCOPIC SENSOR AND ELECTRONIC APPARATUS 审中-公开
    光谱传感器和电子设备

    公开(公告)号:US20160245700A1

    公开(公告)日:2016-08-25

    申请号:US15147456

    申请日:2016-05-05

    Abstract: A spectroscopic sensor has plural angle limiting filters that limit incident angles of incident lights, plural light band-pass filters that transmit specific wavelengths, and plural photodiodes to which corresponding transmitted lights are input. The spectroscopic sensor is a semiconductor device in which the angle limiting filters, the light band-pass filters, and the photodiodes are integrated, and, assuming that the surface on which impurity regions for the photodiodes are formed is a front surface of a semiconductor substrate, holes for receiving lights are formed in the impurity regions from the rear surface side.

    Abstract translation: 光谱传感器具有多个限制入射光的入射角的角度限制滤光器,多个发送特定波长的光带通滤波器以及输入相应透射光的多个光电二极管。 光谱传感器是将角度限制滤光器,光带通滤波器和光电二极管集成在一起的半导体器件,并且假定形成有用于光电二极管的杂质区域的表面是半导体衬底的正面 在背面侧的杂质区域形成有用于接收光的孔。

    Lithography method and apparatus
    49.
    发明授权
    Lithography method and apparatus 有权
    平版印刷方法和仪器

    公开(公告)号:US09400432B2

    公开(公告)日:2016-07-26

    申请号:US13881546

    申请日:2011-10-25

    Abstract: A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask having an exposure pattern for forming a three dimensional structure; (ii) exposing the first mask to radiation to form the exposure pattern on a radiation-sensitive resist; the exposure pattern defined by irradiated areas and non-irradiated areas of the resist; (ii) providing a second mask; and (iii) during exposure, changing relative positions between the first mask and the second mask to shield selected portions of the irradiated areas from radiation to enable varying depth profiles to be created in the three dimensional structure.

    Abstract translation: 本文公开了一种光刻方法和装置。 在所描述的实施例中,该方法包括(i)提供具有用于形成三维结构的曝光图案的第一掩模; (ii)将第一掩模暴露于辐射以在辐射敏感抗蚀剂上形成曝光图案; 由抗蚀剂的照射区域和未照射区域限定的曝光图案; (ii)提供第二掩模; 和(iii)在曝光期间,改变第一掩模和第二掩模之间的相对位置以屏蔽被照射区域的所选部分不受辐射,以使能够在三维结构中产生变化的深度分布。

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