Abstract:
A spectrometer includes: a tungsten lamp which emits light with no peak wavelength within a wavelength range of visible light and having a light amount increasing as the wavelength becomes longer; a violet LED which emits light having a peak wavelength within the wavelength range of visible light; a light mixer which mixes light emitted from the tungsten lamp and the violet LED; an etalon which receives light mixed by the light mixer and transmits light contained in the received mixed light and having a particular wavelength; a light receiving unit which receives light transmitted by the etalon; and a measurement control unit which changes the wavelength of light that can pass through the etalon and measures spectral characteristics of the light having passed through the etalon based on the light received by the light receiving unit.
Abstract:
A method for designing the spatial partition of a filter module used in an aperture-multiplexed imaging system. The filter module is spatially partitioned into filter cells, and the spatial partition is designed by considering data captured at the sensor in light of an application-specific performance metric.
Abstract:
A spectrometer comprises a plurality of isolated optical channels comprising a plurality of isolated optical paths. The isolated optical paths decrease cross-talk among the optical paths and allow the spectrometer to have a decreased length with increased resolution. In many embodiments, the isolated optical paths comprise isolated parallel optical paths that allow the length of the device to be decreased substantially. In many embodiments, each isolated optical path extends from a filter of a filter array, through a lens of a lens array, through a channel of a support array, to a region of a sensor array. Each region of the sensor array comprises a plurality of sensor elements in which a location of the sensor element corresponds to the wavelength of light received based on an angle of light received at the location, the focal length of the lens and the central wavelength of the filter.
Abstract:
A fluorescence hyperspectral microscopy system featuring structured illumination and parallel recording includes a light projection sub-system, a detection sub-system, and an electrical controller. The light projection sub-system includes a digital light processing (DLP) module for generating linear excitation light, a first lens set, an optical path allocation element, and an objective lens. The detection sub-system includes a second lens set, a frequency-dividing reflection element, a two-dimensional light detector, and a light collection element. With the detection sub-system performing detection in conjunction with the light projection sub-system, and the electrical controller controlling the DLP module, a two-dimensional moving platform, and the two-dimensional light detector, the fluorescence hyperspectral microscopy system provides increased resolution and can obtain accurate information in spatial and spectral dimensions and hence a four-dimensional hyperspectral image of the object under detection.
Abstract:
Devices for reflectance spectroscopy, processes of assembling devices for reflectance spectroscopy, and health care processes of using reflectance optical spectroscopy devices are disclosed. The devices include a light source arranged and disposed to apply broadband light to sample, and a light-receiving feature configured to receive reflected light produced by the applying of the broadband light to the sample. The light-receiving feature is arranged and disposed to direct the reflected light to an optical detection system and isolate the reflected light from the broadband light. The optical detection system is capable of differentiating individual frequencies of the reflected light. The processes of assembling include removably positioning the devices on electronic devices. The health care processes include positioning the devices.
Abstract:
An imaging system includes a light source configured to illuminate a target and a camera configured to image light responsively emitted from the target and reflected from a spatial light modulator (SLM). The imaging system is configured to generate high-resolution, hyperspectral images of the target. The SLM includes a refractive layer that is chromatically dispersive and that has a refractive index that is controllable. The refractive index of the refractive layer can be controlled to vary according to a gradient such that light reflected from the SLM is chromatically dispersed and spectrographic information about the target can be captured using the camera. Such a system could be operated confocally, e.g., by incorporating a micromirror device configured to control a spatial pattern of illumination of the target and to modulate the transmission of light from the target to the camera via the SLM according to a corresponding spatial pattern.
Abstract:
The present invention relates to a spectroscopic imaging system using autofluorescence and reflectance images to diagnose tissue. A preferred embodiment of the invention uses a plurality of light sources to illuminate a tissue region to provide the fluorescence and reflectance images, respectively.
Abstract:
A spectroscopic sensor has plural angle limiting filters that limit incident angles of incident lights, plural light band-pass filters that transmit specific wavelengths, and plural photodiodes to which corresponding transmitted lights are input. The spectroscopic sensor is a semiconductor device in which the angle limiting filters, the light band-pass filters, and the photodiodes are integrated, and, assuming that the surface on which impurity regions for the photodiodes are formed is a front surface of a semiconductor substrate, holes for receiving lights are formed in the impurity regions from the rear surface side.
Abstract:
A lithography method and apparatus is disclosed herein. In a described embodiment, the method comprises (i) providing a first mask having an exposure pattern for forming a three dimensional structure; (ii) exposing the first mask to radiation to form the exposure pattern on a radiation-sensitive resist; the exposure pattern defined by irradiated areas and non-irradiated areas of the resist; (ii) providing a second mask; and (iii) during exposure, changing relative positions between the first mask and the second mask to shield selected portions of the irradiated areas from radiation to enable varying depth profiles to be created in the three dimensional structure.
Abstract:
A spectrometer comprises a plurality of isolated optical channels comprising a plurality of isolated optical paths. The isolated optical paths decrease cross-talk among the optical paths and allow the spectrometer to have a decreased length with increased resolution. In many embodiments, the isolated optical paths comprise isolated parallel optical paths that allow the length of the device to be decreased substantially. In many embodiments, each isolated optical path extends from a filter of a filter array, through a lens of a lens array, through a channel of a support array, to a region of a sensor array. Each region of the sensor array comprises a plurality of sensor elements in which a location of the sensor element corresponds to the wavelength of light received based on an angle of light received at the location, the focal length of the lens and the central wavelength of the filter.