DUAL MODE GAS FIELD ION SOURCE
    41.
    发明申请
    DUAL MODE GAS FIELD ION SOURCE 有权
    双模气体场源

    公开(公告)号:US20090200484A1

    公开(公告)日:2009-08-13

    申请号:US12366390

    申请日:2009-02-05

    Inventor: Juergen FROSIEN

    Abstract: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

    Abstract translation: 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱,其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳,用于从气体离子源发射器提取离子的电极,适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域,用于聚焦由第一气体或第二气体产生的离子束的物镜,用于在电极和气体离子源发射器之间提供电压的电压源,以及 控制器,用于在电压源的第一电压和第二电压之间切换,用于产生第一气体的离子离子束或第二气体的离子离子束。

    Method and system for ultrafast photoelectron microscope
    42.
    发明授权
    Method and system for ultrafast photoelectron microscope 有权
    超快光电子显微镜的方法和系统

    公开(公告)号:US07154091B2

    公开(公告)日:2006-12-26

    申请号:US11097837

    申请日:2005-04-01

    Abstract: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

    Abstract translation: 用于表征一个或多个样品的超快系统(和方法)。 该系统包括具有要表征的样品的载物台组件。 该系统具有能够发射持续时间小于1ps的光脉冲的激光源。 该系统具有耦合到激光源的阴极。 在具体实施例中,阴极能够发射持续时间小于1ps的电子脉冲。 该系统具有适于将电子脉冲聚焦到设置在载物台上的样品上的电子透镜组件。 该系统具有适于捕获穿过样品的一个或多个电子的检测器。 通过样品的一个或多个电子代表样品的结构。 检测器提供与通过样品的一个或多个电子相关联的信号(例如,数据信号),其表示样品的结构。 该系统具有耦合到检测器的处理器。 处理器适于处理与通过样本的一个或多个电子相关联的数据信号,以输出与样本的结构相关联的信息。 该系统具有耦合到处理器的输出设备。 输出设备适于输出与样本结构相关联的信息。

    Measurement method of electron beam current, electron beam writing system and electron beam detector
    43.
    发明申请
    Measurement method of electron beam current, electron beam writing system and electron beam detector 有权
    电子束电流,电子束写入系统和电子束检测器的测量方法

    公开(公告)号:US20060060775A1

    公开(公告)日:2006-03-23

    申请号:US11207710

    申请日:2005-08-22

    Abstract: A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.

    Abstract translation: 提供了一种能够在精确测量电子束写入系统中的弱光束电流的同时减少重叠在长传输线上的噪声影响的技术,并且能够精确高效地测量使用多个光束的光束写入系统中的弱光束电流。 通过使用用于连接和断开电子束检测装置的开关和检测到的信号线,电子束检测装置与检测到的信号线断开,以在束电流测量期间将检测到的信号累积在电子束检测装置中。 在测量结束的同时,连接电子束检测装置和检测信号线来测量累积信号。 此外,为了同时进行测量方法,使用多个电子束检测装置和开关以高精度同时测量多个电子束。

    Method for measurement of beam emittance in a charged particle transport system
    44.
    发明授权
    Method for measurement of beam emittance in a charged particle transport system 失效
    用于测量带电粒子输送系统中的光束发射率的方法

    公开(公告)号:US06763316B2

    公开(公告)日:2004-07-13

    申请号:US10103583

    申请日:2002-03-21

    Abstract: A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the current measured in a slot Faraday or sample cup as a straight-edged mechanism traverses the beam upstream of the sample cup in a direction perpendicular to the orientation of the slot Faraday and the straight-edged mechanism, which also can be the direction in which the emittance is determined. An expression in terms of the beam current density can be determined for the derivative of the sample current with respect to position of the mechanism. Depending on the angular spread of the beam reaching the sample cup, the density can be determined directly from the derivative, or can be determined using a least squares analysis of the derivative over a range of mechanism positions.

    Abstract translation: 一种方法在带电粒子传输系统中基于位置和角度确定离子束发射率,即束电流密度。 发射率是根据在法拉第槽或样品杯中测量的电流的变化来确定的,因为直边机构沿垂直于槽法拉第方向和直边机构的方向穿过样品杯上游的光束,其中 也可以是确定发光度的方向。 关于束流电流密度的表达式可以针对机构位置的样本电流的导数来确定。 取决于到达样品杯的光束的角度扩展,密度可以直接从导数确定,或者可以使用衍生物在机械位置范围内的最小二乘法分析来确定。

    Control system for a charged particle beam apparatus
    46.
    发明授权
    Control system for a charged particle beam apparatus 失效
    带电粒子束装置的控制系统

    公开(公告)号:US4684782A

    公开(公告)日:1987-08-04

    申请号:US774735

    申请日:1985-09-11

    CPC classification number: H01J37/243

    Abstract: A feedback signal of a beam accelerating voltage, which is input into a feedback control system is fixed at a predetermined value corresponding to a signal under the condition before generation of arcing, when the arcing is generated, and thereafter, the fixed feedback signal is released to continue a feedback control.

    Abstract translation: 输入到反馈控制系统中的光束加速电压的反馈信号,在产生电弧时,在产生电弧之前的条件下固定为对应于信号的预定值,之后,释放固定反馈信号 继续反馈控制。

    System for the power control of high voltage electron beam generators
    47.
    发明授权
    System for the power control of high voltage electron beam generators 失效
    高压电子束发生器功率控制系统

    公开(公告)号:US4045707A

    公开(公告)日:1977-08-30

    申请号:US671631

    申请日:1976-03-29

    CPC classification number: H01J37/243

    Abstract: System for the power control of high voltage electron beam generators having a cathode and a control electrode associated with the cathode. The system is provided with a high voltage isolation transformer with primary and secondary winding for supplying the control electrode with a control voltage. A system precedes the isolation transformer on the primary side and is adapted to generate square wave pulses susceptible of amplitude modulation. The pulse generator is designed such that the pulses are square wave impulses symmetrical with the null line. The isolation transformer is provided with a tertiary winding on the primary side and the primary winding receives input from an amplifier whose input is connected with the output voltage of the tertiary winding. A rectifier bridge is connected to the secondary winding.

    Electron beam generators
    48.
    发明授权
    Electron beam generators 失效
    电子束发生器

    公开(公告)号:US4020318A

    公开(公告)日:1977-04-26

    申请号:US544009

    申请日:1975-01-24

    Inventor: Allan Sanderson

    CPC classification number: H01J37/243 H01J37/06

    Abstract: This concerns an electron beam generator system in which the supply for at least one auxiliary electrode of the electron gun (for example the filament or biasing electrode) is provided by a high frequency oscillator connected to a transformer or other coupling means, the output of which is applied at the electron beam gun column to a component which is itself connected to the output of the high voltage generator; this dispenses with the superimposition of the auxiliary supply on the HT voltage at a remote high voltage generator and with the corresponding auxiliary supply conductor in the conventional high voltage cable between the high voltage generator and the electron beam gun column.

    Abstract translation: 这涉及一种电子束发生器系统,其中电子枪的至少一个辅助电极(例如灯丝或偏置电极)的供电由连接到变压器或其它耦合装置的高频振荡器提供,其输出端 在电子束枪柱处施加到本身连接到高压发生器的输出的部件; 这避免了辅助电源与远程高压发生器的HT电压的叠加以及高压发生器和电子束枪列之间的常规高压电缆中的相应的辅助电源导体的叠加。

    Method and apparatus for regulating the beam current in industrial charge carrier beam apparatus
    49.
    发明授权
    Method and apparatus for regulating the beam current in industrial charge carrier beam apparatus 失效
    用于调节工业载流子束装置中的束流的方法和装置

    公开(公告)号:US3875366A

    公开(公告)日:1975-04-01

    申请号:US30078772

    申请日:1972-10-25

    CPC classification number: H01J37/304 B23K15/02 H01J37/243 H01J37/3023

    Abstract: A method for regulating the beam current in industrial chargecarrier beam apparatus in which, by direct measurement of a beam of charge carriers produced in pulse form within the region of the beam path, measurement signals, which in each case are dependent essentially on the peak value of the pulse amplitudes, are derived for the subsequent formation of analog control variables serving for the regulation of the beam current, the measurement signals being first stored in each case in accordance with a pulse spacing.

    Abstract translation: 一种用于调节工业电荷载波束装置中的束流的方法,其中通过在波束路径的区域内以脉冲形式产生的电荷载流子束的直接测量,测量信号在每种情况下都基本上取决于 导出脉冲幅度的峰值,用于随后形成用于调节束电流的模拟控制变量,根据脉冲间隔首先将测量信号存储在每种情况下。

    Electron gun biasing system
    50.
    发明授权
    Electron gun biasing system 失效
    电子弹偏系统

    公开(公告)号:US3676670A

    公开(公告)日:1972-07-11

    申请号:US3676670D

    申请日:1970-10-09

    Applicant: ETEC CORP

    CPC classification number: H01J37/243

    Abstract: An electron gun biasing system, particularly adapted for use in an electron microscope, in which a plurality of resistors are provided in series with the cathode of the electron gun. In parallel with each of the resistors is a photoconductor, and means are provided for selectively illuminating the various photoconductors so as to short out various resistors, and thus vary the bias. Typically, the resistors and photoconductors may be located inside a shielded box, and a plurality of light pipes may be directed through openings in the shielded box, so that the ends of the light pipes will be adjacent the photoconductors. A plurality of lamps may then be disposed at the ends of the light pipes outside the box, the lamps being selectively illuminated by a simple lamp illumination circuit.

    Abstract translation: 一种特别适用于电子显微镜的电子枪偏压系统,其中多个电阻器与电子枪的阴极串联设置。 与每个电阻器并联的是光电导体,并且提供用于选择性地照射各种光电导体以便短路各种电阻器并因此改变偏压的装置。 通常,电阻器和感光体可以位于屏蔽箱内,并且多个光管可以被引导通过屏蔽箱中的开口,使得光管的端部将与光电导体相邻。 然后,多个灯可以设置在盒外的光管的端部,灯被选择性地由简单的灯照明电路照明。

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