Abstract:
A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.
Abstract:
An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.
Abstract:
A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.
Abstract:
A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the current measured in a slot Faraday or sample cup as a straight-edged mechanism traverses the beam upstream of the sample cup in a direction perpendicular to the orientation of the slot Faraday and the straight-edged mechanism, which also can be the direction in which the emittance is determined. An expression in terms of the beam current density can be determined for the derivative of the sample current with respect to position of the mechanism. Depending on the angular spread of the beam reaching the sample cup, the density can be determined directly from the derivative, or can be determined using a least squares analysis of the derivative over a range of mechanism positions.
Abstract:
An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.
Abstract:
A feedback signal of a beam accelerating voltage, which is input into a feedback control system is fixed at a predetermined value corresponding to a signal under the condition before generation of arcing, when the arcing is generated, and thereafter, the fixed feedback signal is released to continue a feedback control.
Abstract:
System for the power control of high voltage electron beam generators having a cathode and a control electrode associated with the cathode. The system is provided with a high voltage isolation transformer with primary and secondary winding for supplying the control electrode with a control voltage. A system precedes the isolation transformer on the primary side and is adapted to generate square wave pulses susceptible of amplitude modulation. The pulse generator is designed such that the pulses are square wave impulses symmetrical with the null line. The isolation transformer is provided with a tertiary winding on the primary side and the primary winding receives input from an amplifier whose input is connected with the output voltage of the tertiary winding. A rectifier bridge is connected to the secondary winding.
Abstract:
This concerns an electron beam generator system in which the supply for at least one auxiliary electrode of the electron gun (for example the filament or biasing electrode) is provided by a high frequency oscillator connected to a transformer or other coupling means, the output of which is applied at the electron beam gun column to a component which is itself connected to the output of the high voltage generator; this dispenses with the superimposition of the auxiliary supply on the HT voltage at a remote high voltage generator and with the corresponding auxiliary supply conductor in the conventional high voltage cable between the high voltage generator and the electron beam gun column.
Abstract:
A method for regulating the beam current in industrial chargecarrier beam apparatus in which, by direct measurement of a beam of charge carriers produced in pulse form within the region of the beam path, measurement signals, which in each case are dependent essentially on the peak value of the pulse amplitudes, are derived for the subsequent formation of analog control variables serving for the regulation of the beam current, the measurement signals being first stored in each case in accordance with a pulse spacing.
Abstract:
An electron gun biasing system, particularly adapted for use in an electron microscope, in which a plurality of resistors are provided in series with the cathode of the electron gun. In parallel with each of the resistors is a photoconductor, and means are provided for selectively illuminating the various photoconductors so as to short out various resistors, and thus vary the bias. Typically, the resistors and photoconductors may be located inside a shielded box, and a plurality of light pipes may be directed through openings in the shielded box, so that the ends of the light pipes will be adjacent the photoconductors. A plurality of lamps may then be disposed at the ends of the light pipes outside the box, the lamps being selectively illuminated by a simple lamp illumination circuit.