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    High brightness electron impact ion source
    41.
    发明授权
    High brightness electron impact ion source 有权

    公开(公告)号：US09607800B1

    公开(公告)日：2017-03-28

    申请号：US15071950

    申请日：2016-03-16

    Applicant: Nonsequitur Technologies, Inc.

    Inventor： Peter E. Loeffler

    IPC: H01J27/00 ,  H01J27/20 ,  H01J27/02

    CPC classification number: H01J27/205 ,  H01J27/022

    Abstract: An electron impact ion beam source is provided with a pressure chamber to confine a specific high pressure area within excited gas to a small enough volume that the source can be operated at relatively high pressure and still achieve substantial brightness of the extracted ion beam. In particular, the area is configured such that the overall linear dimension along the beam path is less than the mean free path of the ions and the electrons within the chamber. If pressure is increased, the linear dimension must be correspondingly decreased to maximized brightness. By keeping linear dimensions sufficiently small, both incident electrons and extracted ions are enabled to transit the source region without significant energy loss. The new source design allows operation at pressures at least an order of magnitude higher than other known ion sources and thus produces an order of magnitude higher brightness.

    Ion source and method for making same
    45.
    发明授权
    Ion source and method for making same 有权
    离子源及其制作方法

    公开(公告)号：US09530606B2

    公开(公告)日：2016-12-27

    申请号：US14666871

    申请日：2015-03-24

    Applicant: NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY

    Inventor： Jabez McClelland ,  Truman Wilson

    IPC: H01J27/02 ,  G21K1/00 ,  H01J37/04 ,  H01J37/08 ,  H01J37/22

    CPC classification number: H01J27/022 ,  H01J37/04 ,  H01J37/08 ,  H01J37/22 ,  H01J2237/047 ,  H01J2237/26 ,  H01J2237/30

    Abstract: An articles includes: an ion source configured to provide a first ion beam that has a first brightness; and a cooler configured to receive the first ion beam and to produce a second ion beam from the first ion beam, the second ion beam including a second brightness that is greater than the first brightness. A process for cooling includes receiving a first ion beam that includes a first brightness in a cooler, and the cooler includes a first mirror and a second mirror disposed opposingly to the first mirror; receiving a first laser beam in the cooler; receiving a second laser beam in the cooler; transmitting the first laser beam and the second laser beam through the first ion beam to decrease an emittance of the first ion beam; reflecting the first laser beam from the first mirror and the second laser beam from the second mirror; and transmitting, after being reflected, the first laser beam and the second laser beam through the first ion beam to cool the first ion beam and to decrease the emittance of the first ion beam to produce a second ion beam that includes a second brightness that is greater than the first brightness.

    Abstract translation: 一种物品包括：离子源，被配置为提供具有第一亮度的第一离子束; 以及冷却器，被配置为接收所述第一离子束并且从所述第一离子束产生第二离子束，所述第二离子束包括大于所述第一亮度的第二亮度。 一种冷却方法包括在冷却器中接收包括第一亮度的第一离子束，并且所述冷却器包括与第一反射镜相对设置的第一反射镜和第二反射镜; 在冷却器中接收第一激光束; 在所述冷却器中接收第二激光束; 通过所述第一离子束透射所述第一激光束和所述第二激光束以降低所述第一离子束的发射率; 反射来自第一反射镜的第一激光束和来自第二反射镜的第二激光束; 并且在第一激光束和第二激光束被反射之后通过第一离子束透射以冷却第一离子束并降低第一离子束的发射率以产生第二离子束，该第二离子束包括第二离子束， 大于第一亮度。

    Cleaning of corona discharge ion source
    47.
    发明授权
    Cleaning of corona discharge ion source 有权
    清洁电晕放电离子源

    公开(公告)号：US09448203B2

    公开(公告)日：2016-09-20

    申请号：US14430181

    申请日：2013-09-20

    Applicant: Matt Easton ,  Stephen Taylor ,  Bruce Grant ,  Henry McIntyre ,  Alastair Clark

    Inventor： Matt Easton ,  Stephen Taylor ,  Bruce Grant ,  Henry McIntyre ,  Alastair Clark

    IPC: H01J49/16 ,  G01N27/62 ,  H01J27/02

    CPC classification number: G01N27/622 ,  H01J27/022 ,  H01J49/16 ,  H01J49/168

    Abstract: Systems and techniques for cleaning a corona discharge point are described. A controller (150) can be operatively coupled to a corona discharge point (108) to control the operation of the corona discharge point (1089. The controller (150) and the corona discharge point (108) can be included with, for example, an ion mobility spectrometry (IMS) system (100). The controller (150) can be used to operate the corona discharge point (108) at an operating voltage for a first time interval, with or without an additional higher pulse voltage, to produce a corona discharge, and to operate the corona discharge point (108) at a cleaning voltage greater than the operating voltage for a second time interval subsequent to the first time interval to produce a corona discharge. The effectiveness of the corona discharge point (108) can be monitored by, for instance, measuring a voltage necessary to produce a corona discharge at the corona discharge point (108), measuring a current produced at the corona discharge point (108) from a corona discharge, and so forth.

    Abstract translation: 描述了用于清洁电晕放电点的系统和技术。 控制器（150）可以可操作地耦合到电晕放电点（108）以控制电晕放电点（1089）的操作。控制器（150）和电晕放电点（108）可以包括在例如 离子迁移谱（IMS）系统（100），控制器（150）可用于在第一时间间隔的操作电压下操作电晕放电点（108），具有或不具有额外的较高脉冲电压，以产生 电晕放电，并且在第一时间间隔之后的第二时间间隔以大于工作电压的清洁电压操作电晕放电点（108）以产生电晕放电，电晕放电点（108）的有效性 可以通过例如测量在电晕放电点（108）处产生电晕放电所需的电压来测量电晕放电点（108）产生的电流，从而进行电晕放电等。

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