公开(公告)号：US20110089321A1

公开(公告)日：2011-04-21

申请号：US12948298

申请日：2010-11-17

Applicant: Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

Inventor： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

IPC: H01J49/00 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

Abstract: A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

Abstract translation: 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

公开(公告)号：US20100327180A1

公开(公告)日：2010-12-30

申请号：US12494024

申请日：2009-06-29

Applicant: Gregory A. Schwind ,  Jonathan H. Orloff

Inventor： Gregory A. Schwind ,  Jonathan H. Orloff

IPC: H01J3/14

CPC classification number: H01J37/3056 ,  H01J37/05 ,  H01J37/147 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without significantly reducing processing time. A preferred embodiment includes within an ion beam column a filter that removes the low energy ions from the beam.

Abstract translation: 申请人已经发现离子源的离子的​​不对称能量分布允许通过在低能量束尾部过滤离子来降低色差，而不会显着缩短处理时间。 一个优选的实施例在离子束列内包括从梁中去除低能量离子的过滤器。

公开(公告)号：US07838827B2

公开(公告)日：2010-11-23

申请号：US11987018

申请日：2007-11-26

Applicant: Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

Inventor： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

IPC: H01J37/05

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J37/28

Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

Abstract translation: 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

公开(公告)号：US20100243879A1

公开(公告)日：2010-09-30

申请号：US12658679

申请日：2010-02-12

Applicant: Yongzhang Huang ,  Xinping Hu

Inventor： Yongzhang Huang ,  Xinping Hu

IPC: H01J37/141 ,  H01J49/06 ,  H01J37/30 ,  H01J1/50 ,  H01J3/22 ,  H01J37/05

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/08

Abstract: The present invention provides a mass analyzing magnet which can bend a very wide charged particle ribbon beams through angles between 90 to 200 degrees. The shorter dimension of the ribbon beam is aligned with the magnetic field. The magnet can focus the longer dimension of the ribbon beam through a resolving slot inside the magnet for mass or momentum analysis. The magnet pole is shaped to increase the mass resolving power and to provide the focusing force in the direction of the shorter dimension of the ribbon beam. This magnet can achieve high mass resolving power with very small system aberrations for very wide ribbon beam. This feature is of significant value, for example, in the ion implantation industry. The ribbon beam width can be 300 mm, 450 mm and even 1000 mm. Integrated with the present invention, the ion implanter systems can be built to provide mass analyzed ribbon beams for various applications. The system will have much lower cost and much better ribbon beam quality than the ion implanters which are using conventional mass analyzing magnet.

Abstract translation: 本发明提供一种质量分析磁体，其能够使非常宽的带电粒子束弯曲角度在90至200度之间。 带状束的较短尺寸与磁场对准。 磁体可以将带状光束的较长尺寸聚焦在磁体内的分辨槽以进行质量或动量分析。 磁极被成形为增加质量分辨能力并且提供在带状束的较短尺寸方向上的聚焦力。 该磁体可以实现高质量分辨率功率，对于非常宽的带状束具有非常小的系统像差。 这个特征具有重要价值，例如在离子注入工业中。 带束宽度可以是300mm，450mm甚至1000mm。 与本发明相结合，可以构建离子注入机系统以提供用于各种应用的质量分析的带状束。 与使用常规质量分析磁体的离子注入机相比，该系统将具有更低的成本和更好的带束质量。

公开(公告)号：US20100237243A1

公开(公告)日：2010-09-23

申请号：US12789070

申请日：2010-05-27

Applicant: Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

Inventor： Nobuharu Noji ,  Tohru Satake ,  Hirosi Sobukawa ,  Toshifumi Kimba ,  Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Kenichi Suematsu ,  Yutaka Tabe ,  Ryo Tajima ,  Keiichi Tohyama

IPC: G01N23/22

CPC classification number: H01J37/20 ,  G01N23/2204 ,  G01N23/225 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2801 ,  H01J2237/2817 ,  H01L21/6833 ,  H01L2223/54466

Abstract: A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.

公开(公告)号：US20100200750A1

公开(公告)日：2010-08-12

申请号：US12658476

申请日：2010-02-08

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US20100171048A1

公开(公告)日：2010-07-08

申请号：US12294674

申请日：2007-03-27

Applicant: Ichiro Nakamoto ,  Hiroshi Horai ,  Tatsuya Sodekoda ,  Masahiro Yoshida

Inventor： Ichiro Nakamoto ,  Hiroshi Horai ,  Tatsuya Sodekoda ,  Masahiro Yoshida

IPC: H01J37/08 ,  H01J37/05 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0455 ,  H01J2237/057 ,  H01L21/265

Abstract: In an ion implanting apparatus 10 including a separation slit 20 which receives an ion beam 1 having passed through a mass-separation electromagnet 17 and allows a desired type of ion to selectively pass therethrough, the separation slit 20 is operable to vary a shape of a gap through which the ion beam 1 passes. In addition, the ion implanting apparatus 10 includes a variable slit 30 which is disposed between an extraction electrode system 15 and the mass-separation electromagnet 17 so as to form a gap through which the ion beam 1 passes and is operable to vary a shape of the gap so as to shield a part of the ion beam 1 extracted from the ion source 12. The ion implanting apparatus 10 may include both or one of the separation slit 20 and the variable slit 30.

Abstract translation: 在包括分离狭缝20的离子注入装置10中，分离狭缝20接收已经通过质量分离电磁体17并允许期望类型的离子选择性地通过的离子束1，分离狭缝20可操作以改变形状 离子束1通过的间隙。 此外，离子注入装置10包括可变狭缝30，其设置在提取电极系统15和质量分离电磁体17之间，以形成离子束1通过的间隙，并且可操作地改变形状 间隙，以便屏蔽从离子源12提取的离子束1的一部分。离子注入装置10可以包括分离狭缝20和可变狭缝30中的两个或一个。

公开(公告)号：US07679054B2

公开(公告)日：2010-03-16

申请号：US10571347

申请日：2004-09-02

Applicant: Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

Inventor： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

IPC: H01J49/00

CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

Abstract translation: 本发明涉及例如 用于带有沿着光轴的z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件的第一和第二平面， 第一四极元件被定位成使得在操作中，第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠，第二四极元件被定位成使得在操作中 第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠，第一带电粒子选择元件沿光束方向定位在第一元件以聚焦和分散方式作用之前，以及 第二带电粒子选择元件在光束方向上位于第一元件以聚焦和分散方式作用之后。 因此，可以实现没有固有分散限制的虚拟色散源状位置。

公开(公告)号：US20090321632A1

公开(公告)日：2009-12-31

申请号：US12146122

申请日：2008-06-25

Applicant: John Francis Grant ,  Patrick Richard Splinter

Inventor： John Francis Grant ,  Patrick Richard Splinter

IPC: H01J49/00 ,  H01J37/08

CPC classification number: H01J37/04 ,  H01J37/05 ,  H01J37/244 ,  H01J2237/022 ,  H01J2237/0455 ,  H01J2237/24507 ,  H01J2237/24542 ,  H01J2237/24578

Abstract: An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.

Abstract translation: 一种离子注入系统，包括被配置为沿着光束路径产生离子束的离子源，质量分析器位于离子源的下游，其中质量分析器被配置为执行离子束的质量分析和位于下游的束互补孔 的质量分析器并且沿着光束路径，光束互补孔具有对应于离子束的横截面波束包围的尺寸和形状。

公开(公告)号：US07635850B2

公开(公告)日：2009-12-22

申请号：US11870333

申请日：2007-10-10

Applicant: Takatoshi Yamashita ,  Tadashi Ikejiri ,  Kohei Tanaka ,  Weijiang Zhao ,  Hideyuki Tanaka

Inventor： Takatoshi Yamashita ,  Tadashi Ikejiri ,  Kohei Tanaka ,  Weijiang Zhao ,  Hideyuki Tanaka

IPC: H01J37/317 ,  H01J37/147 ,  H01J3/14

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/047 ,  H01J2237/055 ,  H01J2237/12 ,  H01J2237/15

Abstract: An analyzing electromagnet constituting an ion implanter has a first inner coil, a second inner coil, three first outer coils, three second outer coils, and a yoke. The inner coils are saddle-shaped coils cooperating with each other to generate a main magnetic field which bends an ion beam in the X direction. Each of the outer coils is a saddle-shaped coil which generates a sub-magnetic field correcting the main magnetic field. Each of the coils has a configuration where a notched portion is disposed in a fan-shaped cylindrical stacked coil configured by: winding a laminations of an insulation sheet and a conductor sheet in multiple turn on an outer peripheral face of a laminated insulator; and forming a laminated insulator on an outer peripheral face.

Abstract translation: 构成离子注入机的分析电磁铁具有第一内线圈，第二内线圈，三个第一外线圈，三个第二外线圈和轭。 内部线圈是彼此协作的鞍形线圈，以产生在X方向上使离子束弯曲的主磁场。 每个外部线圈是产生校正主磁场的子磁场的鞍形线圈。 每个线圈具有其中凹口部分设置在扇形圆柱形堆叠线圈中的构造，该扇形圆柱形堆叠线圈通过以下方式构成：在层压绝缘体的外周面上多层卷绕绝缘片和导体片的叠层; 以及在外周面上形成层压绝缘体。