公开(公告)号：US20080211376A1

公开(公告)日：2008-09-04

申请号：US12075067

申请日：2008-03-07

Applicant: Hiroshi Yasuda ,  Takeshi Haraguchi

Inventor： Hiroshi Yasuda ,  Takeshi Haraguchi

IPC: H01J29/48

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/02 ,  H01J29/48 ,  H01J37/063 ,  H01J37/075 ,  H01J2237/06316

Abstract: An electron gun having an electron source emitting electrons includes: an acceleration electrode which accelerates the electrons; an extraction electrode which has a spherical concave surface having the center on an optical axis and facing the electron emission surface, and which extracts an electron from the electron emission surface; and a suppressor electrode which suppresses electron emission from a side surface of the electron source. In the electron gun, an electric field is applied to the electron emission surface while the electron source is kept at a low temperature in such an extent that sublimation of a material of the electron source would not be caused, to cause the electron source to emit a thermal field emission electron.

Abstract translation: 具有发射电子的电子源的电子枪包括：加速电子的加速电极; 提取电极，其具有在光轴上具有中心并面向电子发射表面的球形凹面，并从电子发射表面提取电子; 以及抑制来自电子源的侧面的电子发射的抑制电极。 在电子枪中，电子源被施加到电子发射表面，同时电子源保持在低温，使得不会引起电子源的材料的升华，导致电子源发射 热场发射电子。

公开(公告)号：US20080042060A1

公开(公告)日：2008-02-21

申请号：US11907097

申请日：2007-10-09

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Toshifumi Kimba ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi

IPC: G21K5/02

CPC classification number: G03F7/70616 ,  G01N23/225 ,  H01J37/05 ,  H01J37/06 ,  H01J37/073 ,  H01J37/075 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/057 ,  H01J2237/06316 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/248 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.

Abstract translation: 检查装置及使用该检查装置的半导体装置的制造方法。 检查装置用于诸如晶片的样品的缺陷检查，线宽测量，表面电位测量等。 在检查装置中，多个带电粒子从初级光学系统传送到样品，从样品发射的二次带电粒子与主光学系统分离，并通过二次光学系统引入到检测器。 在移动样品的同时进行带电粒子的照射。 带电粒子的照射点沿着样品的移动方向排列成N行，沿着与其垂直的方向排列成M列。 带电粒子的每一列照射点在垂直于样品的移动方向的方向上连续移动预定量。

公开(公告)号：US06828565B2

公开(公告)日：2004-12-07

申请号：US10670556

申请日：2003-09-26

Applicant: Michael Steigerwald

Inventor： Michael Steigerwald

IPC: H01J2700

CPC classification number: H01J37/075 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/065

Abstract: An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

Abstract translation: 电子束源包括用可调强度的光子束照射的源表面。 由于光照效应，光子束有助于来自源表面的电子的发射。 电提取场进一步有助于电子发射。 此外，提供加热器以进一步辅助电子发射通过热离子效应。 测量电子束电流，并且基于测量的电子束电流来调整光子束的强度。

公开(公告)号：US20020195570A1

公开(公告)日：2002-12-26

申请号：US09888256

申请日：2001-06-22

Applicant: Applied Materials, Inc.

Inventor： Glen E. Howard ,  William J. DeVore

IPC: H01J027/00

CPC classification number: H01J37/075 ,  H01J2237/3175

Abstract: An electron source has an anode and a cathode that is capable of being negatively biased relative to the anode, the cathode having an electron emitting portion and a cathode axis. An electromagnetic radiation source is adapted to generate an electromagnetic radiation beam to heat the cathode. A lens is adapted to direct the electromagnetic radiation beam onto the cathode, the lens having a lens axis that forms an acute angle with, or is substantially parallel to, the cathode axis of the electron emitting portion.

Abstract translation: 电子源具有能够相对于阳极被负偏置的阳极和阴极，阴极具有电子发射部分和阴极轴线。 电磁辐射源适于产生电磁辐射束以加热阴极。 透镜适于将电磁辐射束引导到阴极上，透镜具有与电子发射部分的阴极轴形成锐角或基本平行的透镜轴。

公开(公告)号：US5932966A

公开(公告)日：1999-08-03

申请号：US987397

申请日：1997-12-09

Applicant: James E. Schneider ,  Kenneth A. Costello ,  Mark A. McCord ,  R. Fabian Pease ,  Aaron W. Baum

Inventor： James E. Schneider ,  Kenneth A. Costello ,  Mark A. McCord ,  R. Fabian Pease ,  Aaron W. Baum

IPC: H01J40/06 ,  G03F7/20 ,  H01J3/02 ,  H01J27/04 ,  H01J37/073 ,  H01J37/075 ,  H01J40/16

CPC classification number: G03F7/70375 ,  H01J27/04 ,  H01J3/021 ,  H01J37/073 ,  H01J37/075 ,  H01J40/16 ,  H01J2201/3423 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.

Abstract translation: 电子源包括透光性基板上的负电子亲合性光电阴极和光束发生器，用于将光束引导到光电阴极处的基板，用于将电子激发到导带中。 光电阴极具有用于发射尺寸小于约两微米的电子的至少一个有源面积。 电子源还包括用于将电子形成电子束的电子光学器件和用于将光电阴极保持在高真空的真空外壳。 图案化光电阴极以限定发射区域。 图案化掩模可以位于有源层的发射表面上，可以被掩埋在有源层内或者可以位于有源层和衬底之间。

公开(公告)号：US5623148A

公开(公告)日：1997-04-22

申请号：US570185

申请日：1995-12-11

Applicant: Bernd-Dieter Wenzel ,  Wolfgang Erbkamm ,  Olaf Gawer

Inventor： Bernd-Dieter Wenzel ,  Wolfgang Erbkamm ,  Olaf Gawer

IPC: H01J37/067 ,  H01J37/075 ,  H01J37/065

CPC classification number: H01J37/067 ,  H01J37/075

Abstract: The invention which relates to a device for the generating of electron beams with a vacuum chamber, in which a massive cathode (10) is arranged with a wire cathode (14) arranged above and a aperture anode (17) below the massive cathode (10) and whom below the aperture anode (17) focusing and/or deflecting magnet arrangements are provided which direct an electron beam (23) emitted by the massive cathode (10) and accelerated by the aperture anode (17) to a processing location (22), has the basic task to make the power of such devices variable over a large range using simple mechanical means. According to the invention the task is solved by arranging the aperture anode (17) rigidly and the massive cathode (10) and the wire cathode (14) axially movable within the vacuum chamber (1). For the movements of the massive cathode (10) and the wire cathode (14) contact means are provided which follow their movements and lead to the outside of the vacuum chamber (1). In addition for the axial movement of the massive cathode (10) a motion means is provided connected with the cathode (Figure).

Abstract translation: 本发明涉及一种用于产生具有真空室的电子束的装置，其中大块阴极（10）布置有布置在其上的线阴极（14）和在大量阴极（10）下方的孔径阳极（17） ），并且在孔径阳极（17）下面聚焦和/或偏转磁体布置被提供，其引导由大量阴极（10）发射的电子束（23）并且被孔径阳极（17）加速到处理位置（22） ）的基本任务是使用简单的机械手段使这种装置的功率在大范围内变化。 根据本发明，通过刚性布置孔径阳极17和大量阴极10以及线阴极14在真空室1内可轴向移动来解决该任务。 对于大规模阴极（10）和线阴极（14）的移动，提供接触装置，其接触其运动并导致真空室（1）的外部。 另外，为了大量阴极（10）的轴向运动，还提供了一个与阴极连接的运动装置（图）。

公开(公告)号：US3864572A

公开(公告)日：1975-02-04

申请号：US40284473

申请日：1973-10-02

Applicant: PHILIPS CORP

Inventor： VAN DER MAST KAREL DIEDERICK ,  BARTH JAMES EDMOND

IPC: H01J37/06 ,  H01J3/02 ,  H01J37/075 ,  H05H7/08 ,  H01J37/26

CPC classification number: H01J37/075 ,  H01J3/02 ,  H01J3/024 ,  H01J2237/06316

Abstract: The electron source of an electron beam apparatus comprises a cathode wire which is to be heated by a laser beam and which is to be displaced in the wire direction. This cathode wire has a thickness of from 10 to 30 microns. By applying a field strength of 105 to 106 KV/m to the heated wire tip and by controlling the laser intensity and the wire feed during operation by a signal derived from the emission of the wire tip, a tip is produced on the wire end having a curvature radius of approximately 1 micron. At a temperature just below the melting temperature of the wire a stable temperature field emission having a current density of up to better than 104 A/cm2 is thus realized.

Abstract translation: 电子束装置的电子源包括由激光束加热并在线方向移位的阴极线。 该阴极线的厚度为10至30微米。 通过向加热的线尖施加105至106KV / m的场强，并且通过由电极尖端的发射导出的信号控制操作期间的激光强度和送丝，在具有 大约1微米的曲率半径。 在刚好低于电线熔化温度的温度下，实现了电流密度高达104A / cm2的稳定的温度场发射。

公开(公告)号：US3521113A

公开(公告)日：1970-07-21

申请号：US3521113D

申请日：1969-02-19

Applicant: IBM

Inventor： BROERS ALEC N

IPC: H01J1/20 ,  H01J37/075 ,  H01J1/02

CPC classification number: H01J1/20 ,  H01J37/075