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公开(公告)号：US20150090877A1
公开(公告)日：2015-04-02
申请号：US14300631
申请日：2014-06-10
Applicant: KLA-Tencor Corporation
Inventor： Gary G. FAN , Kumar Raja GUVINDAN RAJU , Wade Lenn JENSEN , Hong XIAO , Lorraine Ellen YOUNG
IPC: H01J37/06 , G01N23/225
CPC classification number: H01J37/261 , G01N23/2251 , G01N2223/6116 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/24592 , H01J2237/30405
Abstract: One embodiment relates to an electron beam apparatus for inspection and/or review. An electron source generates a primary electron beam, and an electron-optics system shapes and focuses said primary electron beam onto a sample held by a stage. A detection system detects signal-carrying electrons including secondary electrons and back-scattered electrons from said sample, and an image processing system processes data from said detection system. A host computer system that controls and coordinates operations of the electron-optics system, the detection system, and the image processing system. A graphical user interface shows a parameter space and provides for user selection and activation of operating parameters of the apparatus. Another embodiment relates to a method for detecting and/or reviewing defects using an electron beam apparatus. Other embodiments, aspects and features are also disclosed.
Abstract translation: 一个实施例涉及用于检查和/或审查的电子束装置。 电子源产生一次电子束，并且电子 - 光学系统将所述一次电子束形成并聚焦在由载物台保持的样品上。 检测系统检测来自所述样品的包含二次电子和反向散射电子的信号携带电子，并且图像处理系统处理来自所述检测系统的数据。 控制和协调电子光学系统，检测系统和图像处理系统的主机计算机系统。 图形用户界面显示参数空间，并提供用户选择和激活设备的操作参数。 另一实施例涉及使用电子束装置检测和/或检查缺陷的方法。 还公开了其它实施例，方面和特征。
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62.发明授权公开(公告)号：US08993961B2
公开(公告)日：2015-03-31
申请号：US13522132
申请日：2011-01-21
Applicant: Ruriko Tsuneta , Hideki Kikuchi
Inventor： Ruriko Tsuneta , Hideki Kikuchi
CPC classification number: H01J37/28 , H01J37/265 , H01J2237/221 , H01J2237/2809
Abstract: The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate.
Abstract translation: 带电粒子束显微镜包括带电粒子源; 将从带电粒子源发射的带电粒子会聚在样本上的聚光透镜; 偏转器扫描样品上的收敛的带电粒子; 偏转器的控制单元; 安装样品的样品台; 检测电荷粒子的检测器; 从来自偏转器的控制信号形成图像的计算机和来自检测器的输出信号; 以及与计算机连接的显示部。 偏转器的控制单元可以改变带电粒子的扫描速率。 以第一速率获得第一速率扫描图像，并且以比第一速率慢的第二速率获得第二速率扫描图像。
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63.发明申请公开(公告)号：US20150060669A1
公开(公告)日：2015-03-05
申请号：US14536313
申请日：2014-11-07
Inventor： Wen-Hao Cheng , Chih-Chiang Tu , Chung-Min Fu , Ajay Nandoriya
CPC classification number: G06T15/10 , G01N23/203 , G06T2215/16 , H01J37/265 , H01J37/28 , H01J2237/24578 , H01J2237/2611 , H01J2237/2815 , H01J2237/2818
Abstract: A system comprises an electron beam directed toward a three-dimensional object with one tilting angle and at least two azimuth angles, a detector configured to receive a plurality of scanning electron microscope (SEM) images from the three-dimensional object and a processor configured to calculate a height and a sidewall edge of the three-dimensional object.
Abstract translation: 一种系统包括一个朝向一个倾斜角和至少两个方位角的三维物体的电子束，一个被配置为从三维物体接收多个扫描电子显微镜（SEM）图像的检测器，以及一个被配置为 计算三维物体的高度和侧壁边缘。
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公开(公告)号：US20150048247A1
公开(公告)日：2015-02-19
申请号：US14363252
申请日：2012-11-08
Applicant: Hitachi High-Technologies Corporation
Inventor： Yoshimi Kawanami , Yoichi Ose
IPC: H01J37/28 , H01J37/20 , H01J37/22 , H01J37/26 , H01J37/244
CPC classification number: H01J37/28 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/265 , H01J37/317 , H01J2237/0473 , H01J2237/0807 , H01J2237/2806 , H01J2237/2807
Abstract: The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.
Abstract translation: 提供本发明，以便即使当含有绝缘材料的样本被部分充电时，也能够对样本进行详细检查并防止观察图像的变形。 对于使用气体电离离子源的扫描离子显微镜，在离子光学系统和样品之间设置薄膜，并且将离子束施加并透过该薄膜，以将中和的光束聚焦在样品上 。 此外，设置用于调节从该薄膜排出的二次电子的电极，以消除噪声对观察图像的混合。
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65.发明申请Pattern Dimension Measuring Device, Charged Particle Beam Apparatus, and Computer Program 有权图案尺寸测量装置，带电粒子束装置和计算机程序公开(公告)号：US20150041649A1
公开(公告)日：2015-02-12
申请号：US14379659
申请日：2013-02-18
Applicant: Hitachi High-Technologies Corporation
Inventor： Zhigang Wang
CPC classification number: H01J37/265 , G06K9/3216 , G06K9/6202 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/2806 , H01J2237/2809 , H01J2237/2817
Abstract: The present invention aims at providing a pattern dimension measuring device that realizes the measurement of a dimension of a pattern difficult to set up a measurement box, or between patterns away from each other with high precision. In order to achieve the above object, a pattern dimension measuring device is proposed which moves a field of view with reference to a first pattern formed on the specimen on the basis of predetermined first distance information, acquires a first image, executes template matching with the use of the first image and a matching template, and calculates a distance between a second pattern included in the first image and the first pattern on the basis of second distance information obtained by the template matching, and the first distance information.
Abstract translation: 本发明的目的在于提供一种图形尺寸测量装置，该图案尺寸测量装置实现了难以设置测量盒的图案的尺寸或者以高精度彼此远离的图案的尺寸的测量。 为了实现上述目的，提出了一种图案尺寸测量装置，其基于预定的第一距离信息参考在样本上形成的第一图案移动视场，获取第一图像，执行与第一图像匹配的模板 使用第一图像和匹配模板，并且基于通过模板匹配获得的第二距离信息和第一距离信息来计算包括在第一图像中的第二图案与第一图案之间的距离。
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Patent Agency Ranking
公开(公告)号：US20150021475A1
公开(公告)日：2015-01-22
申请号：US14311614
申请日：2014-06-23
Applicant: FEI Company
Inventor： Ryan Tanner
IPC: H01J37/30 , H01J37/305 , H01J37/304 , H01J37/28
CPC classification number: H01J37/3005 , G01N1/286 , H01J37/26 , H01J37/265 , H01J37/28 , H01J37/30 , H01J37/3045 , H01J37/3056 , H01J2237/2611 , H01J2237/28 , H01J2237/2803 , H01J2237/2814 , H01J2237/30472 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
Abstract: A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest.
Abstract translation: 一种使用双光束系统执行切片和观看技术的方法和装置。 通过机器视觉来定位样本图像中的兴趣特征，并且通过至少部分地通过机器视觉收集的数据的分析来确定要在后续切片和观看迭代中被研磨和成像的区域。 确定的铣削区域可以表示为围绕特征的边界框，该尺寸可以根据分析步骤而改变。 然后，相应地调整FIB以在随后的切片中切割并研磨新的面并查看迭代，并且SEM对新的面进行成像。 因为本发明精确地定位了特征并且确定了适当的面积大小以进行研磨和图像，所以通过防止不需要研磨不包含感兴趣特征的基底来提高效率。
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公开(公告)号：US08937281B2
公开(公告)日：2015-01-20
申请号：US13541618
申请日：2012-07-03
CPC classification number: H01J37/265 , H01J37/28 , H01J2237/2817
Abstract: A method for examining a sample with a scanning charged particle beam imaging apparatus. First, an image area and a scan area are specified on a surface of the sample. Herein, the image area is entirely overlapped within the scan area. Next, the scan area is scanned by using a charged particle beam along a direction neither parallel nor perpendicular to an orientation of the scan area. It is possible that only a portion of the scan area overlapped with the image area is exposed to the charged particle beam. It also is possible that both the shape and the size of the image area are essentially similar with that of the scan area, such that the size of the area projected by the charged particle beam is almost equal to the size of the image area.
Abstract translation: 一种用扫描带电粒子束成像装置检查样品的方法。 首先，在样品的表面上指定图像区域和扫描区域。 这里，图像区域在扫描区域内完全重叠。 接下来，通过使用带电粒子束沿着既不平行也不垂直于扫描区域的取向的方向来扫描扫描区域。 可能的是，与图像区域重叠的扫描区域的仅一部分暴露于带电粒子束。 图像区域的形状和尺寸也可能与扫描区域的形状和尺寸基本相同，使得由带电粒子束投射的区域的尺寸几乎等于图像区域的尺寸。
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公开(公告)号：US08912488B2
公开(公告)日：2014-12-16
申请号：US13677940
申请日：2012-11-15
Applicant: FEI Company
Inventor： Jason Arjavac
CPC classification number: H01J37/20 , H01J37/26 , H01J37/265 , H01J2237/20292 , H01J2237/31749
Abstract: A method for aligning a sample that is placed in the vacuum chamber so that the sample is oriented normal to the focused ion beam is disclosed. The locations of different spots on the sample surface are determined using a focusing routine. The locations of the different spots are used to create an image line or an image plane that determines the proper calibrations that are needed. The image line or image plane is then used to calibrate the sample stage so that the sample is aligned substantially normal to the focused ion beam.
Abstract translation: 公开了一种将放置在真空室中的样品对准以使样品垂直于聚焦离子束的方法。 使用聚焦程序确定样品表面上不同斑点的位置。 不同点的位置用于创建确定所需的适当校准的图像线或图像平面。 然后将图像线或图像平面用于校准样品台，使得样品基本上垂直于聚焦离子束排列。
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69.发明授权公开(公告)号：US08901492B1
公开(公告)日：2014-12-02
申请号：US14015383
申请日：2013-08-30
Inventor： Wen-Hao Cheng , Ajay Nandoriya , Chung-Min Fu , Chih-Chiang Tu
IPC: G01N23/203 , H01J37/28
CPC classification number: G06T15/10 , G01N23/203 , G06T2215/16 , H01J37/265 , H01J37/28 , H01J2237/24578 , H01J2237/2611 , H01J2237/2815 , H01J2237/2818
Abstract: A method comprises directing an electron beam toward a sidewall of a three-dimensional region of a semiconductor device with a tilting angle and a first azimuth angle, detecting a first projection distance of the sidewall through a detector placed over the semiconductor device, directing the electron beam toward the sidewall with the tilting angle and a second azimuth angle, detecting a second projection distance of the sidewall, calculating a height of the three-dimensional region using a first function, wherein the first function includes the first tilting angle, the first azimuth angle, the second azimuth angle and the projection distance of the sidewall and calculating a sidewall edge of the three-dimensional region using a second function, wherein the second function includes the first azimuth angle, the second azimuth angle and the projection distance of the sidewall.
Abstract translation: 一种方法包括以倾斜角度和第一方位角将电子束引向半导体器件的三维区域的侧壁，通过位于半导体器件上的检测器检测侧壁的第一突出距离，引导电子 以倾斜角度和第二方位角向侧壁射束，检测侧壁的第二突出距离，使用第一功能计算三维区域的高度，其中第一功能包括第一倾斜角，第一方位角 角度，第二方位角和侧壁的投影距离，并且使用第二函数计算三维区域的侧壁边缘，其中第二函数包括第一方位角，第二方位角和侧壁的投影距离 。
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公开(公告)号：US20140346350A1
公开(公告)日：2014-11-27
申请号：US14281772
申请日：2014-05-19
Applicant: Tao Luo
Inventor： Tao Luo
IPC: H01J37/02
CPC classification number: H01J37/02 , H01J37/265 , H01J37/28 , H01J2237/2826
Abstract: A method of testing for photomask print errors includes dividing a photomask print into sub-regions and inspecting each sub-region with a different (e.g., electron) beam column, each sub-region aligned with a beam column axis during a calibration process. The different sub-regions may be inspected on different photomask prints on a wafer plane.
Abstract translation: 测试光掩模印刷错误的方法包括将光掩模印刷分成子区域并用不同的（例如，电子）光束柱检查每个子区域，每个子区域在校准过程期间与光束柱轴对齐。 可以在晶片平面上的不同光掩模印刷体上检查不同的子区域。
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