Abstract:
An apparatus for determining the depolarization efficiency of a environment includes a transmitter, a receiver, and signal processing circuitry. A reference object is located within the environment at a reference distance. The transmitter includes a radiation source providing incident radiation that has an initial polarization as it enters the environment. The receiver receives returned radiation from the reference, which may be diffuse reflection or photoluminescence. The signal processing circuitry calculates the depolarization efficiency of the environment from the initial polarization, luminescence or final polarization, and the reference distance. A method of determining depolarization efficiency includes directing incident radiation having initial polarization through an environment onto a reference, detecting returned radiation from the reference, and calculating the depolarization efficiency using the initial polarization and the luminescence or final polarization.
Abstract:
An spectrometer including Raman and LIBS spectroscopy capabilities is disclosed. The spectrometer includes a laser source configurable to produce a lased light directable towards a target substance, the laser source having a single wavelength and having sufficient power to cause a portion of the target to emit Raman scattering and sufficient to ablate a portion of the target substance to produce a plasma plume. A separate remote light collector is optically configurable to collect light emitted from the portion of the target emitting Raman scattering and from the portion of the target producing the plasma plume. A filter is optically coupled to the remote light collector to remove reflected light and Rayleigh-scattered light, and a spectroscope is optically coupled to the filter and configured to separate the collected and filtered light into a frequency spectrum comprising a Raman spectrum and a laser-induced breakdown spectrum. Finally, an electronic light sensor is used to record the frequency spectrum.
Abstract:
An apparatus and a method for optically analyzing a sample are provided. The apparatus includes a first optical device that transmits a narrow waveband of light and has a first filter and a first monochromator that provide different paths for the narrow waveband of the light. The apparatus may also include a light source that generates the light as broadband excitation light, in which case the first optical device transmits a narrow waveband of the broadband excitation light through the first filter or the first monochromator. Further, the apparatus may include a second optical device that directs the narrow waveband of the broadband excitation light onto the sample and receives emission light from the sample, a third optical device that transmits a narrow waveband of the emission light, and a detector that converts the narrow waveband of the emission light into an electrical signal.
Abstract:
A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.
Abstract:
A method of analyzing a remotely-located object includes the step of illuminating at least a portion of a targeted object with electromagnetic radiation to induce a phase transformation in the targeted object, wherein the phase transformation produces an emitter plasma, which emits terahertz radiation. The method also includes the step of ionizing a volume of an ambient gas to produce a sensor plasma by focusing an optical probe beam in the volume and the step of detecting an optical component of resultant radiation produced from an interaction of the focused optical probe beam and the terahertz radiation in the sensor plasma. Detecting an optical component of the resultant radiation emitted by the sensor plasma facilitates detection of a characteristic fingerprint of the targeted object imposed onto the terahertz radiation produced as a result of the induced phase transformation.
Abstract:
A spectroscopy system including first and second lasers. The first laser is triggered to induce a plasma, such as on a surface of a target at a stand-off distance from the target. The second laser stimulates amplified emissions from the plasma detected by one or more spectroscopes. The gain induced by the second laser detects traces of explosives and other substances on surfaces at stand-off distances. The spectroscopy systems use the same telescopic optics to collect emissions from the detection surface and activated at or just before the peak emission intensity useful for detecting element signatures and intensity ratios from the trace elements in the plasma.
Abstract:
A device for analyzing materials by plasma spectroscopy is of the portable and independent type, comprising a housing (10) containing a laser generator (18) that emits laser pulses that are focused on the surface of a material to be analyzed by means of a parabolic mirror (32) that is movable in translation inside the housing in order to perform a series of spot measurements along a scan line on the surface of the material to be analyzed and in order to take a measurement from a calibration sample (50) mounted in the measurement endpiece (22) of the housing (10).
Abstract:
A system and method for measuring elemental concentrations of a material from a sample containing several elements by LIBS analysis. The material is heated to generate plasma and its chemical composition is determined from spectral analysis of its radiation. The spectral lines of interest are identified among those emitted by the constituents of each element composing sample. The intensities of the spectral lined identified are measured. From an estimate of temperature, electron density and relative concentration values, the chemical composition of the plasma is calculated. The absorption coefficient according to wavelength is calculated for the spectral zones of the lines of interest. From an estimate of the plasma width, the spectral radiance of the plasma is calculated for the same spectral zones and then a comparison of the intensity and shape of the spectrum thus calculated with those of the spectrum measured is performed. These calculations and this comparison are repeated iteratively in order to adjust the temperature, electron density, relative values of the elemental concentrations and width of the plasma.
Abstract:
An infrared (IR) emission spectroscopy and microscopy apparatus with X-ray excitation or electron excitation and an improved process for extending spatial relation of infrared (IR) microscopy and performing microscopic infrared (IR) analysis by X-ray or electron radiation are provided. By utilizing nanometer sized X-ray beams or electron beams to produce IR emission, the spatial resolution of IR microscopy is extended. Simultaneously performing X-ray or electron-based spectroscopy as well as structural studies are enabled.
Abstract:
An emission spectrophotometer capable of inhibiting non-uniformity of spectral intensities of component elements is provided. The emission spectrophotometer generates pulse light emission by supplying an energy accumulated in an electricity accumulating and discharging unit to a gap between an electrode and a test material, and the emission spectrophotometer includes a detection unit, for detecting an energy charged to the electricity accumulating and discharging unit before the pulse light emission; and a detection unit, for detecting an energy remaining in the electricity accumulating and discharging unit after the pulse light emission. It is determined whether the detected light is emitted by fully using the energy accumulated in the electricity accumulating and discharging unit.