Ion microscope
    71.
    发明授权
    Ion microscope 有权
    离子显微镜

    公开(公告)号:US08455841B2

    公开(公告)日:2013-06-04

    申请号:US13381623

    申请日:2010-06-04

    Abstract: Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.

    Abstract translation: 提供大电流和高度稳定的气田电离离子源,以及具有大焦深的高分辨率离子显微镜。 本发明涉及一种具有气田电离离子源的离子显微镜,其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机,以及用于循环的制冷剂循环回路冷却机构 气体离子源和冰箱之间的制冷剂。 因此,可以减小传播到气田电离离子源的冰箱的机械振动,并且实现离子源的亮度的提高和离子束聚焦性能的提高。

    Photomask defect correcting method and device
    74.
    发明授权
    Photomask defect correcting method and device 有权
    光掩模缺陷校正方法及装置

    公开(公告)号:US08257887B2

    公开(公告)日:2012-09-04

    申请号:US12733090

    申请日:2008-08-06

    Applicant: Osamu Takaoka

    Inventor: Osamu Takaoka

    CPC classification number: G03F1/74 H01J37/3056 H01J2237/0807 H01J2237/31744

    Abstract: A photomask defect correction method for correcting a defect of a photomask. A defect in a portion of a photomask to be corrected is observed and information of the observed defect for performing correction of the defect is acquired. The observed defect is corrected in accordance with the acquired defect information by irradiating the observed defect with a focused ion beam from an ion beam irradiation system having a gas field ion source that generates rare gas ions for forming the focused ion beam.

    Abstract translation: 一种用于校正光掩模缺陷的光掩模缺陷校正方法。 观察要校正的光掩模的一部分中的缺陷,并且获取用于执行缺陷校正的观察到的缺陷的信息。 通过用具有产生稀有气体离子的气体离子源的离子束照射系统的聚焦离子束照射观察到的缺陷,观察到的缺陷根据获取的缺陷信息进行校正,以形成聚焦离子束。

    Modular gas ion source
    77.
    发明授权
    Modular gas ion source 有权
    模块化气体离子源

    公开(公告)号:US08101922B2

    公开(公告)日:2012-01-24

    申请号:US12167734

    申请日:2008-07-03

    Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.

    Abstract translation: 描述了气体场离子源。 气体离子源包括发射器模块。 发射器模块包括发射器支架,发射器结构,发射器模块的可拆卸连接的电连接组件以及发射器模块的可拆卸地连接的气体供应连接组件。 所述气体离子源还包括供电模块,其中所述供应模块包括用于提供电压和/或电流的电导体,气体供应导管,热导体,所述供应模块的可拆卸地连接的电连接组件, 供电模块的可连接气体供应连接组件。 发射器模块和供电模块可通过发射器模块的可拆卸连接的连接组件和供应模块的可拆卸连接的连接组件可拆卸地连接。

    Nanotip repair and characterization using field ion microscopy
    80.
    发明授权
    Nanotip repair and characterization using field ion microscopy 有权
    纳米技术使用场离子显微镜修复和表征

    公开(公告)号:US07921465B2

    公开(公告)日:2011-04-05

    申请号:US12191855

    申请日:2008-08-14

    Abstract: A system (100) for characterizing surfaces can include a nanotip microscope (104) in a first pressure envelope (102) at a first pressure with an electrically conductive nanotip (110) mounted thereon for characterizing a sample surface. The system can also include an ion imaging system (122, 124, 128) within a second pressure envelope (120) at a second pressure. The second pressure can less than or equal to the first pressure and the pressure envelopes (102, 120) can be separated by a pressure limiting aperture (PLA) (132). The system can further include gas sources (116, 118) for introducing into the first pressure envelope (102) at least one gas, and a voltage supply (114) coupled to the nanotip (110) for generating an electric field between the nanotip (114) and the PLA (132). In the system, the electric field repels and ionizes molecules or atoms of the gas in proximity to the nanotip (110) and the ion imaging system (122, 124, 128) collects at least a portion the repelled and ionized molecules or atoms traversing the PLA (132) to image the nanotip (110).

    Abstract translation: 用于表征表面的系统(100)可以包括在第一压力下的第一压力外壳(102)中的纳米管显微镜(104),其上安装有用于表征样品表面的导电纳米尖端(110)。 该系统还可以包括在第二压力下的第二压力封套(120)内的离子成像系统(122,124,128)。 第二压力可以小于或等于第一压力,并且压力包络(102,120)可以通过压力限制孔(PLA)(132)分离。 该系统还可以包括用于将至少一种气体引入第一压力外壳(102)的气体源(116,118),以及耦合到所述纳米尖端(110)的电压源(114),用于在所述纳米尖端 114)和解放军(132)。 在系统中,电场排斥并离子化离子纳米尖端(110)附近的气体的分子或原子,并且离子成像系统(122,124,128)收集至少一部分被排斥和离子化的分子或原子穿过 PLA(132)以对纳米尖端(110)成像。

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