公开(公告)号：US20110147605A1

公开(公告)日：2011-06-23

申请号：US12914252

申请日：2010-10-28

Applicant: Roland JANZEN

Inventor： Roland JANZEN

IPC: H01J3/18

CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1516 ,  H01J2237/1532

Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.

Abstract translation: 描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。 校正原理与普通多极校正器相似。 但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。

公开(公告)号：US07928403B2

公开(公告)日：2011-04-19

申请号：US11323017

申请日：2005-12-30

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J37/26

CPC classification number: H01J37/12 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/2611 ,  H01J2237/2817

Abstract: The invention provides a multiple-lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of the optical axes of the lens sub units are inclined to each other. Further, the invention provides a charged particle beam device which comprises at least one multiple-lens assembly and a method for operating a charged particle beam device.

Abstract translation: 本发明提供了一种用于带电粒子束装置的多透镜组件1，其包括至少两个透镜子单元2，每个子单元具有光轴3，其中透镜子单元的至少两个光轴倾斜于 彼此。 此外，本发明提供一种带电粒子束装置，其包括至少一个多透镜组件和用于操作带电粒子束装置的方法。

公开(公告)号：US20100187433A1

公开(公告)日：2010-07-29

申请号：US12523984

申请日：2008-01-24

Applicant: Derek Anthony Eastham

Inventor： Derek Anthony Eastham

IPC: H01J37/10 ,  H01J3/14

CPC classification number: H01J37/073 ,  B82Y15/00 ,  H01J37/065 ,  H01J37/12 ,  H01J37/28 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: A particle beam generator comprising particle extraction means disposed adjacent a particle source and operable to extract particles from such a source into an extraction aperture of the extraction means to form a particle beam, particle accelerating means operable to accelerate the extracted particles to increase the energy of the beam, and focussing means operable to focus the particle beam, each of said extraction means, accelerating means and focussing means being arranged in sequence and having apertures therethrough and in alignment to define a passageway through which the particles are constrained to move, characterised in that the extraction means comprises a lens structure comprising at least a pair of electrodes separated by a layer of insulating material allowing the application of different potentials to each of the lens structure electrodes, one of said electrodes comprising an extraction plate having an extraction aperture formed therein, by means of which extraction plate particles may be drawn from the particle source and through the extraction aperture by means of a potential difference between the source and said extraction plate.

Abstract translation: 一种粒子束发生器，其包括与颗粒源相邻设置的颗粒提取装置，可操作以将颗粒从这种源提取到提取装置的提取孔中以形成粒子束，粒子加速装置可操作以加速提取的颗粒以增加能量 所述光束和聚焦装置可操作以聚焦所述粒子束，所述提取装置，加速装置和聚焦装置中的每一个按顺序布置并且具有贯穿其中的孔并且对齐以限定所述颗粒被约束以移动的通道，其特征在于 所述提取装置包括透镜结构，所述透镜结构包括至少一对电极，所述至少一对电极由绝缘材料层隔开，允许对每个所述透镜结构电极施加不同的电位，所述电极中的一个包括在其中形成有提取孔的提取板 ，通过其提取平台 e颗粒可以通过源和所述提取板之间的电位差从颗粒源和抽出孔中抽出。

公开(公告)号：US20090212229A1

公开(公告)日：2009-08-27

申请号：US12393049

申请日：2009-02-26

Applicant: Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem Herman Karel STEENBRINK

IPC: H01J3/14 ,  G01J1/00 ,  A61N5/00

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

Abstract translation: 一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。 这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。 优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

公开(公告)号：US07576917B2

公开(公告)日：2009-08-18

申请号：US10540178

申请日：2003-12-12

Applicant: Stefan Lanio

Inventor： Stefan Lanio

IPC: G02B27/10

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

Abstract: The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise an first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 其中，提供至少一个用于至少两个透镜模块的公共激励线圈。 透镜模块包括第一极靴，第二极靴和用于带电粒子束的至少一个开口。 透镜模块构成一个部件并共享励磁线圈。 从而提高了原材料的可利用性，工件的加工和透镜领域的对称条件。

公开(公告)号：US20080315096A1

公开(公告)日：2008-12-25

申请号：US11792156

申请日：2005-09-01

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: G01N23/00

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J37/04 ,  H01J37/185 ,  H01J2237/0245 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1503 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/204

Abstract: Provided is a portable electron microscope using a microcolumn. The portable electron microscope includes a microcolumn, a low vacuum pump, a high vacuum pump, an ultra-high vacuum ion pump, a first chamber for receiving and fixing the microcolumn and a sample to be measured and forming a vacuum by means of the pumps, a controller, and a case for receiving the pumps, the chamber and the controller.

Abstract translation: 提供了使用微柱的便携式电子显微镜。 便携式电子显微镜包括微柱，低真空泵，高真空泵，超高真空离子泵，用于接收和固定微柱的第一室和待测量的样品并通过泵形成真空 ，控制器和用于接收泵，腔室和控制器的壳体。

公开(公告)号：US07335895B1

公开(公告)日：2008-02-26

申请号：US11277148

申请日：2006-03-22

Applicant: James Spallas ,  Lawrence Muray

Inventor： James Spallas ,  Lawrence Muray

IPC: H01J37/26

CPC classification number: H01J37/04 ,  H01J2237/038 ,  H01J2237/1205 ,  H01J2237/26 ,  H01J2237/3175

Abstract: A micro-electrical system, such as a lens stack for use in a scanning electron microscope, analysis tool, etc., comprises recesses and/or serrations that increase the surface path breakdown, thereby increasing reliability and enabling high voltage operations.

Abstract translation: 用于扫描电子显微镜，分析工具等的微电子系统包括增加表面路径击穿的凹槽和/或锯齿，从而增加可靠性并实现高电压操作。

公开(公告)号：US07279686B2

公开(公告)日：2007-10-09

申请号：US10983566

申请日：2004-11-08

Applicant: Conrad W. Schneiker

Inventor： Conrad W. Schneiker

IPC: G21K1/08

CPC classification number: G21K1/08 ,  B33Y80/00 ,  G21K5/04 ,  H01J1/304 ,  H01J3/021 ,  H01J9/025 ,  H01J37/065 ,  H01J37/073 ,  H01J37/12 ,  H01J2201/30407 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: A solid state sub-nanometer-scale electron beam emitter comprising a multi-layered structure having a nano-tip electron emitter and tunnel emission junction formed on substrate, an initial electron beam extraction electrode, a “nano-sandwich Einzel” electrode, and a topmost protective layer.

Abstract translation: 一种固态亚纳米级电子束发射器，包括在基底上形成的具有纳米尖端电子发射体和隧道发射结的多层结构，初始电子束提取电极，“纳米夹心Einzel”电极和 最上层的保护层。

公开(公告)号：US20060131698A1

公开(公告)日：2006-06-22

申请号：US11259959

申请日：2005-10-24

Applicant: Jin Jeong ,  Dae Kim ,  Sang Choi ,  Dae Kim ,  Ho Kim

Inventor： Jin Jeong ,  Dae Kim ,  Sang Choi ,  Dae Kim ,  Ho Kim

IPC: H01L23/544

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/04 ,  H01J2237/0492 ,  H01J2237/1205 ,  H01J2237/1518

Abstract: Provided is a wafer-scale microcolumn array using a low temperature co-fired ceramic (LTCC) substrate. The microcolumn array includes a LTCC substrate having wirings and wafer-scale beam deflector arrays, which are attached to at least one side of the LTCC substrate and has an array of deflection devices deflecting electron beams. The wafer-scale microcolumn array using the LTCC substrate makes it possible to significantly increase the throughput of semiconductor wafers, simplify its manufacturing process, and lower its production cost.

公开(公告)号：US20060006342A1

公开(公告)日：2006-01-12

申请号：US11155633

申请日：2005-06-20

Applicant: Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

Inventor： Masaki Hosoda ,  Masato Muraki ,  Yasuhiro Someda ,  Mahito Negishi ,  Koichi Wakizaka ,  Masakazu Sugaya

IPC: G01F23/00

CPC classification number: H01J37/3007 ,  H01J9/18 ,  H01J37/04 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/166 ,  H01J2237/31774 ,  Y10T403/32713

Abstract: An assembly having first and second members arranged through a sealing member sandwiched between them is disclosed. The second member has a reference portion having a reference surface. The assembly includes a pressing portion which presses the first member against the reference surface in a direction substantially parallel to a surface of the second member. The second member is fixed to the first member while the first member abuts against the reference surface and the sealing member is compressed between the first and second members.

Abstract translation: 公开了一种具有通过夹在它们之间的密封构件布置的第一和第二构件的组件。 第二构件具有具有参考表面的参考部分。 该组件包括按照大致平行于第二构件的表面的方向将第一构件压靠参考表面的按压部分。 第二构件固定在第一构件上，而第一构件抵靠参考面，并且密封构件在第一构件和第二构件之间被压缩。