公开(公告)号：US07999240B2

公开(公告)日：2011-08-16

申请号：US12168232

申请日：2008-07-07

Applicant: Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: H01J37/20

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.

Abstract translation: 一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。 对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。

公开(公告)号：US07906762B2

公开(公告)日：2011-03-15

申请号：US12303611

申请日：2007-06-07

Applicant: Mart Petrus Maria Bierhoff ,  Bart Buijsse ,  Cornelis Sander Kooijman ,  Hugo Van Leeuwen ,  Hendrik Gezinus Tappel ,  Colin August Sanford ,  Sander Richard Marie Stoks ,  Ben Jacobus Marie Bormans ,  Steven Berger ,  Koen Arnoldus Wilhelmus Driessen ,  Johannes Antonius Hendricus Wilhelmus Gerardus Persoon

Inventor： Mart Petrus Maria Bierhoff ,  Bart Buijsse ,  Cornelis Sander Kooijman ,  Hugo Van Leeuwen ,  Hendrik Gezinus Tappel ,  Colin August Sanford ,  Sander Richard Marie Stoks ,  Ben Jacobus Marie Bormans ,  Steven Berger ,  Koen Arnoldus Wilhelmus Driessen ,  Johannes Antonius Hendricus Wilhelmus Gerardus Persoon

IPC: H01J37/08 ,  H01J37/18 ,  H01J5/02

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

Abstract translation: 紧凑型电子显微镜使用具有形成样品所在的真空区域的一部分的壁的可移除的样品保持器。 通过使用可拆卸的样品架来容纳真空，在成像之前需要排空的空气的体积大大减少，并且显微镜可以被快速排空。 在优选实施例中，滑动真空密封允许样品保持器位于电子柱下方，并且样品保持器首先在真空缓冲器下通过以除去样品保持器中的空气。

公开(公告)号：US07893411B2

公开(公告)日：2011-02-22

申请号：US12239116

申请日：2008-09-26

Applicant: Rieko Nishimura ,  Kiyoshi Hattori

Inventor： Rieko Nishimura ,  Kiyoshi Hattori

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/1474 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30488

Abstract: A timing control circuit controls the timing for applying a voltage to a sub deflector when changing a position to be irradiated with the charged-particle beam. A control computer compares a target line width and a line width of a pattern written with the timing for applying voltage to the sub deflector changed, and determines appropriate timing for applying voltage to the sub deflector from a timing range corresponding to a predetermined allowable range of the difference between the target line width and the line width of the written pattern. The control computer then controls the timing control circuit based on the determined timing.

Abstract translation: 定时控制电路在改变要被带电粒子束照射的位置时控制向副偏转器施加电压的定时。 控制计算机将目标线宽度和写入用于向副偏转器施加电压的定时的图案的线宽进行比较，并且从对应于预定允许范围的定时范围确定适合于向副偏转器施加电压的定时 目标线宽与写入图案的线宽之间的差异。 然后，控制计算机基于确定的定时来控制定时控制电路。

公开(公告)号：US07825377B2

公开(公告)日：2010-11-02

申请号：US12153068

申请日：2008-05-13

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G21K1/08 ,  H01J3/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US07750293B2

公开(公告)日：2010-07-06

申请号：US11987928

申请日：2007-12-06

Applicant: Edward Principe

Inventor： Edward Principe

IPC: G01N23/00

CPC classification number: H01J37/28 ,  G01N1/32 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/226

Abstract: A method and an apparatus are for three-dimensional tomographic image generation in a scanning electron microscope system. At least two longitudinal marks are provided on the top surface of the sample which include an angle therebetween. In consecutive image recordings, the positions of these marks are determined and are used to quantify the slice thickness removed between consecutive image recordings.

Abstract translation: 一种用于扫描电子显微镜系统中的三维断层图像生成的方法和装置。 在样品的顶表面上提供至少两个纵向标记，其包括它们之间的角度。 在连续的图像记录中，确定这些标记的位置并用于量化连续图像记录之间去除的切片厚度。

公开(公告)号：US20090321625A1

公开(公告)日：2009-12-31

申请号：US12554277

申请日：2009-09-04

Applicant: Manny Sieradzki ,  Patrick Splinter ,  Bo H. Vanderberg

Inventor： Manny Sieradzki ,  Patrick Splinter ,  Bo H. Vanderberg

IPC: H01J49/26

CPC classification number: H01J37/3171 ,  H01J37/302 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31706

Abstract: A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and mass analyzed by a mass analyzer. Ions are implanted into the workpiece in one of a first mode and a second mode based on the desired dosage of ions, where in the first mode, the ion beam is scanned by a beam scanning system positioned downstream of the mass analyzer and parallelized by a parallelizer positioned downstream of the beam scanning system. In the first mode, the workpiece is scanned through the scanned ion beam in at least one dimension by a workpiece scanning system. In the second mode, the ion beam is passed through the beam scanning system and parallelizer un-scanned, and the workpiece is two-dimensionally scanned through the spot ion beam.

Abstract translation: 提供了一种用于在多个工作范围内将离子注入工件的系统和方法。 提供所需的离子剂量，并且由离子源形成点离子束，并通过质量分析器进行质量分析。 基于所需的离子剂量，将离子以第一模式和第二模式中的一种注入到工件中，其中在第一模式中，离子束被位于质量分析器下游的束扫描系统扫描，并由 位于光束扫描系统下游的并联器。 在第一模式中，工件通过工件扫描系统在至少一个维度上扫描扫描的离子束。 在第二模式中，离子束通过光束扫描系统，并行扫描未扫描，工件通过点离子束二维扫描。

公开(公告)号：US07547898B2

公开(公告)日：2009-06-16

申请号：US11445667

申请日：2006-06-02

Applicant: Donald W. Berrian ,  John W. Vanderpot

Inventor： Donald W. Berrian ,  John W. Vanderpot

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror electrode of the ion source, a workpiece handling system, and a controller, wherein the ion source is selectively tunable via the controller to provide rapid control of a formation of an ion beam. The controller is operable to selectively rapidly control power to the ion source, therein modulating a power of the ion beam between an implantation power and a minimal power in less than approximately 20 microseconds based, at least in part, to a signal associated with a workpiece position. Control of the ion source therefore mitigates particle contamination in the ion implantation system by minimizing an amount of time at which the ion beam is at the implantation current.

Abstract translation: 提供了一种减轻离子注入系统污染的系统和方法。 该系统包括离子源，可操作以向离子源的细丝和反射镜电极供电的电源，工件处理系统和控制器，其中离子源可经由控制器选择性地调节以提供快速控制 形成离子束。 控制器可操作以选择性地快速地控制离子源的功率，其中至少部分地基于与工件相关联的信号，在小于约20微秒内在注入功率和最小功率之间调制离子束的功率 位置。 因此，离子源的控制因此通过使离子束处于注入电流的时间量最小化来减轻离子注入系统中的颗粒污染。

公开(公告)号：US07476878B2

公开(公告)日：2009-01-13

申请号：US11567522

申请日：2006-12-06

Applicant: Russell J. Low ,  Jonathan Gerald England ,  Stephen E. Krause ,  Eric D. Hermanson

Inventor： Russell J. Low ,  Jonathan Gerald England ,  Stephen E. Krause ,  Eric D. Hermanson

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J37/15 ,  H01J37/18 ,  H01J37/302 ,  H01J37/3023 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/1503 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/30488 ,  H01J2237/31705 ,  H01L21/266

Abstract: Techniques for reducing effects of photoresist outgassing are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for reducing effects of photoresist outgassing in an ion implanter. The apparatus may comprise a drift tube located between an end-station and an upstream beamline component. The apparatus may also comprise a first variable aperture between the drift tube and the end-station. The apparatus may further comprise a second variable aperture between the drift tube and the upstream beamline component. The first variable aperture and the second variable aperture can be adjusted to facilitate differential pumping.

Abstract translation: 公开了减少光阻剂除气效果的技术。 在一个特定的示例性实施例中，技术可以被实现为用于减少离子注入机中的光致抗蚀剂除气的影响的装置。 该装置可以包括位于终端站和上游束线组件之间的漂移管。 该装置还可以包括漂移管和终端站之间的第一可变孔径。 该装置还可以包括漂移管和上游束线部件之间的第二可变孔径。 可以调节第一可变孔径和第二可变孔径以促进差动泵送。

公开(公告)号：US20090008551A1

公开(公告)日：2009-01-08

申请号：US12153068

申请日：2008-05-13

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G01N23/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US20080265158A1

公开(公告)日：2008-10-30

申请号：US12104160

申请日：2008-04-16

Applicant: Kouji Iwasaki

Inventor： Kouji Iwasaki

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0203 ,  H01J2237/20 ,  H01J2237/304 ,  H01J2237/3174

Abstract: A charged particle beam instrument is offered which comprises an irradiation mechanism for irradiating a sample with a charged particle beam (FIB/EB), a detection mechanism for detecting secondary charged particles produced by the irradiation by the charged particle beam, a storage portion for previously storing three-dimensional data about the irradiation mechanism and detection mechanism in an interrelated manner to the stage coordinate system W, a conversion portion for converting three-dimensional data about the sample into the stage coordinate system, and a decision portion for simulating the positional relationships among the sample, irradiation mechanism, and detection mechanism based on data converted by the conversion portion and on data stored in the storage portion when a certain position on the sample is placed into a measurement point and for previously making a decision as to whether the sample will interfere and making a report of the result of the decision.

Abstract translation: 提供一种带电粒子束仪器，其包括用于用带电粒子束（FIB / EB）照射样品的照射机构，用于检测由带电粒子束照射产生的二次带电粒子的检测机构，用于预先 以相关方式存储关于照射机构和检测机构的三维数据到舞台坐标系W，将关于样本的三维数据转换成舞台坐标系的转换部分，以及用于模拟位置关系的判定部分 当样本中的某个位置被放入测量点时，基于由转换部分转换的数据和存储在存储部分中的数据的样本，照射机制和检测机制，并且用于先前作出关于样本 将干预并作出决定结果的报告。