SEMICONDUCTOR DEVICE
    7.
    发明申请

    公开(公告)号:US20220246733A1

    公开(公告)日:2022-08-04

    申请号:US17613393

    申请日:2020-05-22

    Applicant: FLOSFIA INC.

    Abstract: An object of the disclosure is to provide a semiconductor device with low-loss and suppressed leakage current, which is particularly useful for power devices. A semiconductor device including a semiconductor layer, a dielectric film provided on the semiconductor layer and having an opening and provided over a distance of at least 0.25 μm from the opening, and an electrode layer provided over a part or all of the dielectric film from the inside of the opening, wherein the dielectric film has a thickness of less than 50 nm from the opening to a distance of 0.25 μm, and has relative permittivity of 5 or less.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20250133794A1

    公开(公告)日:2025-04-24

    申请号:US19005092

    申请日:2024-12-30

    Applicant: FLOSFIA INC

    Abstract: Provided a semiconductor device including: a semiconductor layer; and an electrode disposed on the semiconductor layer directly or via another layer, the semiconductor layer including a first region containing, as a major component, a crystalline oxide semiconductor containing gallium, and a second region containing, as a major component, an oxide containing gallium, the second region and the first region each containing an impurity element, a maximum value of a concentration of the impurity element in the second region being located at a depth of 1.0 μm or more from an upper surface of the semiconductor layer and being greater than a maximum value of a concentration of the impurity element in the first region.

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