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1.发明申请
公开(公告)号：WO2019025082A1
公开(公告)日：2019-02-07
申请号：PCT/EP2018/067052
申请日：2018-06-26
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , GIESBERS, Adrianus, Johannes, Maria , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising: locally heating the pellicle (4) using radiative heating (3), and depositing coating material simultaneously on both sides of the pellicle. Also disclosed are pellicles manufactured according to this method. Further disclosed is the use of a multilayer graphene pellicle with double-sided hexagonal boron nitride coating in a lithographic apparatus.
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公开(公告)号：WO2018228933A3
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2018228933A2
公开(公告)日：2018-12-20
申请号：PCT/EP2018/065127
申请日：2018-06-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VLES, David, Ferdinand , ANDE, Chaitanya Krishna , DE GROOT, Antonius, Franciscus, Johannes , GIESBERS, Adrianus, Johannes, Maria , JANSSEN, Johannes, Joseph , JANSSEN, Paul , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , MEIJER, Marcel, Peter , MEIJERINK, Wouter, Rogier , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , OLSMAN, Raymond , PATEL, Hrishikesh , PÉTER, Mária , VAN DEN BOSCH, Gerrit , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Alexandar, Nikolov
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：WO2017102380A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079599
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： VLES, David, Ferdinand , ABEGG, Erik, Achilles , BENDIKSEN, Aage , BROUNS, Derk, Servatius, Gertruda , GOVIL, Pradeep K. , JANSSEN, Paul , NASALEVICH, Maxim, Aleksandrovich , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VOORTHUIJZEN, Willem-Pieter , WILEY, James, Norman
CPC classification number: G03F7/70916 , G03F1/22 , G03F1/62 , G03F7/7085 , G03F7/70983
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Abstract translation: 适用于光刻设备的图案形成装置的薄膜。 所述薄膜包括至少一个破损区域，所述破坏区域被配置为在光刻设备的正常使用期间优先破坏所述薄膜的其余区域之前破裂。 至少一个破裂区域包括薄膜的与周围薄膜区域相比厚度减小的区域。
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公开(公告)号：WO2020078625A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/074447
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , NIKIPELOV, Andrey , VAN ZWOL, Pieter-Jan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , POLYAKOV, Alexey, Olegovich
Abstract: A first diffusor configured to receive and transmit radiation comprises a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation comprises: a first layer and a second layer. The first layer is formed from a first material, the first layer comprising a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also comprises a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusor first and second diffusors may be configured to receive and transmit EUV radiation.
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Patent Agency Ranking
公开(公告)号：WO2019101517A1
公开(公告)日：2019-05-31
申请号：PCT/EP2018/080415
申请日：2018-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , PÉTER, Mária , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
IPC: G03F7/20
Abstract: A method of manufacturing a pellicle for a lithographic apparatus, said method comprising growing the pellicle in a three-dimensional template and pellicles manufactured according to this method. Also disclosed is the use of a pellicle manufactured according to the method in an EUV lithography apparatus as well as the use of a three-dimensional template in the manufacture of a pellicle.
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公开(公告)号：WO2017207512A2
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Abstract translation: 图案形成装置，其包括反射标记，其中所述标记包括：多个反射区域，其被配置为优先反射具有给定波长的辐射; 以及配置为优先吸收具有给定波长的辐射的多个吸收区域; 其中所述吸收和反射区域被布置为当用辐射照射时形成从所述标记反射的图案化的辐射束，并且其中所述反射区域包括粗糙的反射表面，所述粗糙的反射表面被配置为漫射从所述反射区域反射的辐射，以及 其中粗糙化的反射表面具有约为给定波长的八分之一或更多的均方根粗糙度。
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公开(公告)号：WO2017102378A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079584
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KAMALI, Mohammad, Reza , PÉTER, Mária , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
Abstract translation: 一种用于EUV光刻的薄膜组件（80），所述薄膜组件包括：平面薄膜（40）; 边界（81），配置为保持膜; 和框架组件（50），所述框架组件（50）连接到所述边界并且被配置成附接到用于EUV光刻的图案形成装置（MA）; 其中所述框架组件在垂直于所述膜平面的方向上连接到所述边界，使得在使用中所述框架组件位于所述边界和所述图案形成装置之间。
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公开(公告)号：WO2020078721A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/076667
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes, Christiaan, Leonardus , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey, Sergeevich , NOTENBOOM, Arnoud, Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus, Adrianus , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER WOORD, Ties, Wouter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Aleksandar, Nikolov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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公开(公告)号：WO2019243009A1
公开(公告)日：2019-12-26
申请号：PCT/EP2019/063895
申请日：2019-05-29
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , KLEIN, Alexander, Ludwig , KURGANOVA, Evgenia , NOTENBOOM, Arnoud, Willem , VAN ZWOL, Pieter-Jan , VLES, David, Ferdinand
Abstract: A pellicle comprising a core comprising a material other than silicon carbide, a silicon carbide adhesion layer, and a ruthenium capping layer, the ruthenium capping layer being in contact with the silicon carbide adhesion layer. Also described is a method of preparing a pellicle comprising the steps of: (i) providing a pellicle core; (ii) providing a silicon carbide adhesion layer on the pellicle core; and (iii) providing a ruthenium capping layer in contact with the silicon carbide adhesion layer. Also provided is the use of silicon carbide as an adhesion layer in an EUV pellicle as well as an assembly.
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