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    Immersion lithography apparatus
    1.
    发明专利
    Immersion lithography apparatus 有权
    倾斜平面设备

    公开(公告)号：JP2009111383A

    公开(公告)日：2009-05-21

    申请号：JP2008272561

    申请日：2008-10-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER HEIJDEN MARCUS THEODOO ,  KRAMER RONALD HARM GUNTHER ,  VAN DEN BOGAARD FREDERICK JOHA ,  JANSSEN PETER GERARDUS HUBERTU

    IPC: H01L21/027

    CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a sampler, a sample holder and an immersion lithographic apparatus including the sampler. SOLUTION: The sampler 90 is provided to collect particles in an immersion system of a lithographic apparatus. The sampler 90 comprises a holder base 94 having a collector surface 96. The collector surface 96 is configured to collect and store contaminants. The sampler 90 may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface 96 with a liquid or with a surface of the immersion system. The sampler 90 may be removable from the immersion lithographic apparatus for inspection. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种采样器，一个采样器和一个包括采样器的浸没式光刻设备。 解决方案：提供采样器90以收集光刻设备的浸没系统中的颗粒。 采样器90包括具有收集器表面96的保持器底座94.收集器表面96构造成收集和存储污染物。 采样器90可以位于浸没系统的表面上，以便通过收集器表面96与液体或浸没系统的表面接触来收集样品颗粒。 取样器90可以从浸没式光刻设备中移除以进行检查。 版权所有（C）2009，JPO＆INPIT

    Cleaning apparatus and immersion lithographic apparatus
    2.
    发明专利
    Cleaning apparatus and immersion lithographic apparatus 有权
    清洁设备和浸入式光刻设备

    公开(公告)号：JP2009152555A

    公开(公告)日：2009-07-09

    申请号：JP2008274272

    申请日：2008-10-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  BLOM PAUL ,  KRAMER RONALD HARM GUNTHER ,  VAN PUTTEN MICHEL ,  DE GRAAF ARIEL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To provide a cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus, and an immersion lithographic apparatus including an apparatus for cleaning one or more surfaces. SOLUTION: The cleaning apparatus 42 may comprise a plasma radical source, a conduit, and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to a surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and the substrate table and/or the substrate. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于清洗浸没式光刻设备的基板或部件的清洁设备，以及包括用于清洁一个或多个表面的设备的浸没式光刻设备。 解决方案：清洁设备42可以包括等离子体激光源，导管和激光束限制系统。 等离子体自由基源可以提供自由基流。 导管可以将来自等离子体源的源自由基提供给待清洁的表面。 自由基限制系统可以引导自由基清洁表面的局部化部分。 清洁装置可以包括旋转器并且可以被配置为清洁基板边缘。 浸没式光刻设备可以包括用于支撑衬底的衬底台和用于将浸没流体限制在投影系统和衬底台和/或衬底之间的流体限制结构。 版权所有（C）2009，JPO＆INPIT

    Lithography equipment, and device fabrication method
    3.
    发明专利
    Lithography equipment, and device fabrication method 有权
    LITHOGRAPHY EQUIPMENT，AND DEVICE FABRICATION METHOD

    公开(公告)号：JP2007329475A

    公开(公告)日：2007-12-20

    申请号：JP2007142949

    申请日：2007-05-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARTENS SIMON BERNARDUS CORNEL ,  KRAMER RONALD HARM GUNTHER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: C09J5/00 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70975 ,  Y10T428/265

    Abstract: PROBLEM TO BE SOLVED: To provide a method for mutually bonding two object components which is not easily affected by adhesive application errors such as a positional error and/or a quantitative error. SOLUTION: This method provides a first object component with a first surface and a second object component with a second surface, positions the first and second object components in a way that the first and second surfaces face each other and a gap is produced between the first and second surfaces, applies adhesive to at least a part of the gap and holds the first and second object components in a fixed period and with a fixed distance to ensure that the gap is substantially filled by the adhesive by means of capillary effects and/or the gravity. In addition, this method relates to how to assemble the objects, including the mutual movement of the first and second object components to shorten the distance between the first and second surfaces. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种不容易受诸如位置误差和/或定量误差之类的粘合剂施加误差影响的两个对象部件相互粘合的方法。 解决方案：该方法提供具有第一表面的第一对象部件和具有第二表面的第二对象部件，以使第一和第二表面彼此面对并且产生间隙的方式定位第一和第二对象部件 在第一表面和第二表面之间，将粘合剂施加到间隙的至少一部分并且将固定的第一和第二物体部件保持在固定的时间段内并且具有固定的距离，以确保间隙基本上通过毛细管效应被粘合剂填充 和/或重力。 此外，该方法涉及如何组装物体，包括第一和第二物体部件的相互移动以缩短第一和第二表面之间的距离。 版权所有（C）2008，JPO＆INPIT

    CLEANING APPARATUS AND IMMERSION LITHOGRAPHIC APPARATUS
    8.
    发明专利
    CLEANING APPARATUS AND IMMERSION LITHOGRAPHIC APPARATUS 未知

    公开(公告)号：SG152197A1

    公开(公告)日：2009-05-29

    申请号：SG2008079998

    申请日：2008-10-28

    Applicant: ASML NETHERLANDS BV

    Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  HANS JANSEN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  PAUL BLOM ,  KRAMER RONALD HARM GUNTHER ,  MICHEL VAN PUTTEN ,  ARIEL DE GRAAF

    Abstract: A cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus comprise may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of said surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the apparatus for cleaning one or more surfaces is also disclosed. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and substrate table and/or substrate. An immersion lithographic apparatus is disclosed. [Fig. 7]

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