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    Structure for projecting pattern on image surface
    1.
    发明专利
    Structure for projecting pattern on image surface 审中-公开
    用于投影图像图案的结构

    公开(公告)号：JP2006210928A

    公开(公告)日：2006-08-10

    申请号：JP2006019045

    申请日：2006-01-27

    Applicant: Infineon Technologies Ag ,  インフィネオン テクノロジーズ アクチエンゲゼルシャフト

    Inventor： MOUKARA MOLELA ,  PFORR RAINER ,  MUELDERS THOMAS ,  HENNIG MARIO ,  ZEILER KARSTEN

    IPC: H01L21/027 ,  G03F1/00 ,  G03F7/20

    CPC classification number: G03F7/70283 ,  G03F1/30 ,  G03F1/32 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70125

    Abstract: PROBLEM TO BE SOLVED: To provide a structure, capable of simultaneously projecting a periodic line interval plane diffraction grating of a memory cell region and a peripheral structure pattern that is formed intricately. SOLUTION: The quality of image formation, when an image is simultaneously transmitted from a line interval plane diffraction grating and a peripheral structure including MUX row, is improved by using a quadrupole illumination. Four poles 14a to 14d of this quadrupole illumination extend in the longitudinal direction, and the axis 112 of the pole in the longitudinal direction is located vertical, with respect to the row direction of the grating row of a mask. Thus, the contrast of a structure image formation of the line interval planar diffraction grating, MEEF, and a process window can be improved. Meanwhile, the geometrical accuracy of the peripheral structure (particularly, MUX row) is stabilized by an illumination pupil 18, extending over the entire wide depth range of focus. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供能够同时投影存储单元区域的周期性行间隔平面衍射光栅和复杂形成的周边结构图案的结构。 解决方案：通过使用四极照明来改善图像从线间隔平面衍射光栅同时传输的图像形成和包括MUX行的外围结构的质量。 该四极照明的四极14a至14d在纵向方向上延伸，并且杆的纵向方向的轴线112相对于掩模的光栅行的行方向位于垂直方向。 因此，可以提高线间隔平面衍射光栅的结构图像形成的对比度，MEEF和处理窗口。 同时，周边结构（特别是MUX行）的几何精度通过在整个宽的深度聚焦范围上延伸的照明光瞳18而稳定。 版权所有（C）2006，JPO＆NCIPI

    3.
    发明专利
    未知

    公开(公告)号：DE102005003905B4

    公开(公告)日：2007-04-12

    申请号：DE102005003905

    申请日：2005-01-27

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： PFORR RAINER ,  MOUKARA MOLELA ,  MUELDERS THOMAS ,  HENNIG MARIO ,  ZEILER KARSTEN

    IPC: G03F7/20 ,  G03F1/00

    Abstract: An improvement of the imaging quality with simultaneous transfer of line-space gratings and peripheral structures including a MUX space is achieved using a quadrupole illumination whose poles are formed in elongate fashion and whose longitudinal axes are arranged perpendicular to the orientation of the lines of the line-space grating arranged on a mask. The structure imaging of the line-space grating is improved with regard to contrast, MEEF, and process window, while the geometrical fidelity of the peripheral structure, in particular of the MUX space, is stabilized over a wide depth of field range.

    6.
    发明专利
    未知

    公开(公告)号：DE102005003905A1

    公开(公告)日：2006-10-12

    申请号：DE102005003905

    申请日：2005-01-27

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： PFORR RAINER ,  MOUKARA MOLELA ,  MUELDERS THOMAS ,  HENNIG MARIO ,  ZEILER KARSTEN

    IPC: G03F7/20 ,  G03F1/00

    Abstract: An improvement of the imaging quality with simultaneous transfer of line-space gratings and peripheral structures including a MUX space is achieved using a quadrupole illumination whose poles are formed in elongate fashion and whose longitudinal axes are arranged perpendicular to the orientation of the lines of the line-space grating arranged on a mask. The structure imaging of the line-space grating is improved with regard to contrast, MEEF, and process window, while the geometrical fidelity of the peripheral structure, in particular of the MUX space, is stabilized over a wide depth of field range.

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