公开(公告)号：US09299535B2

公开(公告)日：2016-03-29

申请号：US14638786

申请日：2015-03-04

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro Ogasawara

IPC: H01J37/30 ,  H01J37/141 ,  H01J37/153 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/3007 ,  H01J2237/043 ,  H01J2237/0492 ,  H01J2237/12

Abstract: A multi charged particle beam writing apparatus includes an aperture member to form multiple beams, a blanking plate in which there are arranged a plurality of blankers to respectively perform blanking deflection for a corresponding beam in the multiple beams having passed through a plurality of openings of the aperture member, a blanking aperture member to block each beam having been deflected to be in OFF state by at least one of the plurality of blankers, a first grating lens, using the aperture member as gratings, to correct spherical aberration of the charged particle beam, and a correction lens configured to correct high order spherical aberration produced by the first grating lens.

Abstract translation: 多带电粒子束写入装置包括形成多个光束的孔径构件，其中布置有多个遮挡件，以分别对通过多个光束的多个光束的多个光束中的相应光束执行消隐偏转 孔径构件，用于阻挡已经被多个遮挡件中的至少一个偏转到处于关闭状态的每个光束的消隐孔径构件，使用孔径构件作为光栅的第一光栅透镜，以校正带电粒子束的球面像差 以及配置为校正由第一光栅透镜产生的高阶球面像差的校正透镜。

公开(公告)号：US20150340196A1

公开(公告)日：2015-11-26

申请号：US14699216

申请日：2015-04-29

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Munehiro OGASAWARA ,  Ryoichi YOSHIKAWA

IPC: H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3026 ,  H01J37/317 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/304 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.

Abstract translation: 多带电粒子束写入方法包括：除了用于跟踪控制的光束偏转之外，通过执行多带电粒子束的另一束偏转，将每个相应光束的写入位置移位到下一个写入位置，同时继续光束偏转 最大写入时间后的跟踪控制已过; 在相应的写入时间期间，将每个对应的波束处于“接通”状态，并将其发送到已经被移位的每个相应波束的下一个写入位置，同时继续跟踪控制; 并且返回跟踪位置，使得下一个跟踪开始位置是跟踪控制开始的前一个跟踪开始位置，通过在将每个对应的波束发射到至少已经移位的下一个写入位置之后将跟踪控制的光束偏转重置 在每个对应的光束中一次，同时继续跟踪控制。

公开(公告)号：US08927948B2

公开(公告)日：2015-01-06

申请号：US14249951

申请日：2014-04-10

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: H01J37/30 ,  H01J37/147 ,  H01J37/26 ,  H01J37/28 ,  H01J37/04

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A particle beam system includes a charged particle beam source, a beam blanking module connectable to a data network, a focusing lens, a first beam deflection module connectable to the data network, a calculation module configured to determine a deflection time; and an encoding module.

Abstract translation: 粒子束系统包括带电粒子束源，可连接到数据网络的束消隐模块，聚焦透镜，可连接到数据网络的第一光束偏转模块，被配置为确定偏转时间的计算模块; 和编码模块。

公开(公告)号：US20140252225A1

公开(公告)日：2014-09-11

申请号：US14190289

申请日：2014-02-26

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kota Iwasaki

IPC: H01J49/06

CPC classification number: H01J49/061 ,  H01J37/05 ,  H01J49/40 ,  H01J2237/043 ,  H01J2237/057

Abstract: When a time-of-flight mass selector having a chopper using a deflector selects the masses of the ions, an ion beam is deflected. As a result, at least a part of the ion beams diagonally pass through an aperture electrode with respect to the axis. Accordingly, there has been a problem that a position on an object irradiated with a cluster ion beam, results in moving. This mass selector includes: a flight tube having an equipotential space that makes a charged substance fly therein; a deflector that is installed in a downstream side with respect to the flight tube in a direction in which the charged substance flies; a first aperture electrode that is installed in a downstream side with respect to the deflector in a direction in which the charged substance flies; and a second aperture electrode that is installed in between the deflector and the first aperture electrode.

Abstract translation: 当具有使用偏转器的斩波器的飞行时间质量选择器选择离子的质量时，离子束被偏转。 结果，至少一部分离子束相对于轴线对角地穿过孔电极。 因此，存在用聚簇离子束照射的物体上的位置导致移动的问题。 该质量选择器包括：具有使带电物质在其中飞行的等电位空间的飞行管; 偏转器，其安装在相对于所述飞行管的下游侧，所述偏转器沿所述带电物质飞行的方向; 第一孔电极，其安装在相对于所述偏转器的下游侧，所述第一孔电极沿所述带电物质飞行的方向; 以及安装在偏转器和第一孔径电极之间的第二孔径电极。

公开(公告)号：US08497486B1

公开(公告)日：2013-07-30

申请号：US13651685

申请日：2012-10-15

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jeffrey Charles Blahnik ,  William T. Weaver

IPC: H01J49/10 ,  H01J37/317 ,  H01J27/02 ,  H01J3/07

CPC classification number: H01J27/024 ,  H01J27/08 ,  H01J37/08 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/043 ,  H01J2237/30472 ,  H01J2237/3171

Abstract: An ion source includes arc chamber housing defining an arc chamber. The arc chamber housing has an extraction plate in a fixed position, and the extraction plate defines a plurality of extraction apertures. The ion source also includes a shutter assembly positioned outside of the arc chamber proximate the extraction plate. The shutter assembly is configured to block at least a portion of one of the plurality of extraction apertures during one time interval. The ion source combined with relative movement of a workpiece to be treated with an ion beam extracted from the ion source enables a two dimensional ion implantation pattern to be formed on the workpiece using only one ion source.

Abstract translation: 离子源包括限定电弧室的电弧室壳体。 电弧室壳体具有固定位置的提取板，并且提取板限定多个提取孔。 离子源还包括位于靠近提取板的弧形室外部的快门组件。 快门组件构造成在一个时间间隔期间阻挡多个提取孔中的一个的至少一部分。 离子源与从离子源提取的离子束相关的待处理工件的相对移动结合使得仅使用一个离子源就能在工件上形成二维离子注入图案。

公开(公告)号：US07952073B2

公开(公告)日：2011-05-31

申请号：US12184995

申请日：2008-08-01

Applicant: Robert B. Bilhorn ,  Mark H. Ellisman

Inventor： Robert B. Bilhorn ,  Mark H. Ellisman

IPC: G21K7/00

CPC classification number: H01J37/244 ,  H01J37/26 ,  H01J2237/043 ,  H01J2237/15 ,  H01J2237/2441 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2447

Abstract: An apparatus for use with an electron beam for imaging a sample. The apparatus has a down-conversion detector configured to detect an electron microscopy signal generated by the electron beam incident on the sample, a direct bombardment detector adjacent to the down-conversion detector and configured to detect the electron microscopy signal, and a mechanism selectively exposing the down-conversion detector and the direct bombardment detector to the electron microscopy signal. A method using the apparatus is also provided.

Abstract translation: 一种用于电子束用于成像样品的装置。 该装置具有下变换检测器，其被配置为检测由入射在样品上的电子束产生的电子显微镜信号，与下变频检测器相邻的直接轰击检测器，并且被配置为检测电子显微镜信号，以及选择性地暴露 下转换检测器和直接轰击检测器到电子显微镜信号。 还提供了使用该装置的方法。

公开(公告)号：US07876113B2

公开(公告)日：2011-01-25

申请号：US12007911

申请日：2008-01-17

Applicant: Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

Inventor： Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

IPC: G01R31/305

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US20100237261A1

公开(公告)日：2010-09-23

申请号：US12714735

申请日：2010-03-01

Applicant: Tetsurou NISHIYAMA

Inventor： Tetsurou NISHIYAMA

IPC: H01J37/147 ,  H01J37/30

CPC classification number: H01J37/045 ,  H01J2237/043

Abstract: A blanking deflector 23 is of the coaxial type and includes a rod-like inner electrode 231 and a cylindrical outer electrode 232 enclosing the inner electrode 231 such that an air gap through which the charged particle beam B passes is formed between the inner and outer electrodes 231 and 232. The inner electrode 231 and the outer electrode 232 are formed by forming electrode films 231b and 232b of a metal over the surfaces of nonconducting base materials 231a and 232a, respectively, by vacuum deposition or sputtering. Further, each of the shaping deflector and the main deflector and sub-deflector for beam scanning includes a plurality of pairs of opposite electrodes, and each opposite electrode is formed by forming an electrode film of a metal over the surface of a nonconducting base material by vacuum deposition or sputtering.

Abstract translation: 消隐偏转器23是同轴型的，并且包括棒状内部电极231和包围内部电极231的圆柱形外部电极232，使得在内部和外部电极之间形成通过带电粒子束B的气隙 内电极231和外电极232分别通过真空沉积或溅射在不导电基材231a和232a的表面上形成金属的电极膜231b和232b而形成。 此外，成形偏转器和用于光束扫描的主偏转器和副偏转器中的每一个包括多对相对电极，并且每个相对电极通过在非导电基材的表面上形成金属的电极膜而形成， 真空沉积或溅射。

公开(公告)号：US07714289B2

公开(公告)日：2010-05-11

申请号：US12155347

申请日：2008-06-03

Applicant: Yuko Sasaki ,  Mitsugu Sato

Inventor： Yuko Sasaki ,  Mitsugu Sato

IPC: G01N23/00

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J2237/043 ,  H01J2237/049 ,  H01J2237/28

Abstract: When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.

Abstract translation: 当主要由提取电压V1和加速电压V0表示的电子枪的条件改变时，通过聚光透镜将带电粒子束一次聚焦在固定位置，并且从冷凝器的透镜激发计算虚拟阴极位置 透镜和电子枪的机械位置关系来设定光学条件。 为了更精确地设置光学条件，在聚光透镜的交叉位置处设置偏转电极装置，并且将电压以恒定周期施加到偏转电极装置，以便控制聚光透镜的透镜激发，使得 在诸如CRT的图像显示单元上图像的移动量​​最小化。

公开(公告)号：US20100102254A1

公开(公告)日：2010-04-29

申请号：US12532366

申请日：2007-03-22

Applicant: Masaki Kobayashi

Inventor： Masaki Kobayashi

IPC: G21K5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G11B7/00456 ,  G11B7/261 ,  H01J37/3045 ,  H01J2237/043 ,  H01J2237/24507 ,  H01J2237/3045 ,  H01J2237/30455

Abstract: A writing apparatus includes a beam current detector which detects abeam current of the electron beam during execution of the writing when the substrate is not irradiated; a fluctuation value calculator which calculates a fluctuation value of the electron beam based on the beam current; and a corrector which corrects the electron beam fluctuation during the writing based on the fluctuation value.

Abstract translation: 一种写入装置，包括：当基板未被照射时，在执行写入期间检测电子束的电流电流检测器; 波动值计算器，其根据束电流计算电子束的波动值; 以及校正器，其基于波动值校正写入期间的电子束波动。