公开(公告)号：WO2022258279A1

公开(公告)日：2022-12-15

申请号：PCT/EP2022/062579

申请日：2022-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： WIELAND, Marco, Jan-Jaco

IPC: H01J37/12

Abstract: Assessment systems and methods are disclosed. In one arrangement, an effect of electrode distortion in an objective lens array is compensated. An electrode distortion is adjusted by varying an electrostatic field in the objective lens array. The adjustment is such as to compensate for an effect of electrode distortion on sub-beams of a multi-beam impinging on a sample. A sub-beam is refocused in response to the variation in electrostatic field in the objective lens array. The adjusting and the refocusing comprises changing potentials applied to at least two electrodes of the objective lens array.

公开(公告)号：WO2022248129A1

公开(公告)日：2022-12-01

申请号：PCT/EP2022/060688

申请日：2022-04-22

Applicant: STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  NIPPON SHOKUBAI CO., LTD. ,  ASML NETHERLANDS B.V. ,  STICHTING VU

Inventor： BROUWER, Albert, Manfred ,  EVRARD, Quentin, Jack, Omer ,  GOYA, Tsuyoshi ,  SUGIOKA, Takuo

IPC: G03F7/004

Abstract: A resist composition for use in the fabrication of integrated circuits, the use of a resist composition, and a lithographic method utilising a resist composition, wherein the resist composition comprises an alkyltin-oxo cage having a counterion selected from tetrakis(pentafluorophenyl) borate, tetrakis[3,5-bis(trifluoromethyl)phenyl]borate, tetrakis[3,5-bis(tert-butyl)phenyl]borate, and tetrakis[(3,5-bis(l,l,l,3,3,3-hexafluoro-2-methoxypropan-2-yl)phenyl)phenyl]borate. A lithographic method comprising the steps of: a) providing a resist composition comprising an alkyltin-oxo cage having a counterion selected from the above borate groups; b) exposing the resist composition to a patterned radiation beam or an electron beam to form a pattern in the resist composition; and c) developing the resist to form a circuit pattern.

公开(公告)号：WO2022243006A1

公开(公告)日：2022-11-24

申请号：PCT/EP2022/061382

申请日：2022-04-28

Applicant: ASML NETHERLANDS B.V.

Inventor： URONE, Dustin, Michael ,  THERIAULT, Gregory ,  NGUYEN, Lam ,  MCKENZIE, Paul, Alexander

IPC: G03F7/20 ,  H05G2/00

Abstract: A metrology system includes: a light apparatus, a detection apparatus, and a control apparatus in communication with the detection apparatus. The light apparatus is configured to generate an optical probe propagating along a probe optical axis that intersects a target axial path at a probe region, the target axial path extending primarily along an X axis of an X, Y, Z coordinate system. The detection apparatus is configured to detect produced light at a plurality of distinct wavelengths, each wavelength associated with a distinct location along an X-transverse axis of the X, Y, Z coordinate system, the produced light being produced from an interaction in the probe region between the optical probe and a target traveling along the target axial path. The control apparatus is configured to analyze the detected light and determine position information relating to the target along the X-transverse axis of the X, Y, Z coordinate system.

公开(公告)号：WO2022233546A1

公开(公告)日：2022-11-10

申请号：PCT/EP2022/059781

申请日：2022-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： BATISTAKIS, Chrysostomos ,  PISARENCO, Maxim ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  RUTIGLIANI, Vito, Daniele ,  MIDDLEBROOKS, Scott, Anderson ,  VERSCHUREN, Coen, Adrianus ,  GEYPEN, Niels

IPC: G03F7/20 ,  G06N20/00

Abstract: A method of determining a stochastic metric, the method comprising: obtaining a trained model having been trained to correlate training optical metrology data to training stochastic metric data, wherein the training optical metrology data comprises a plurality of measurement signals relating to distributions of an intensity related parameter across a zero or higher order of diffraction of radiation scattered from a plurality of training structures, and the training stochastic metric data comprises stochastic metric values relating to said plurality of training structures, wherein the plurality of training structures have been formed with a variation in one or more dimensions on which said stochastic metric is dependent; obtaining optical metrology data comprising a distribution of the intensity related parameter across a zero or higher order of diffraction of radiation scattered from a structure; and using the trained model to infer a value of the stochastic metric from the optical metrology data.

公开(公告)号：WO2022233500A1

公开(公告)日：2022-11-10

申请号：PCT/EP2022/058246

申请日：2022-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： BOS, Koen, Martin, Willem, Jan ,  KLUGKIST, Joost, André ,  ANAND, Anirudh

IPC: G03F7/20 ,  G01J5/00 ,  G02B7/18

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：WO2022228820A1

公开(公告)日：2022-11-03

申请号：PCT/EP2022/058586

申请日：2022-03-31

Applicant: ASML NETHERLANDS B.V.

Inventor： SMORENBURG, Petrus, Wilhelmus ,  EDWARD, Stephen ,  DONDERS, Sjoerd, Nicolaas, Lambertus ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  O'DWYER, David ,  NIKIPELOV, Andrey ,  DE VRIES, Gosse, Charles

IPC: G02F1/35 ,  G03F7/20 ,  G02F1/21 ,  G02F1/365

Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.

公开(公告)号：WO2022223220A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057476

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE MEERENDONK, Remco ,  DIRECKS, Daniel, Jozef, Maria ,  NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  KLUGKIST, Joost, André ,  PEKELDER, Sven ,  VAN DER NET, Antonius, Johannus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  OUDES, Jaap ,  JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus ,  VAN LIPZIG, Jeroen, Peterus, Johannes ,  VAN SANTVOORT, Johannes, Franciscus, Martinus

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：WO2022214267A1

公开(公告)日：2022-10-13

申请号：PCT/EP2022/056091

申请日：2022-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： KARA, Dogacan ,  JENSEN, Erik ,  WILDENBERG, Jochem, Sebastiaan ,  DECKERS, David, Frans, Simon ,  GULER, Sila ,  ASTUDILLO RENGIFO, Reinaldo, Antonio ,  YUDHISTIRA, Yasri ,  HILHORST, Gijs ,  CAICEDO FERNANDEZ, David, Ricardo ,  SPIERING, Frans, Reinier ,  KHO, Sinatra, Canggih ,  BLOM, Herman, Martin ,  KIM, Sang Uk ,  KIM, Hyun-Su

IPC: G03F7/20 ,  G03F9/00

Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method comprises obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for said first measurement dataset and said second measurement dataset until at least one stopping criterion is met so as to determine said substrate model, said steps comprising: 1. selecting a candidate basis function from said candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on at least one of said first measurement dataset and said second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on 10 the evaluation.

公开(公告)号：WO2022207265A1

公开(公告)日：2022-10-06

申请号：PCT/EP2022/056087

申请日：2022-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： STEENBRINK, Stijn, Wilem, Herman, Karel

IPC: H01J37/02

Abstract: Electron-optical systems comprising a particle trap and methods of operating electron-optical systems using a particle trap are disclosed. In one arrangement, a stage supports a sample. An objective lens arrangement projects electrons towards the sample along an electron-beam path. A particle trap comprises an electrode assembly radially outside of the objective lens arrangement and facing the sample. The electrode assembly draws a particle away from a surface of the sample and/or stage as the sample moves relative to the electron-beam path.

公开(公告)号：WO2022207222A1

公开(公告)日：2022-10-06

申请号：PCT/EP2022/055351

申请日：2022-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  LA FONTAINE, Bruno

IPC: H01J37/26

Abstract: An improved method of performing a self-diagnosis of a charged particle inspection system is disclosed. An improved method comprises triggering a self-diagnosis based on output data of the charged particle inspection system; in response to the triggering of the self-diagnosis, receiving diagnostic data of a sub-system of the charged particle inspection system; identifying an issue associated with the output data based on the diagnostic data of the sub-system; and generating a control signal to adjust an operation parameter of the sub-system according to the identified issue.