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    Converter of orbital momentum into spin momentum for the polarization of particle beams
    186.
    发明公开
    Converter of orbital momentum into spin momentum for the polarization of particle beams 审中-公开
    轨道角动量旋转转换器，用于粒子的偏振

    公开(公告)号：EP2605266A3

    公开(公告)日：2015-12-30

    申请号：EP12197283.0

    申请日：2012-12-14

    Applicant: Consiglio Nazionale delle Ricerche

    Inventor： Grillo, Vincenzo ,  Marrucci, Lorenzo ,  Karimi, Ebrahim ,  Santamato, Enrico

    IPC: H01J37/06 ,  H01J3/02

    CPC classification number: H01J37/26 ,  G21K1/16 ,  H01J3/02 ,  H01J37/06 ,  H01J2203/0296 ,  H01J2237/06383

    Abstract: Apparatus for spin polarizing a particle beam, which is adapted to process an input particle beam (Bi) in such a way as to generate an at least partially spin polarized output particle beam (Bo), and comprises:
    - a vortex beam generator (1) for imparting orbital angular momentum to the input particle beam;
    - an electromagnetic field generator (5) for generating a transverse magnetic field, space-variant and symmetric with respect to the (z) axis of the input particle beam, in such a way as to change the spin of the particles and attach thereto a plurality of different values of orbital angular momentum in dependence on their input spin values; and
    - a beam component separating group (7, 9) for spatially separating the particles in dependence on their orbital angular momentum values, in such a way as to obtain the at least partially spin polarized output particle beam.

    CHARGED PARTICLE VORTEX WAVE GENERATION
    187.
    发明公开
    CHARGED PARTICLE VORTEX WAVE GENERATION 有权
    带电粒子涡旋波产生

    公开(公告)号：EP2795656A1

    公开(公告)日：2014-10-29

    申请号：EP12813340.2

    申请日：2012-12-19

    Applicant: Universiteit Antwerpen

    Inventor： VERBEECK, Johan ,  VAN TENDELOO, Gustaaf

    IPC: H01J37/26

    CPC classification number: H01J37/04 ,  H01J3/02 ,  H01J3/021 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256 ,  H01J37/261 ,  H01J2237/06383 ,  H01J2237/2614

    Abstract: A device (100) for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis (104) in a charged particle beam generating apparatus is described. The device comprises a support element (106) having a target region (108) adapted for transmitting a charged particle wave propagating along a beam axis (104) and an induction means (112) for inducing a magnetic flux along an elongated profile having a free end portion located in said target region (108) and the induction means (112) is adapted for providing a magnetic flux in said elongated profile in order to induce an angular gradient, relative to the beam axis (104), of the phase of the charged particle wave when transmitted through said target region (108). A corresponding method is also disclosed, as well as the use thereof in electron microscopy.

    Abstract translation: 描述了一种用于向在带电粒子束产生装置中沿射束轴线（104）传播的带电粒子波施加轨道角动量的装置（100）。 该装置包括支撑元件（106），该支撑元件具有适于传输沿着射束轴线（104）传播的带电粒子波的目标区域（108）和用于沿具有自由空间的细长轮廓感应磁通量的感应装置（112） 以及位于所述目标区域（108）中的所述端部，并且所述感应装置（112）适于在所述细长轮廓中提供磁通量，以便相对于所述束轴线（104）感生所述相位 当透射通过所述目标区域（108）时带电粒子波。 还公开了相应的方法，以及其在电子显微镜中的用途。

    OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY
    188.
    发明公开
    OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY 审中-公开
    臭氧和等离子体产生用电子技术

    公开(公告)号：EP2614520A1

    公开(公告)日：2013-07-17

    申请号：EP11847948.4

    申请日：2011-12-16

    Applicant: Hitachi Zosen Corporation

    Inventor： BAKHTARI, Kaveh

    IPC: H01L21/306

    CPC classification number: B01J19/085 ,  C01B13/10 ,  H01J3/02 ,  H01J33/00 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/32816

    Abstract: This invention proposes, among other things, systems and methods for providing ozone generators or plasma generators that generate an electric field in an electron generation chamber that is separate from a reaction chamber. An electron beam emitter in an electron generation chamber is configured to emit a beam of electrons and is separated from the reaction chamber by an electron permeable barrier that provides a window through which the beam of electrons passes. The electrons are accelerated to the required energy in the electron generation chamber and transmitted through the barrier to the reaction chamber, where an input gas source introduces an input gas into the reaction chamber. The input gas may react with the beam of electrons inside the reaction chamber to form an output gas comprising a plasma or a concentration of ozone, and the output gas passes from the reaction chamber to a wafer processing chamber.

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