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    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES
    12.
    发明申请
    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
    执行机构，光学装置，光刻设备和制造装置的方法

    公开(公告)号：WO2014060169A1

    公开(公告)日：2014-04-24

    申请号：PCT/EP2013/069299

    申请日：2013-09-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BUIS, Edwin ,  DE VRIES, Gosse ,  HOL, Sven ,  REKKERS, Erik

    IPC: G03F7/20

    CPC classification number: G03F7/70833 ,  G02B5/0891 ,  G02B7/1828 ,  G02B19/0023 ,  G02B26/0816 ,  G03F7/70116 ,  G03F7/7015 ,  G03F7/70825 ,  H01F7/0205 ,  H02K11/40 ,  H02K16/00 ,  H02K41/0352 ,  H02K41/0356 ,  H02K49/10

    Abstract: An EUV optical apparatus includes a number of adjustable mirrors (22x) on mirror bodies (120). Each mirror body is supported on an actuator (l00x) comprising a moving part (132, 134, 136) and a fixed casing part (128, 130). The actuator provides a resilient support (140, 142) for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (166, 170-178) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling (102, 104a, 104b) is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.

    Abstract translation: EUV光学装置包括在镜体（120）上的多个可调镜（22x）。 每个镜体支撑在包括移动部件（132,134,136）和固定壳体部件（128,130）的致动器（100x）上。 致动器提供用于镜体的弹性支撑件（140,142），使得其相对于壳体可倾斜两度。 电磁马达（166,170-178）在施加的动力的作用下施加第一部分，所述弹性安装件设置成提供抵抗所述动力的偏置力。 磁性联轴器（102,104a，104b）设置在运动部件和固定部件之间，以提供反作用力。 反作用力部分地与所述偏压力相反，从而减小了实现给定位移所需的动力。 致动器因此可以减小尺寸，重量和散热。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD
    13.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
    照明系统，光刻设备和照明方法

    公开(公告)号：WO2011080019A1

    公开(公告)日：2011-07-07

    申请号：PCT/EP2010/068395

    申请日：2010-11-29

    Applicant: ASML NETHERLANDS B.V. ,  DE BOEIJ, Wilhelmus ,  LOOPSTRA, Erik ,  MICKAN, Uwe ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

    Inventor： DE BOEIJ, Wilhelmus ,  LOOPSTRA, Erik ,  MICKAN, Uwe ,  VAN SCHOOT, Jan ,  DE VRIES, Gosse

    IPC: G03F7/20 ,  G02B5/09

    CPC classification number: G03F7/70116 ,  G03F7/70075

    Abstract: An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

    Abstract translation: 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

    OPTICAL APPARATUS, AND METHOD OF ORIENTING A REFLECTIVE ELEMENT
    14.
    发明申请
    OPTICAL APPARATUS, AND METHOD OF ORIENTING A REFLECTIVE ELEMENT 审中-公开
    光学装置和面向反射元件的方法

    公开(公告)号：WO2011023423A1

    公开(公告)日：2011-03-03

    申请号：PCT/EP2010/054687

    申请日：2010-04-09

    Applicant: ASML NETHERLANDS B.V. ,  BUIS, Edwin ,  DE VRIES, Gosse ,  BOON, Fidelus

    Inventor： BUIS, Edwin ,  DE VRIES, Gosse ,  BOON, Fidelus

    IPC: G03F7/20

    CPC classification number: G03F7/70116 ,  G02B7/1821

    Abstract: An optical apparatus having a moveable reflective element (110) and associated actuator (109) is disclosed. The actuator comprises a first magnet (113) which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable ref lectiveelement to move, and a second magnet (114) which is connected to a motor (116) such that operation of the motor will cause the second magnet to move, wherein the second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.

    Abstract translation: 公开了一种具有可移动反射元件（110）和相关致动器（109）的光学设备。 所述致动器包括连接到所述可移动反射元件的第一磁体（113），使得所述第一磁体的移动将导致所述可移动的取出元件移动;以及第二磁体（114），其连接到所述电动机（116） 电动机的操作将导致第二磁体移动，其中第二磁体相对于第一磁体定位，使得移动第二磁体将导致第一磁体移动。

    ACTUATOR SYSTEM, LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE POSITION OF A COMPONENT AND DEVICE MANUFACTURING METHOD
    15.
    发明申请
    ACTUATOR SYSTEM, LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE POSITION OF A COMPONENT AND DEVICE MANUFACTURING METHOD 审中-公开
    执行器系统，平面设备，控制部件位置的方法和装置制造方法

    公开(公告)号：WO2010066515A1

    公开(公告)日：2010-06-17

    申请号：PCT/EP2009/064605

    申请日：2009-11-04

    Applicant: ASML NETHERLANDS B.V. ,  DE VRIES, Gosse ,  BUIS, Edwin ,  MICKAN, Uwe

    Inventor： DE VRIES, Gosse ,  BUIS, Edwin ,  MICKAN, Uwe

    IPC: G03F7/20 ,  F03G7/06

    CPC classification number: G03F7/70825 ,  G03F7/70141

    Abstract: An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system includes first and second actuating elements, each comprising two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements are configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system further includes at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

    Abstract translation: 提供致动器系统，其构造成相对于致动器系统的基座移动部件。 致动器系统包括第一和第二致动元件，每个致动元件包括彼此连接并具有不同热膨胀系数的两部分材料。 两个致动元件被构造成使得如果一个温度升高，则如果其温度升高，则其在与另一个致动元件施加的力相反的方向上对部件施加力。 致动器系统还包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES
    17.
    发明公开
    ACTUATION MECHANISM, OPTICAL APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
    控制机制的光学设备，光刻设备和方法的设备生产

    公开(公告)号：EP2906994A1

    公开(公告)日：2015-08-19

    申请号：EP13770854.1

    申请日：2013-09-17

    Applicant: ASML Netherlands B.V.

    Inventor： VAN SCHOOT, Jan ,  HOL, Sven ,  BUIS, Edwin ,  REKKERS, Erik ,  DE VRIES, Gosse ,  BOTMA, Hako ,  VAN DAM, Marinus ,  VAN GORKOM, Ramon

    IPC: G03F7/20 ,  G02B7/182 ,  G02B26/08

    Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

    Abstract translation: 的致动器以替换，对于实施例的反射镜，通过在两个电磁体不同的电流提供具有至少两个自由度的运动。 移动部分包括具有约束移动超过在第一基本上位于同一平面的工作区域的磁面的永久磁铁在垂直于磁体的磁化方向。 电磁铁具有极面在第二平面中基本上位于密切平行于所述第一平面中，每个极面基本上填充通过移动磁铁的面横穿的区域的一个象限。 光学位置传感器可以通过电磁体之间的中央空间直接在移动磁体的辐射束。 在光瞳反射镜装置刻面的尺寸可以在中央区域制成在外围区域中较小，但较大的，从而缓和聚焦的要求。

    LITHOGRAPHIC APPARATUS AND METHOD
    18.
    发明公开
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    平版印刷设备和方法

    公开(公告)号：EP2443514A1

    公开(公告)日：2012-04-25

    申请号：EP10722114.5

    申请日：2010-06-07

    Applicant: ASML Netherlands B.V.

    Inventor： VAN SCHOOT, Jan ,  DE VRIES, Gosse

    IPC: G03F7/20

    CPC classification number: G03F7/702 ,  G03F7/70075 ,  G03F7/70116

    Abstract: An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes, is described. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented such that they can direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.

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