公开(公告)号：SG139663A1

公开(公告)日：2008-02-29

申请号：SG2007052012

申请日：2007-07-12

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN ,  SIMONS WILHELMUS FRANCISCUS JO

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A control system to control a position parameter of a stage in a lithographic apparatus includes a stage controller to control a position parameter of the stage in at least a first direction. The control system includes a disturbance torque estimator to estimate a disturbance torque on the stage, the disturbance torque about an axis extending in a second direction, the second direction being substantially perpendicular to the first direction. The control system includes a correction signal calculator, the correction signal calculator provided with the estimated disturbance torque and a signal representative of a position of the stage in a third direction, the third direction being substantially perpendicular to the first and second directions. The correction signal calculator determines a feed forward correction signal to correct a position error of the stage in the first direction due to the disturbance torque, the feed forward correction signal to be fed to the stage.

公开(公告)号：SG136117A1

公开(公告)日：2007-10-29

申请号：SG2007025513

申请日：2007-04-05

Applicant: ASML NETHERLANDS BV

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  LEENDERS MARTINUS HENDRIKUS AN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN