公开(公告)号：WO0047961A9

公开(公告)日：2001-10-25

申请号：PCT/US0003290

申请日：2000-02-09

Applicant: KLA TENCOR CORP

Inventor： LEE SHING ,  WANG HAIMING ,  NORTON ADAM ,  NIKOONAHAD MEHRDAD

IPC: G01B11/06 ,  G01J3/447 ,  G01J4/02 ,  G01J4/04 ,  G01N21/21 ,  G01N21/41 ,  G01J4/00

CPC classification number: G01J4/02 ,  G01J3/447 ,  G01N21/21

Abstract: A polarized sample beam (12) of broadband radiation is focused onto the surface of a sample (3) and the radiation modified by the sample is collected by means of a mirror system (16) in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures (30) to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thickness and refractive indices of thin films.

Abstract translation: 将宽带辐射的偏振样品束（12）聚焦到样品（3）的表面上，并且通过不同入射平面的反射镜系统（16）收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 优选地，样品光束的偏振仅由聚焦和样品改变，并且相对于固定的偏振平面进行分析。 在优选实施例中，采用两个不同的孔（30）来重复样品束的聚焦和修改的辐射的收集，以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中，上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

公开(公告)号：DE69922491D1

公开(公告)日：2005-01-13

申请号：DE69922491

申请日：1999-02-08

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  WANG HAIMING

IPC: G01B21/08 ,  G01B17/02 ,  G01N29/00 ,  G01N29/24 ,  G01N29/34

Abstract: Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

公开(公告)号：AU2591799A

公开(公告)日：1999-09-15

申请号：AU2591799

申请日：1999-02-08

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  WANG HAIMING

IPC: G01B21/08 ,  G01B17/02 ,  G01N29/00 ,  G01N29/24 ,  G01N29/34

Abstract: Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

公开(公告)号：AU6955798A

公开(公告)日：1998-10-30

申请号：AU6955798

申请日：1998-04-08

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  WAYMAN CHARLES E

IPC: G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

Abstract: An optical surface inspection system is designed to correct for misregistration errors. A reference vector of data samples is obtained by computing an average of adjacent data sample vectors. A comparison of the data samples in a current vector being processed to data samples that may be offset from such current vector along the direction of the current vector enables the detection and correction of misregistration errors. Alternatively, a target array of data samples is compared to a reference array of data samples collected from a different portion of the surface with various offsets for detection and correction of misregistration errors. The intensity of the reflection from the inspection beam may be monitored to vary the intensity of the inspection beam so as to reduce the dynamic range of background scattering.

公开(公告)号：WO0146684A9

公开(公告)日：2002-05-23

申请号：PCT/US0035358

申请日：2000-12-22

Applicant: KLA TENCOR CORP ,  LEHMAN KURT R ,  LEE SHING M ,  JOHNSON WALT ,  FIELDEN JOHN ,  ZHAO GUOHENG ,  NIKOONAHAD MEHRDAD

Inventor： LEHMAN KURT R ,  LEE SHING M ,  JOHNSON WALT ,  FIELDEN JOHN ,  ZHAO GUOHENG ,  NIKOONAHAD MEHRDAD

IPC: G01B7/06 ,  B24B37/013 ,  B24B49/10 ,  G01B7/00 ,  G01B11/06 ,  G01N27/72

CPC classification number: B24B37/013 ,  B24B49/105 ,  G01N27/72

Abstract: Disclosed is a method of obtaining information in-situ regarding a film of a sample using an eddy probe during a process for removing the film. The eddy probe has at least one sensing coil. An AC voltage is applied to the sensing coil(s) of the eddy probe. One or more first signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate the film of the sample. One or more second signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate to a reference material having a fixed composition and/or distance from the sensing coil. The first signals are calibrated based on the second signals so that undesired gain and/or phase changes within the first signals are corrected. A property value of the film is determined based on the calibrated first signals. An apparatus for performing the above described method is also disclosed. Additionally, a chemical mechanical polishing (CMP) system for polishing a sample with a polishing agent and monitoring the sample is disclosed. The CMP system includes a polishing table, a sample carrier arranged to hold the sample over the polishing table, and an eddy probe.

Abstract translation: 公开了一种在除去膜的过程中使用涡流探针在原位获取样品的膜的方法。 涡流探头具有至少一个感测线圈。 交流电压被施加到涡流探头的感测线圈上。 当感测线圈靠近样品的膜定位时，在涡流探针的感测线圈中测量一个或多个第一信号。 当感测线圈靠近具有与感测线圈的固定成分和/或距离的参考材料定位时，在涡流探针的感测线圈中测量一个或多个第二信号。 第一信号基于第二信号进行校准，从而校正第一信号内的不期望的增益和/或相位变化。 基于校准的第一信号确定胶片的属性值。 还公开了一种用于执行上述方法的装置。 此外，公开了一种用抛光剂抛光样品并监测样品的化学机械抛光（CMP）系统。 CMP系统包括抛光台，布置成将样品保持在抛光台上的样品载体和涡流探针。

公开(公告)号：WO0065331A2

公开(公告)日：2000-11-02

申请号：PCT/US0010875

申请日：2000-04-21

Applicant: KLA TENCOR CORP

Inventor： WANG HAIMING ,  MAXTON PATRICK M ,  JOHNSON KENNETH C ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01B11/06 ,  G01B11/26 ,  G01J3/02 ,  G01J3/447 ,  G01J4/04 ,  G01N21/21 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. Radiation so modulated and modified by the sample is detected and up to 25 harmonics may be derived from the detected signal. The up to 25 harmonics may be used to derive ellipsometric and system parameters, such as parameters related to the angles of fixed polarizing elements, circular deattenuation, depolarization of the polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测由样本调制和修改的辐射，并且可以从检测到的信号导出多达25个谐波。 可以使用多达25个谐波来导出椭偏和系统参数，例如与固定偏振元件的角度相关的参数，圆形去衰减，偏振元件的去极化和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其他椭偏仪组合，以提高测量精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

公开(公告)号：WO0065331A9

公开(公告)日：2002-06-13

申请号：PCT/US0010875

申请日：2000-04-21

Applicant: KLA TENCOR CORP

Inventor： WANG HAIMING ,  MAXTON PATRICK M ,  JOHNSON KENNETH C ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01B11/06 ,  G01B11/26 ,  G01J3/02 ,  G01J3/447 ,  G01J4/04 ,  G01N21/21 ,  G01N21/27 ,  G01N21/41

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: Two phase modulators or polarizing elements are employed to modulate the polarization of an interrogating radiation beam before and after the beam has been modified by a sample to be measured. The detected signal may be used to derive ellipsometric and system parameters, such as parameters related to the angle of fixed polarizing elements and retardances of phase modulators. A portion of the radiation may be diverted for detecting sample tilt or a change in sample height. A cylindrical objective may be used for focusing the beam onto the sample to illuminate a circular spot on the sample. The above-described self-calibrating ellipsometer may be combined with another optical measurement instrument such as a polarimeter, a spectroreflectometer or another ellipsometer to improve the accuracy of measurement and/or to provide calibration standards for the optical measurement instrument. The self-calibrating ellipsometer as well as the combined system may be used for measuring sample characteristics such as film thickness and depolarization of radiation caused by the sample.

Abstract translation: 采用两相调制器或偏振元件来调制光束已被待测样品修改之前和之后的询问辐射束的极化。 检测到的信号可用于导出椭偏和系统参数，例如与固定的偏振元件的角度相关的参数和相位调制器的延迟。 可以转移一部分辐射以检测样品倾斜或样品高度的变化。 可以使用圆柱形物镜将光束聚焦到样品上以照亮样品上的圆形斑点。 上述自校准椭偏仪可以与另一种光学测量仪器如偏振计，分光光度计或其它椭偏仪组合，以提高测量的精度和/或为光学测量仪器提供校准标准。 自校准椭偏仪以及组合系统可用于测量由样品产生的辐射的膜厚度和去极化的样品特性。

公开(公告)号：WO03054475A2

公开(公告)日：2003-07-03

申请号：PCT/US0241151

申请日：2002-12-19

Applicant: KLA TENCOR CORP

Inventor： SHCHEGROV ANDREI V ,  FABRIKANT ANATOLY ,  NIKOONAHAD MEHRDAD ,  LEVY ADY ,  WACK DANIEL C ,  BAREKET NOAH ,  MIEHER WALTER ,  DZIURA TED

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  G01B11/06 ,  G01B11/24 ,  G01B11/30 ,  H01L21/66

CPC classification number: G03F7/70616 ,  G01N21/211 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70641

Abstract: A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and the best set of initial parameter values as the starting point of an optimization process whereby data associated with parameter values of the profile predicted by a model is compared to measured data in order to arrive at values of the parameters. Film layers over or under the periodic structure may also be taken into account. Different radiation parameters such as the reflectivities Rs, Rp and ellipsometric parameters may be used in measuring the diffracting structures and the associated films. Some of the radiation parameters may be more sensitive to a change in the parameter value of the profile or of the films then other radiation parameters. One or more radiation parameters that are more sensitive to such changes may be selected in the above-described optimization process to arrive at a more accurate measurement. The above-described techniques may be supplied to a track/stepper and etcher to control the lithographic and etching processes in order to compensate for any errors in the profile parameters.

Abstract translation: 构建种子轮廓的画廊，并且使用半导体器件的制造工艺知识来选择与轮廓相关联的初始参数值。 也可以使用制造过程知识来选择最佳种子轮廓和最佳初始参数值集合作为优化过程的起始点，由此将与模型预测的轮廓的参数值相关联的数据与测量数据进行比较，以便 达到参数的值。 也可以考虑在周期性结构之上或之下的膜层。 可以使用诸如反射率Rs，Rp和椭偏参数的不同辐射参数来测量衍射结构和相关膜。 一些辐射参数可能对轮廓或膜的参数值的变化对其他辐射参数更敏感。 可以在上述优化过程中选择对这种变化更敏感的一个或多个辐射参数，以获得更准确的测量。 可以将上述技术提供给轨道/步进器和蚀刻器以控制光刻和蚀刻工艺，以便补偿轮廓参数中的任何误差。

公开(公告)号：WO0250509A3

公开(公告)日：2002-12-12

申请号：PCT/US0149259

申请日：2001-12-18

Applicant: KLA TENCOR CORP

Inventor： ZHAO GUOHENG ,  GROSS KENNETH P ,  SMEDT RODNEY ,  NIKOONAHAD MEHRDAD

IPC: G01B11/00 ,  G01J4/00

CPC classification number: G01N21/21 ,  G01B11/00 ,  G01N21/4788 ,  G01N21/956

Abstract: A periodic structure (32) is illuminated by polychromatic electromagnetic radiation (20). Radiation from the structure is collected and divided into two rays having different polarization states. The two rays (46, 48) are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam.

Abstract translation: 周期性结构（32）被多色电磁辐射（20）照射。 收集来自结构的辐射并将其分成具有不同偏振状态的两条光线。 检测两条射线（46,48），从中可以导出周期性结构的一个或多个参数。 在另一个实施例中，当周期性结构被多色电磁辐射照射时，来自该结构的收集的辐射穿过具有偏振面的偏振元件。 元件和多色光束受到控制，使得元件的偏振面相对于多色光束的入射面处于两个或更多个不同的取向。

公开(公告)号：WO0120304A3

公开(公告)日：2001-10-04

申请号：PCT/US0024888

申请日：2000-09-11

Applicant: KLA TENCOR CORP

Inventor： NIKOONAHAD MEHRDAD ,  LEE SHING ,  KELE KALMAN ,  ZHAO GUOHENG ,  LEHMAN KURT R

IPC: B24B37/005 ,  B24B49/12 ,  B24D7/12 ,  G01B11/00 ,  G01B11/06 ,  G01N1/32 ,  G01N1/34 ,  G01N21/00 ,  G01N21/15 ,  G01N21/21 ,  G01N21/45 ,  G01N21/47 ,  H01L21/304 ,  B24B37/04

CPC classification number: G01N21/15 ,  B24B37/005 ,  B24B49/12 ,  B24D7/12 ,  G01B11/00 ,  G01B11/0683

Abstract: Disclosed is a self-clearing objective (100) for directing a beam towards a sample and clearing away debris from an optical viewing path adjacent to the sample. The self-clearing objective includes an optical element (106, 210, 310, 408, 510) and a substantially transparent fluid (104, 213, 326, 512) flowing between the optical element and the sample such that at least a portion adjacent to the sample is substantially cleared of debris. The optical element and the fluid cooperatively direct the beam towards the sample. This self-clearing objective may be coupled with various measurement devices to measure various characteristics of samples having debris that prevents clear optical measurements. Additionally, the measurement device may be integrated with or coupled to various sample processing systems so that the relevant process may be clearly monitored.

Abstract translation: 公开了一种用于将光束引向样品并从邻近样品的光学观察路径清除碎屑的自清除目标（100）。 自清理物镜包括在光学元件和样品之间流动的光学元件（106,210,310,408,510）和基本上透明的流体（104,213,326,512），使得至少一部分邻近 样品基本上清除了碎片。 光学元件和流体协调地将光束引向样品。 这种自清除物镜可以与各种测量装置耦合，以测量具有防止清晰光学测量的碎片的样品的各种特性。 此外，测量装置可以与各种样品处理系统集成或耦合到可以清楚地监测相关过程。