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    Apparatus and system for cleaning substrate
    11.
    发明专利
    Apparatus and system for cleaning substrate 审中-公开
    用于清洁基板的装置和系统

    公开(公告)号：JP2007208247A

    公开(公告)日：2007-08-16

    申请号：JP2006353540

    申请日：2006-12-28

    Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

    Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

    IPC: H01L21/304

    CPC classification number: H01L21/67051 ,  B08B3/003 ,  B08B3/02

    Abstract: PROBLEM TO BE SOLVED: To provide a cleaning apparatus and a method thereof which can remove particulate contamination substance of a sufficiently small size, even if the substance has a shape of a high aspect ratio.
    SOLUTION: The apparatus for cleaning a substrate 116 is disclosed. The apparatus is provided with a first head unit 110 and a second head unit 112. The first head unit 110 is arranged proximate to the surface of the substrate and is provided with a first row of channels configured to supply a foam to the surface of the substrate. The second head unit 112 is arranged substantially adjacent to the first head unit and proximate to the surface of the substrate. The second head unit is provided with a second and a third row of channels. The second row of channels 112 is configured to supply a fluid to the surface of the substrate. The third row of channels 114 is configured to cause a vacuum to work on the surface of the substrate.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：即使该物质具有高纵横比的形状，也可提供能够去除足够小尺寸的微粒污染物质的清洁装置及其方法。 解决方案：公开了一种用于清洁衬底116的设备。 该设备设置有第一头单元110和第二头单元112.第一头单元110布置成靠近基底的表面，并且设置有第一排通道，其构造成将泡沫供应到 基质。 第二头单元112被布置成基本上与第一头单元相邻并且靠近衬底的表面。 第二头单元设置有第二和第三排通道。 第二排通道112构造成将流体供应到基板的表面。 第三排通道114构造成使真空在基板的表面上起作用。 版权所有（C）2007，JPO＆INPIT

    METHOD AND SYSTEM FOR USING A TWO-PHASES SUBSTRATE CLEANING COMPOUND
    14.
    发明专利
    METHOD AND SYSTEM FOR USING A TWO-PHASES SUBSTRATE CLEANING COMPOUND 未知

    公开(公告)号：MY143763A

    公开(公告)日：2011-07-15

    申请号：MYPI20082382

    申请日：2006-12-19

    Applicant: LAM RES CORP

    Inventor： MIKHAIL KOROLIK ,  FREER ERIK M ,  DE LARIOS JOHN M ,  KATRINA MIKHAYLICHENKO ,  MIKE RAVKIN ,  FRED REDEKER

    IPC: B08B7/00

    Abstract: 1 8 METHOD AND SYSTEM FOR USING A TWO-PHASES SUBSTRATE CLEANING COMPOUND ABSTRACT OF THE DISCLOSURE 1511 CLEANING COMPOUNDS, APPARATUS, AND METHODS TO REMOVE CONTAMINANTS FROM A 5 SUBSTRATE SURFACE ARE PROVIDED. AN EXEMPLARY CLEANING COMPOUND TO REMOVE PARTICULATE CONTAMINANTS FROM A SEMICONDUCTOR SUBSTRATE SURFACE IS PROVIDED. THE CLEANING COMPOUND INCLUDES A VISCOUS LIQUID WITH A VISCOSITY BETWEEN ABOUT I CP TO ABOUT 10,000 O. THE CLEANING COMPOUND ALSO INCLUDES A PLURALITY OF SOLID COMPONENTS DISPERSED IN THE VISCOUS LIQUID, THE PLURALITY OF SOLID COMPONENTS INTERACT WITH THE PARTICULATE CONTAMINANTS ON THE SUBSTRATE SURFACE TO REMOVE THE PARTICULATE CONTAMINANTS FROM THE SUBSTRATE SURFACE,

    SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS
    15.
    发明专利
    SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS 未知

    公开(公告)号：SG169975A1

    公开(公告)日：2011-04-29

    申请号：SG2010097285

    申请日：2006-12-18

    Applicant: LAM RES CORP

    Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  MIKHAYLICHENKO KATRINA ,  REDEKER FRITZ C

    Abstract: A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.

    PROXIMITY HEAD WITH ANGLED VACUUM CONDUIT SYSTEM, APPARATUS AND METHOD
    17.
    发明专利
    PROXIMITY HEAD WITH ANGLED VACUUM CONDUIT SYSTEM, APPARATUS AND METHOD 未知

    公开(公告)号：SG176462A1

    公开(公告)日：2011-12-29

    申请号：SG2011081833

    申请日：2008-02-22

    Applicant: LAM RES CORP

    Inventor： RAVKIN MICHAEL ,  DE LARIOS JOHN M ,  REDEKER FRED C ,  KOROLIK MIKHAIL ,  FREER ERIK M

    Abstract: A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first discrete holes residing in the head surface and extending through the first flat region. The head surface also including a second flat region and a plurality of second conduits. The plurality of second conduits being defined by a corresponding plurality of second discrete holes that reside in the head surface and extend through the second flat region. The head surface also including a third flat region disposed between and adjacent to the first flat region and the second flat region and a plurality of third conduits. The plurality of third conduits being defined by a corresponding plurality of third discrete holes that reside in the head surface and extend through the third flat region. The third conduits being formed at a first angle relative to the third flat region. The first angle being between 30 and 60 degrees. A system and method for processing a substrate with a proximity head is also described.(Fig. 2A)

    METHOD FOR REMOVING CONTAMINATION FROM A SUBSTRATE AND FOR MAKING A CLEANING SOLUTION
    18.
    发明专利
    METHOD FOR REMOVING CONTAMINATION FROM A SUBSTRATE AND FOR MAKING A CLEANING SOLUTION 未知

    公开(公告)号：MY150857A

    公开(公告)日：2014-03-14

    申请号：MYPI20064607

    申请日：2006-11-30

    Applicant: LAM RES CORP

    Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLINCHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C

    IPC: C11D11/00

    Abstract: A METHOD IS PROVIDED FOR REMOVING CONTAMINATION FROM A SUBSTRATE. THE METHOD INCLUDES APPLYING A CLEANING SOLUTION HAVING A DISPERSED PHASE, A CONTINUOUS PHASE AND PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE TO A SURFACE OF THE SUBSTRATE. THE METHOD INCLUDES FORCING ONE OF THE PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE PROXIMATE TO ONE OF THE SURFACE CONTAMINANTS. THE FORCING IS SUFFICIENT TO OVERCOME ANY REPULSIVE FORCES BETWEEN THE PARTICLES AND THE SURFACE CONTAMINANTS SO THAT THE ONE OF THE PARTICLES AND THE ONE OF THE SURFACE CONTAMINANTS ARE ENGAGED. THE METHOD ALSO INCLUDES REMOVING THE ENGAGED PARTICLE AND SURFACE CONTAMINANT FROM THE SURFACE OF THE SUBSTRATE. A PROCESS TO MANUFACTURE THE CLEANING MATERIAL IS ALSO PROVIDED.

    SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS
    19.
    发明专利
    SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS 未知

    公开(公告)号：MY149848A

    公开(公告)日：2013-10-31

    申请号：MYPI20082419

    申请日：2006-12-18

    Applicant: LAM RES CORP

    Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  KATRINA MIKHAYLICHENKO

    IPC: B08B3/00

    Abstract: A METHOD FOR MAKING A SOLUTION FOR USE IN PREPARING A SURFACE OF A SUBSTRATE IS PROVIDED. THE METHOD INCLUDES PROVIDING (602) A CONTINUOUS MEDIUM THAT ADDS (604) A POLYMER MATERIAL TO THE CONTINUOUS MEDIUM. A FATTY ACID IS ADDED TO THE CONTINUOUS MEDIUM HAVING THE POLYMER MATERIAL, AND THE POLYMER MATERIAL DEFINES A PHYSICAL NETWORK THAT EXERTS FORCES IN THE SOLUTION THAT OVERCOME BUOYANCY FORCES EXPERIENCED BY THE FATTY ACID, THUS PREVENTING THE FATTY ACIDS FROM MOVING WITHIN THE SOLUTION UNTIL A YIELD STRESS OF THE POLYMER MATERIAL IS EXCEED BY AN APPLIED AGITATION. THE APPLIED AGITATION IS FROM TRANSPORTING THE SOLUTION FROM A CONTAINER TO A PREPARATION STATION THAT APPLIES THE SOLUTION TO THE SURFACE OF THE SUBSTRATE.

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