公开(公告)号：JP2013042172A

公开(公告)日：2013-02-28

申请号：JP2012242490

申请日：2012-11-02

Applicant: Lam Res Corp ,  ラム リサーチ コーポレイション

Inventor： ERIK M FREER ,  REDEKER FRED C ,  KATRINA MIKHAYLICHENKO ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  JOHN M DE LARIOS

IPC: H01L21/304

CPC classification number: H01L21/67092 ,  B08B3/00 ,  B08B7/00 ,  B08B7/02 ,  C11D9/02 ,  C11D11/0047 ,  C11D17/0017 ,  C23G1/18 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/02096 ,  H01L21/31133 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T137/4891

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning a semiconductor substrate.SOLUTION: A method for cleaning a substrate is provided. The method starts with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are in contact with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of the solid cleaning element and then the die substrate or the solid cleaning surface is moved relative to each other to clean the surface of the substrate. A method is also provided for cleaning the surface of the substrate with a solid cleaning element that undergoes plastic deformation. Corresponding cleaning apparatus is also provided.

Abstract translation: 要解决的问题：提供一种用于清洁半导体衬底的方法和装置。 提供了一种清洗基板的方法。 该方法开始于将活化溶液施加到基底的表面。 活化溶液和基材的表面与固体清洁表面的表面接触。 活化溶液被吸收到固体清洁元件的一部分中，然后模具基底或固体清洁表面相对于彼此移动以清洁基底的表面。 还提供了一种用于利用经历塑性变形的固体清洁元件来清洁基板的表面的方法。 还提供了相应的清洁装置。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：MY144403A

公开(公告)日：2011-09-15

申请号：MYPI20083826

申请日：2007-03-27

Applicant: LAM RES CORP

Inventor： BOYD JOHN M ,  REDEKER FRITZ C ,  YEZDI DORDI ,  MICHAEL RAVKIN ,  JOHN DE LARIOS

IPC: H01L21/306

Abstract: A PROXIMITY HEAD AND ASSOCIATED METHOD OF USE IS PROVIDED FOR PERFORMING CONFINED AREA PLANARIZATION OF A SEMICONDUCTOR WAFER (223). THE PROXIMITY HEAD INCLUDES A CHAMBER (215) DEFINED TO MAINTAIN AN ELECTROLYTE SOLUTION (211). A CATHODE (213) IS DISPOSED WITHIN THE CHAMBER IN EXPOSURE TO THE ELECTROLYTE SOLUTION. A CATION EXCHANGE MEMBRANE (221) IS DISPOSED OVER A LOWER OPENING OF THE CHAMBER. A TOP SURFACE OF THE CATION EXCHANGE MEMBRANE IS IN DIRECT EXPOSURE TO THE ELECTROLYTE SOLUTION TO BE MAINTAINED WITHIN THE CHAMBER. A FLUID SUPPLY CHANNEL (227) IS DEFINED TO EXPEL FLUID AT A LOCATION ADJACENT TO A LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE. A VACUUM CHANNEL (225) IS DEFINED TO PROVIDE SUCTION AT A LOCATION ADJACENT TO THE LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE, SUCH THAT THE FLUID TO BE EXPELLED FROM THE FLUID SUPPLY CHANNEL IS MADE TO FLOW OVER THE LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE.

公开(公告)号：SG115843A1

公开(公告)日：2005-10-28

申请号：SG200502559

申请日：2005-03-28

Applicant: LAM RES CORP

Inventor： MICHAEL RAVKIN ,  MICHAEL G R SMITH ,  JOHN M DE LARIOS ,  FRITZ REDEKER ,  MIKHAIL KOROLIK ,  CHRISTIAN DIPIETRO

IPC: B08B3/00 ,  B08B3/04 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

Abstract: Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface.

公开(公告)号：SG187413A1

公开(公告)日：2013-02-28

申请号：SG2012096426

申请日：2006-11-29

Applicant: LAM RES CORP

Inventor： ERIK M FREER ,  JOHN M DE LARIOS ,  KATRINA MIKHAYLICHENKO ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  FRED C REDEKER

Abstract: 27A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.Fig. 1

公开(公告)号：MY149895A

公开(公告)日：2013-10-31

申请号：MYPI20082420

申请日：2006-12-18

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  DELARIOS JOHN M ,  KATRINA MIKHAYLICHENKO ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  REDEKER FRITZ C

IPC: B08B3/00

Abstract: A METHOD AND SYSTEM (10) FOR CLEANING A SURFACE, HAVING PARTICULATE MATTER THEREON, OF A SUBSTRATE FEATURES IMPINGING UPON THE SURFACE OF A JET (108) OF A LIQUID HAVING COUPLING ELEMENTS (94) ENTRAINED THEREIN. A SUFFICIENT DRAG FORCE IS IMPARTED UPON THE COUPLING ELEMENTS TO HAVE THE SAME MOVE WITH RESPECT TO THE LIQUID AND CAUSE THE PARTICULATE MATTER TO MOVE WITH RESPECT TO THE SUBSTRATE.

公开(公告)号：MY149848A

公开(公告)日：2013-10-31

申请号：MYPI20082419

申请日：2006-12-18

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  MICHAEL RAVKIN ,  MIKHAIL KOROLIK ,  KATRINA MIKHAYLICHENKO

IPC: B08B3/00

Abstract: A METHOD FOR MAKING A SOLUTION FOR USE IN PREPARING A SURFACE OF A SUBSTRATE IS PROVIDED. THE METHOD INCLUDES PROVIDING (602) A CONTINUOUS MEDIUM THAT ADDS (604) A POLYMER MATERIAL TO THE CONTINUOUS MEDIUM. A FATTY ACID IS ADDED TO THE CONTINUOUS MEDIUM HAVING THE POLYMER MATERIAL, AND THE POLYMER MATERIAL DEFINES A PHYSICAL NETWORK THAT EXERTS FORCES IN THE SOLUTION THAT OVERCOME BUOYANCY FORCES EXPERIENCED BY THE FATTY ACID, THUS PREVENTING THE FATTY ACIDS FROM MOVING WITHIN THE SOLUTION UNTIL A YIELD STRESS OF THE POLYMER MATERIAL IS EXCEED BY AN APPLIED AGITATION. THE APPLIED AGITATION IS FROM TRANSPORTING THE SOLUTION FROM A CONTAINER TO A PREPARATION STATION THAT APPLIES THE SOLUTION TO THE SURFACE OF THE SUBSTRATE.

公开(公告)号：MY147290A

公开(公告)日：2012-11-30

申请号：MYPI20111318

申请日：2007-03-27

Applicant: LAM RES CORP

Inventor： BOYD JOHN M ,  REDEKER FRITZ C ,  YEZDI DORDI ,  MICHAEL RAVKIN ,  JOHN DE LARIOS

IPC: H01L21/302

Abstract: A PROXIMITY HEAD AND ASSOCIATED METHOD OF USE IS PROVIDED FOR PERFORMING CONFINED AREA PLANARIZATION OF A SEMICONDUCTOR WAFER (223). THE PROXIMITY HEAD INCLUDES A CHAMBER (215) DEFINED TO MAINTAIN AN ELECTROLYTE SOLUTION (211). A CATHODE (213) IS DISPOSED WITHIN THE CHAMBER IN EXPOSURE TO THE ELECTROLYTE SOLUTION. A CATION EXCHANGE MEMBRANE (221) IS DISPOSED OVER A LOWER OPENING OF THE CHAMBER. A TOP SURFACE OF THE CATION EXCHANGE MEMBRANE IS IN DIRECT EXPOSURE TO THE ELECTROLYTE SOLUTION TO BE MAINTAINED WITHIN THE CHAMBER. A FLUID SUPPLY CHANNEL (227) IS DEFINED TO EXPEL FLUID AT A LOCATION ADJACENT TO A LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE. A VACUUM CHANNEL (225) IS DEFINED TO PROVIDE SUCTION AT A LOCATION ADJACENT TO THE LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE, SUCH THAT THE FLUID TO BE EXPELLED FROM THE FLUID SUPPLY CHANNEL IS MADE TO FLOW OVER THE LOWER SURFACE OF THE CATION EXCHANGE MEMBRANE.

公开(公告)号：SG118399A1

公开(公告)日：2006-01-27

申请号：SG200503946

申请日：2005-06-20

Applicant: LAM RES CORP

Inventor： SMITH MICHAEL G R ,  MICHAEL RAVKIN ,  O'DONNELL ROBERT J

IPC: F26B5/04 ,  F26B7/00 ,  F26B13/30 ,  H01L21/00

Abstract: Method for processing a substrate is disclosed which includes generating a first fluid meniscus and a second fluid meniscus at least partially surrounding the first fluid meniscus wherein the first fluid meniscus and the second fluid meniscus are generated on a surface of the substrate.