BACKPLANE REINFORCEMENT AND INTERCONNECTS FOR SOLAR CELLS

    公开(公告)号:MY158500A

    公开(公告)日:2016-10-14

    申请号:MYPI2013700332

    申请日:2011-08-05

    Applicant: SOLEXEL INC

    Abstract: FABRICATION METHODS AND STRUCTURES RELATING TO BACKPLANES FOR BACK CONTACT SOLAR CELLS THAT PROVIDE FOR SOLAR CELL SUBSTRATE REINFORCEMENT AND ELECTRICAL INTERCONNECTS ARE DESCRIBED. THE METHOD COMPRISES DEPOSITING AN INTERDIGITATED PATTERN OF BASE ELECTRODES AND EMITTER ELECTRODES ON A BACKSIDE SURFACE OF A SEMICONDUCTOR SUBSTRATE, FORMING ELECTRICALLY CONDUCTIVE EMITTER PLUGS AND BASE PLUGS ON THE INTERDIGITATED PATTERN, AND ATTACHING A BACKPLANE HAVING A SECOND INTERDIGITATED PATTERN OF BASE ELECTRODES AND EMITTER ELECTRODES AT THE CONDUCTIVE EMITTER AND BASE PLUGS TO FORM ELECTRICAL INTERCONNECTS. [FIG. 16A]

    SMART PHOTOVOLTAIC CELLS AND MODULES

    公开(公告)号:MY168146A

    公开(公告)日:2018-10-11

    申请号:MYPI2014701287

    申请日:2012-11-20

    Applicant: SOLEXEL INC

    Abstract: A back contact solar cell with on-cell electronics is provided. The back contact solar cell is comprised of a semiconductor substrate having a light capturing front side and a backside opposite the light capturing front side. A first interdigitated metallization pattern is positioned on the backside of the semiconductor substrate and a backplane supports and is attached to the backside of the semiconductor substrate. A second interdigitated metallization pattern positioned on the backplane and is connected to the first interdigitated metallization pattern. An on-cell electronic component is attached to the second interdigitated metallization pattern and electrical leads connect the on-cell electronic component to the second interdigitated metallization pattern. (The Most Illustrative Drawing: Fig 20)

    HIGH-PRODUCTIVITY POROUS SEMICONDUCTOR MANUFACTURING EQUIPMENT

    公开(公告)号:MY165969A

    公开(公告)日:2018-05-18

    申请号:MYPI2011005354

    申请日:2010-05-05

    Applicant: SOLEXEL INC

    Abstract: THIS DISCLOSURE ENABLES HIGH-PRODUCTIVITY FABRICATION OF SEMICONDUCTOR-BASED SEPARATION LAYERS (MADE OF SINGLE LAYER OR MULTI-LAYER POROUS SEMICONDUCTORS SUCH AS POROUS SILICON, COMPRISING SINGLE POROSITY OR MULTI-POROSITY LAYERS), OPTICAL REFLECTORS (MADE OF MULTI-LAYER/MULTI-POROSITY POROUS SEMICONDUCTORS SUCH AS POROUS SILICON), FORMATION OF POROUS SEMICONDUCTOR (SUCH AS POROUS SILICON) FOR ANTI-REFLECTION COATINGS, PASSIVATION LAYERS, AND MULTI-JUNCTION, MULTI-BAND-GAP SOLAR CELLS (FOR INSTANCE, BY FORMING A VARIABLE BAND GAP POROUS SILICON EMITTER ON A CRYSTALLINE SILICON THIN FILM OR WAFER-BASED SOLAR CELL). OTHER APPLICATIONS INCLUDE FABRICATION OF MEMS SEPARATION AND SACRIFICIAL LAYERS FOR DIE DETACHMENT AND MEMS DEVICE FABRICATION, MEMBRANE FORMATION AND SHALLOW TRENCH ISOLATION (STI) POROUS SILICON (USING POROUS SILICON FORMATION WITH AN OPTIMAL POROSITY AND ITS SUBSEQUENT OXIDATION). FURTHER THE DISCLOSURE IS APPLICABLE TO THE GENERAL FIELDS OF PHOTOVOLTAICS, MEMS, INCLUDING SENSORS AND ACTUATORS, STAND-ALONE, OR INTEGRATED WITH INTEGRATED SEMICONDUCTOR MICROELECTRONICS, SEMICONDUCTOR MICROELECTRONICS CHIPS AND OPTOELECTRONICS.

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