Ⅲ족 질화물 결정의 제조 방법
    25.
    发明公开
    Ⅲ족 질화물 결정의 제조 방법 有权
    生产第三类元素氮化物晶体的方法

    公开(公告)号:KR1020090082367A

    公开(公告)日:2009-07-30

    申请号:KR1020097008369

    申请日:2007-11-14

    Abstract: A process for producing a Group III element nitride crystal (20) having a main plane (20m) orienting in any specific direction other than {0001}. The process comprises: a step in which Group III element nitride crystal substrates (10p) and (10q) respectively having main planes (10pm) and (10qm) orienting in the specific direction are cut out of a Group III element nitride bulk crystal (1); a step in which these substrates (10p) and (10q) are closely arranged side by side so that the main planes (10pm) and (10qm) of these substrates (10p) and (10q) are parallel to each other and their planes facing [0001] are oriented in the same direction; and a step in which a Group III element nitride crystal (20) is grown on the main planes (10pm) and (10qm) of these substrates (10p) and (10q).

    Abstract translation: 制造具有以{0001}以外的特定方向取向的主面(20m)的III族元素氮化物晶体(20)的制造方法。 该方法包括:从III族元素氮化物块状晶体(1)中切出分别具有在特定方向取向的主面(10pm)和(10qm)的III族元素氮化物晶体基板(10p)和(10q)的步骤 ); 这些基板(10p)和(10q)彼此紧密排列的步骤,使得这些基板(10p)和(10q)的主平面(10pm)和(10qm)彼此平行并且其面向 沿同一方向取向; 以及在这些基板(10p)和(10q)的主平面(10μm)和(10qm)上生长III族元素氮化物晶体(20)的工序。

    ⅠⅠⅠ족 질화물 반도체 결정의 성장 방법 및 ⅠⅠⅠ족 질화물 반도체 결정의 성장 장치
    26.
    发明公开
    ⅠⅠⅠ족 질화물 반도체 결정의 성장 방법 및 ⅠⅠⅠ족 질화물 반도체 결정의 성장 장치 有权
    用于III族氮化物半导体晶体生长的III族氮化物半导体晶体和生长装置的方法

    公开(公告)号:KR1020090069241A

    公开(公告)日:2009-06-30

    申请号:KR1020080133364

    申请日:2008-12-24

    CPC classification number: C30B23/005 C30B29/403 Y10T117/10

    Abstract: A method and an apparatus for growing a group III nitride semiconductor crystal are provided to improve a growth speed of the group III nitride semiconductor crystal by growing the group III nitride semiconductor crystal in a chamber including a heat shielding unit. A group III nitride semiconductor crystal growing apparatus(100) includes a chamber(101) and a heating unit(125). The chamber includes a first space, a second space, and a heat shielding unit(110). A raw material(13) including the group III nitride semiconductor is arranged in the first space. The group III nitride semiconductor crystal(15) grows in the second space. The heat shielding unit is positioned between a first space and a second space. The heat shield unit shield heat radiation from the raw material. The heating unit sublimates the material arranged in the first space. The heat emissivity of the heat shield unit is lower than the heat emissivity of the group III nitride semiconductor crystal.

    Abstract translation: 提供了用于生长III族氮化物半导体晶体的方法和装置,以通过在包括热屏蔽单元的室中生长III族氮化物半导体晶体来改善III族氮化物半导体晶体的生长速度。 III族氮化物半导体晶体生长装置(100)包括室(101)和加热单元(125)。 所述室包括第一空间,第二空间和热屏蔽单元(110)。 包括III族氮化物半导体的原料(13)布置在第一空间中。 III族氮化物半导体晶体(15)在第二空间中生长。 隔热单元位于第一空间和第二空间之间。 隔热单元屏蔽来自原材料的热辐射。 加热单元使布置在第一空间中的材料升华。 隔热单元的发热率低于III族氮化物半导体晶体的发热率。

    연료 전지용 복합 재료, 연료 전지용 복합 재료의 제조 방법 및 연료 전지
    28.
    发明授权
    연료 전지용 복합 재료, 연료 전지용 복합 재료의 제조 방법 및 연료 전지 有权
    复合燃料电池,燃料电池的制造方法和复合材料的燃料电池

    公开(公告)号:KR101791442B1

    公开(公告)日:2017-10-30

    申请号:KR1020167000991

    申请日:2014-07-09

    Abstract: 전해질-애노드적층체를동시에소성시킨경우에있어서의고체전해질층의이온전도성능의저하를방지하고, 연료전지의발전성능을높일수 있는연료전지용복합재료를제공한다. 고체전해질층(3)과상기고체전해질층에적층된애노드층(2)을구비하여구성되는연료전지용복합재료(1)로서, 상기고체전해질층은, 페로브스카이트구조(perovskite structure)의 A사이트가, 바륨(Ba)과스트론튬(Sr)의적어도한쪽으로이루짐과함께, B사이트의 4가의양이온의일부를 3가의희토류원소로치환한이온전도체로구성되어있고, 상기애노드층은, 상기고체전해질층과동일조성의전해질성분과, 니켈(Ni) 촉매를포함하여구성되어있음과함께, 적어도고체전해질층과의경계부분, 희토류원소를포함하는첨가물을포함하여구성되어있다.

    Abstract translation: 当阳极被同时烧制层叠体防止在固体电解质层的离子传导性能的劣化,并且提供一种燃料电池,反过来该复合材料,电解质有利于燃料电池的发电性能。 的固体电解质层3和固态作为用于燃料电池的复合材料(1)的电解质层通过具有堆叠阳极层(2)在固体电解质层上具有钙钛矿结构(钙钛矿结构),A配置 站点,钡(Ba)和锶(Sr)与由行李至少一个唯一地在一侧上,由B位中的离子导体的四价阳离子的一部分的由三价稀土元素,其中,所述阳极层,其中,被取代的 与被配置为包括固体电解质层,并且在同一组合物的电解质组分,和镍(Ni)催化剂,并且被配置为包括添加剂,其包含一边界部分稀土类元素和固体电解质层的至少。

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