公开(公告)号：DE60321883D1

公开(公告)日：2008-08-14

申请号：DE60321883

申请日：2003-11-25

Applicant: ASML NETHERLANDS BV

Inventor： LOWISCH MARTIN ,  DIERICHS MARCEL MATHIJS THEODO ,  VAN INGEN SCHENAU KOEN ,  VAN DER LAAN HANS ,  LEENDERS MARTINUS HENDRIKUS AN ,  MCGOO ELAINE ,  MICKAN UWE

IPC: G03F7/20 ,  G03F1/24 ,  G03F7/22 ,  G03F9/02 ,  H01L21/027

Abstract: System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z 5 astigmatism, Z 9 spherical, and Z 12 astigmatism.

公开(公告)号：SG136134A1

公开(公告)日：2007-10-29

申请号：SG2007066608

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  DIERICHS MARCEL MATHIJS THEODO ,  JASPER JOHANNES CHRISTIAAN MAR ,  MEIJER HENDRICUS JOHANNE MARIA ,  MICKAN UWE ,  MULKENS JOHANNES CATHARINUS HU ,  LIPSON MATHEW ,  UITTERDIJK TAMMO ,  BASELMANS JOHANNES JACOBUS MAT

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on the final element 20 of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF 2 is also disclosed.

公开(公告)号：SG129256A1

公开(公告)日：2007-02-26

申请号：SG200304863

申请日：2003-08-27

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO

IPC: G21K5/02 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: Using a sensor 4 to detect luminescent radiation 5 that is radiated from a reflector 3 as a result of state changes induced by a beam of radiation 2 being incident on an area 3a of the reflector 3. The intensity of the luminescent radiation 5 at particular wavelengths can be used to determine the intensity of the beam of radiation 2.

公开(公告)号：SG115597A1

公开(公告)日：2005-10-28

申请号：SG200307727

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS PIETER ,  DIERICHS MARCEL MATHIJS THEODO ,  FRERIKS JOHANNES MARIA ,  SCHUURMANS FRANK JEROEN PIETER ,  VIJFVINKEL JAKOB ,  BOX WILHELMUS JOSEPHUS

IPC: G21K1/00 ,  G03F7/20 ,  G21K3/00 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

公开(公告)号：DE60309238T2

公开(公告)日：2007-06-06

申请号：DE60309238

申请日：2003-03-06

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS FRANCISCUS ANT ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G03F1/00 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027

Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.

公开(公告)号：SG123713A1

公开(公告)日：2006-07-26

申请号：SG200508043

申请日：2005-12-13

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BLEEKER ARNO JAN ,  BASELMANS JOHANNES JACOBUS MAT ,  DIERICHS MARCEL MATHIJS THEODO ,  WAGNER CHRISTIAN ,  RYZHIKOB LEV ,  SMIRNOV STANISLAV Y ,  TROSST KARS ZEGER

Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

公开(公告)号：SG123576A1

公开(公告)日：2006-07-26

申请号：SG200306817

申请日：2003-11-19

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  LOOPSTRA ERIK ROELOF

IPC: G02B5/18 ,  G03F7/11 ,  G03F1/24 ,  G03F7/00 ,  G03F7/20 ,  G03F7/40 ,  G21K1/06 ,  H01L21/027

Abstract: A fabrication technique for manufacturing an optical element is disclosed. It involves selectively plasma etching a multi-layer stack and covering the obtained relief profile with a film, for example a reflective coating.

公开(公告)号：DE60303882D1

公开(公告)日：2006-05-04

申请号：DE60303882

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS PIETER ,  DIERICHS MARCEL MATHIJS THEODO ,  FRERIKS JOHANNES MARIA ,  SCHUURMANS FRANK JEROEN PIETER ,  VIJFVINKEL JAKOB ,  BOX WILHELMUS JOSEPHUS

IPC: G03F7/20 ,  G21K1/00 ,  G21K3/00 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  H05G2/00

Abstract: A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

公开(公告)号：SG115693A1

公开(公告)日：2005-10-28

申请号：SG200402728

申请日：2004-05-17

Applicant: ASML NETHERLANDS BV

Inventor： VAN INGEN SCHENAU KOEN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G03F1/22 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A method for coating a substrate for EUV lithography includes coating a photoresist layer on the substrate. A device manufacturing method using a lithographic projection apparatus includes providing a substrate that is at least partially covered by a photoresist layer by coating the photoresist layer on the substrate and projecting a patterned beam of radiation onto a target portion of the photoresist layer. A substrate includes a photoresist layer.

公开(公告)号：DE60309238D1

公开(公告)日：2006-12-07

申请号：DE60309238

申请日：2003-03-06

Applicant: ASML NETHERLANDS BV

Inventor： EURLINGS MARKUS FRANCISCUS ANT ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  DIERICHS MARCEL MATHIJS THEODO

IPC: G03F1/00 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027

Abstract: A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.