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公开(公告)号：JP2001072716A
公开(公告)日：2001-03-21
申请号：JP2000209354
申请日：2000-07-11
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , ARI AVIRAMU , GUARNIERI C RICHARD , KWONG RANEE W
IPC: G03F7/038 , C08F30/04 , C08F212/04 , C08F220/00 , G03F7/004 , G03F7/027 , G03F7/039 , G03F7/32 , H01L21/312
Abstract: PROBLEM TO BE SOLVED: To provide a composition usable as resist, sensitive to image rendering irradiation, and enhanced in its capability to resist reactive ion etching. SOLUTION: A composition which resists reactive ion etching includes polymerizable organometallic monomer acids or ester polymers. Specifically described, it is a polymer generated to include at least one monomer from the group of organic metal acrylates, organic metal methacrylates, organometallic styrenes, and their mixtures. In this composition, metals are selected from yttrium, aluminum, iron, titanium, zirconium, hafnium, and their mixtures.
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公开(公告)号：JPH10168329A
公开(公告)日：1998-06-23
申请号：JP16405297
申请日：1997-06-20
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , GELORME JEFFREY D , NEWMAN THOMAS H , PATEL NIRANJAN M , SEEGER DAVID E
IPC: C08G61/12 , C08G61/10 , C08G75/02 , C08G75/04 , C08J3/28 , C08L33/00 , C08L33/02 , C08L41/00 , C08L79/00 , C08L101/00 , C08L101/02 , C08L101/12 , G03F7/038 , G03F7/09 , H01B1/12
Abstract: PROBLEM TO BE SOLVED: To obtain a conductive polymer composition containing a specific polyacid and a specific polymer, capable of being cross-linked, improved in solubility in water, and useful for conductive electron beam resists, photoresists, etc. SOLUTION: This water-soluble conductive polymer composition comprises (A) a polyacid having acid groups selected from carboxyl groups, phosphate groups, phosphate groups, borate groups, sulfate groups and sulfonate groups, such as poly(styrenesulfonic acid), and (B) a polymer selected from the (non) substituted homopolymers or (non)substituted copolymers of aniline, thiophene, pyrrole or p-phenylene sulfide, having one or more conjugated parts constituting conjugated basic atom-containing repeating units. Therein, the number of acidic groups in the polyacid is larger than the number of proton-addable basic atoms in the polymer. An aqueous solution containing the composition in a concentration of 5-10wt.% is preferably prepared and further mixed with an oxidizing agent/a polymerization initiator.
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公开(公告)号：JPH1046027A
公开(公告)日：1998-02-17
申请号：JP5912897
申请日：1997-03-13
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , YUN-HSIN LIAO , SARAF RAVI F
Abstract: PROBLEM TO BE SOLVED: To obtain an electroconductive polymer structure having a high degree of crystallinity and to provide a method for producing the same. SOLUTION: This structure containing a polycrystalline material containing microcrystals of an electroconductive polymer and precursor thereof, contains amorphous materials of the polymer and the precursor thereof in mediating regions among the microcrystals. By adding an additive such as a plasticizer and a diluent to a solution for forming a polycrystalline material, a high degree of crystallinity is obtained by giving a high mobility to the polymer molecules for associating each other and producing the polymer under a condition for forming a crystalline state. The form of the polycrystalline material can be adjusted so as to modify the characteristics of the material such as a degree of crystallinity, a size of the crystalline particles, a glass transition temperature, a thermal expansion coefficient and an electroconductivity. As opposed to a stretched film having an anisotropic electroconductivity, the polycrystalline material attains an isotropic and high electroconductivity without getting stretched.
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公开(公告)号：DE69532669D1
公开(公告)日：2004-04-15
申请号：DE69532669
申请日：1995-12-19
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , FURMAN BRUCE K
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公开(公告)号：DE69712959D1
公开(公告)日：2002-07-11
申请号：DE69712959
申请日：1997-03-21
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , YUN-HSIN LIAO , SARAF RAVI F
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Patent Agency Ranking
公开(公告)号：AT477517T
公开(公告)日：2010-08-15
申请号：AT02786917
申请日：2002-12-05
Applicant: IBM
Inventor： HUANG WU-SONG , LI WENJIE , MOREAU WAYNE , MEDEIROS DAVID , PETRILLO KAREN , LANG ROTBERT N , ANGELOPOULOS MARIE
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公开(公告)号：DE69517788D1
公开(公告)日：2000-08-10
申请号：DE69517788
申请日：1995-12-22
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , GELORME JEFFREY DONALD , KUCZYNSKI JOE
IPC: C09J9/02 , H01B1/12 , C09J201/00
Abstract: An electrically conductive pressure sensitive adhesive containing electrically conductive polymers used as an alternative to metallic solder in interconnect electronic applications.
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公开(公告)号：DE69400718D1
公开(公告)日：1996-11-21
申请号：DE69400718
申请日：1994-02-07
Applicant: IBM
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29.发明专利
公开(公告)号：MY125574A
公开(公告)日：2006-08-30
申请号：MYPI9705378
申请日：1997-11-12
Applicant: IBM
Inventor： ANGELOPOULOS MARIE , DIMITRAKOPOULOS CHRISTOS DIMITRIOS , FURMAN BRUCE KENNETH , GRAHAM TERESITA ORDONEZ , LIEN SHUI-CHIH ALAN
IPC: B32B9/04
Abstract: ELECTRONIC DEVICES HAVING PATTERNED ELECTRICALLY CONDUCTIVE POLYMERS PROVIDING ELECTRICAL CONNECTION THERETO AND METHODS OF FABRICATION THEREOF ARE DESCRIBED. LIQUID CRYSTAL DISPLAY CELLS ARE DESCRIBED HAVING AT LEAST ONE OF THE ELECTRODES PROVIDING A BIAS ACROSS THE LIQUID CRYSTAL MATERIAL FORMED FROM A PATTERNED ELECTRICALLY CONDUCTIVE POLYMER (216). THIN FILM TRANSISTORS HAVING PATTERNED ELECTRICALLY CONDUCTIVE POLYMERS AS SOURCE DRAIN AND GATE ELECTRODES (65,106; 66,107;,61, 108) ARE DESCRIBED. LIGHT EMITTING DIODES HAVING ANODE AND COATED REGIONS FORMED FROM PATTERNED ELECTRICALLY CONDUCTIVE POLYMERS ARE DESCRIBED. METHODS OF PATTERNING USING A RESIST MASK; PATTERNING USING A PATTERNED METAL LAYER; PATTERNING THE METAL LAYER USING A RESIST; AND PATTERNING THE ELECTRICALLY CONDUCTIVE POLYMER DIRECTLY TO FORM ELECTRODES AND ANODE AND CATHODE REGIONS (334,340) ARE DESCRIBED.(FIG 12)
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公开(公告)号：DE69400718T2
公开(公告)日：1997-04-03
申请号：DE69400718
申请日：1994-02-07
Applicant: IBM
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