公开(公告)号：EP3040411A4

公开(公告)日：2017-04-19

申请号：EP14839338

申请日：2014-08-06

Applicant: JSR CORP

Inventor： HIEDA KATSUHIKO ,  SHIMOKAWA TSUTOMU ,  KUBO HIROTO ,  DOI TAKASHI

IPC: C12N1/02 ,  C08J5/18 ,  C08K5/23 ,  C08K5/28 ,  C12M1/26 ,  C12N5/07 ,  C12N5/071 ,  C12N5/10 ,  G01N1/04

CPC classification number: C12N1/02 ,  C08J5/18 ,  C08J2333/02 ,  C08K5/235 ,  C08K5/28 ,  C12M23/20 ,  C12M25/06 ,  C12M33/00 ,  C12N5/0625

Abstract: An object of the invention is to provide an adherend recovery method capable of recovering adherends such as cells no matter the types of adherends. [Solution] An adherend recovery method for recovering an adherend from a support includes exposing a stack disposed on the support, the stack including a photosensitive gas generation layer, an adhesive layer and the adherend in this order on the support, generating a gas from the photosensitive gas generation layer by the exposure to separate the support and the stack from each other by the action of the gas, and recovering the adherend from the support by recovering the stack separated.

Abstract translation: 本发明的目的在于提供一种能够回收被粘附物例如细胞的被粘物回收方法，不管被粘物的种类如何。 [解决方案]用于从支撑体回收被粘物的被粘物恢复方法包括：将布置在载体上的堆叠，包括感光气体产生层，粘合剂层和被粘物的叠层暴露在载体上，从而从载体上产生气体 感光气体发生层通过暴露于气体的作用使支撑体和叠层彼此分离，并且通过回收分离的层叠来从支撑体回收被粘物。

公开(公告)号：EP1231205A4

公开(公告)日：2004-05-26

申请号：EP00974921

申请日：2000-11-10

Applicant: JSR CORP

Inventor： WANG YONG ,  MUTSUGA YASUAKI ,  SHIMIZU SHIGEO ,  SHIMOKAWA TSUTOMU ,  KUMANO ATSUSHI

IPC: C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0397 ,  C07C67/343 ,  C07C69/618 ,  C07D309/12 ,  C08F30/02 ,  G03F7/0045 ,  G03F7/039

Abstract: Vinylphenylpropionic acid derivatives; processes for producing the derivatives; polymers of the same; and radiosensitive resin compositions containing the polymers. The above polymers exhibit low radiation absorption and are useful as the resin component of radiosensitive resin compositions particularly suitable for chemically amplified resists. For example, t-butyl 4-vinylphenylpropionate is produced by (1) reacting t-butyl bromoacetate with tri(n-butyl)phosphine to obtain a quaternary phosphonium salt, (2) reacting this salt with a base to obtain a phosphorus ylide, (3) reacting this ylide with 2,4,6-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)methyl-styrene to obtain a quaternary phosphonium salt, and (4) hydrolyzing this salt.

公开(公告)号：EP2048541A4

公开(公告)日：2010-12-01

申请号：EP07791450

申请日：2007-07-27

Applicant: JSR CORP

Inventor： SUGITA HIKARU ,  MATSUMURA NOBUJI ,  SHIMIZU DAISUKE ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/26 ,  G03F7/11 ,  G03F7/38

CPC classification number: G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

公开(公告)号：EP2034364A4

公开(公告)日：2010-12-01

申请号：EP07767364

申请日：2007-06-21

Applicant: JSR CORP

Inventor： SHIMIZU DAISUKE ,  SUGITA HIKARU ,  MATSUMURA NOBUJI ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/26 ,  G03F7/004

CPC classification number: C07D333/18 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

公开(公告)号：EP1235104A4

公开(公告)日：2008-10-01

申请号：EP01958481

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03F7/36 ,  G03H1/02

CPC classification number: C08L83/14 ,  C08L67/00 ,  C08L69/00 ,  C09D183/06 ,  G02B1/045 ,  G02B5/1857 ,  G02B6/124 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0757 ,  C08L2666/02 ,  C08L2666/28

Abstract: A composition having a refractive index sensitively changeable by a radiation which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes the above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated portion and a non-irradiated portion, which leads to the formation of a pattern having regions of different refractive indexes.

公开(公告)号：EP1602975A4

公开(公告)日：2009-12-02

申请号：EP03789633

申请日：2003-12-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  FUJIWARA KOUICHI ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  WANG YONG

IPC: C08F4/00 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

公开(公告)号：EP1350814A4

公开(公告)日：2007-09-19

申请号：EP01270574

申请日：2001-12-06

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

CPC classification number: G03F7/0757 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039

Abstract: A radiation-sensitive composition changing in refractive index which comprises (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensitive decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.

公开(公告)号：EP1398339A4

公开(公告)日：2006-11-29

申请号：EP02722907

申请日：2002-04-30

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU ,  YAMAMOTO MASAFUMI

IPC: C08G77/08 ,  C08G77/22 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  C08L83/08

CPC classification number: G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

Abstract: A polysiloxane resin exhibiting high transparency even at a wavelength of 193nm (particularly 157nm) or below and excellent dry etching resistance, which comprises units represented by the general formula (I) and/or the general formula (II) and has acid−dissociable groups: (I) (II) (wherein R 1 is a fluorinated or fluoroalkylated monovalent aromatic group or a fluorinated or fluoroalkylated monovalent alicyclic group; and R 2 is a monovalent aromatic group described above, a monovalent alicyclic group described above, hydrogen, halogeno, a monovalent hydrocarbon group, haloalkyl, or amino). A radiation−sensitive resin composition excellent in sensitivity and resolution, which comprises (A) the above resin and (B) a radiation−sensitive acid generator.

公开(公告)号：EP2100870A4

公开(公告)日：2011-05-25

申请号：EP08710532

申请日：2008-01-08

Applicant: JSR CORP

Inventor： SHIMIZU DAISUKE ,  MARUYAMA KEN ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: C07C43/23 ,  C07C39/17 ,  C07C69/712 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: C07C39/17 ,  C07C43/23 ,  C07C69/712 ,  G03F7/004 ,  G03F7/0392 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/122

公开(公告)号：EP1736829A4

公开(公告)日：2011-01-05

申请号：EP05730408

申请日：2005-04-13

Applicant: JSR CORP

Inventor： NISHIMURA I ,  CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0757