Manufacturing method of package substrate using electroless nickel plating
    293.
    发明专利
    Manufacturing method of package substrate using electroless nickel plating 审中-公开
    使用电镀镍镀层的封装衬底的制造方法

    公开(公告)号:JP2006093650A

    公开(公告)日:2006-04-06

    申请号:JP2005147102

    申请日:2005-05-19

    Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method of a package substrate which can realize a high density fine circuit pattern by preventing undercut formed by VIA open and flash etching.
    SOLUTION: The method comprises: a stage of manufacturing a base substrate in which an internal layer circuit pattern is formed by a designated masking process; a stage of forming an insulating layer, performing interlayer electrical insulation, on the base substrate; a stage of forming VIA hole performing interlayer electrical conduction with respect to the insulating layer; a stage of forming seed layer on the insulating layer in which the VIA hole has been formed; and a stage of forming an external layer circuit pattern on the seed layer by the designated masking process. The seed layer is partially and selectively processed in the flash etching in order to prevent the undercut occurring in the VIA open and the external layer circuit pattern.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种通过防止由VIA开路和闪光蚀刻形成的底切而实现高密度精细电路图案的封装基板的制造方法。 解决方案:该方法包括:制造其中通过指定的掩蔽处理形成内层电路图案的基底的阶段; 形成绝缘层的阶段,在基底基板上进行层间电绝缘; 形成相对于绝缘层进行层间电导的VIA孔的阶段; 在形成有VIA孔的绝缘层上形成种子层的阶段; 以及通过指定的掩蔽工艺在种子层上形成外部层电路图案的阶段。 在闪光蚀刻中部分地和选择性地处理种子层,以防止在VIA开口和外部层电路图案中发生底切。 版权所有(C)2006,JPO&NCIPI

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