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    LITHOGRAPHIC APPARATUS, RETICLE EXCHANGE UNIT AND DEVICE MANUFACTURING METHOD
    31.
    发明专利
    LITHOGRAPHIC APPARATUS, RETICLE EXCHANGE UNIT AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG144144A1

    公开(公告)日：2008-07-29

    申请号：SG2008043358

    申请日：2005-12-02

    Applicant: ASML NETHERLANDS BV

    Inventor： TEN KATE NICOLAAS

    Abstract: LITHOGRAPHIC APPARATUS, RETICLE EXCHANGE UNIT AND DEVICE MANUFACTURING METHOD A reticle exchange unit for moving a reticle in a lithographic apparatus is disclosed. The surface of the reticle is protected by a pellicle attached thereto by a gas permeable pellicle frame. The reticle exchange unit includes a reticle preparation chamber, a reticle transport unit arranged to cause a plurality of exposed gas permeable parts of the pellicle frame to face an interior of the reticle preparation chamber, and a purge gas pressure and evacuating pressure supply arrangement coupled to the reticle preparation chamber and arranged to provide, alternately, a purge gas pressure and evacuating pressure that is lower than the purge gas pressure to the reticle preparation chamber when the exposed gas permeable parts of the pellicle frame are facing the interior of the reticle preparation chamber, so that gas flows through the pellicle frame, alternately, into and out of a pellicle space between the pellicle and the reticle.

    LITHOGRAPHIC APPARATUS AND COOLING METHOD
    33.
    发明专利
    LITHOGRAPHIC APPARATUS AND COOLING METHOD 未知

    公开(公告)号：SG11201908803XA

    公开(公告)日：2019-10-30

    申请号：SG11201908803X

    申请日：2018-01-31

    Applicant: ASML NETHERLANDS BV

    Inventor： DE VRIES GOSSE ,  TEN KATE NICOLAAS

    IPC: G03F7/20 ,  B01D8/00 ,  F04B37/08

    Abstract: coco co co O C (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 18 October 2018 (18.10.2018) WIP0 I PCT onion °nolo HE imiolonomo oimIE (10) International Publication Number WO 2018/188828 Al (51) International Patent Classification: GO3F 7/20 (2006.01) F04B 37/08 (2006.01) BOLD 8/00 (2006.01) (21) International Application Number: PCT/EP2018/052391 (22) International Filing Date: 31 January 2018 (31.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 17165857.8 11 April 2017 (11.04.2017) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventors: DE VRIES, Gosse, Charles; P.O. Box 324, 5500 AH Veldhoven (NL). TEN KATE, Nicolaas; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: SLENDERS, Peter; P.O. Box 324, 5500 AH Veld- hoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, (54) Title: LITHOGRAPHIC APPARATUS AND COOLING METHOD FIG. 1 (57) : A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component. [Continued on next page] WO 2018/188828 Al MIDEDIMOMMIONE10131MEIMEHMEMIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h))

    36.
    发明专利
    未知

    公开(公告)号：DE602005013145D1

    公开(公告)日：2009-04-23

    申请号：DE602005013145

    申请日：2005-05-23

    Applicant: ASML NETHERLANDS BV

    Inventor： BECKERS MARCEL ,  HULTERMANS RONALD JOHANNES ,  TEN KATE NICOLAAS ,  KEMPER NIOCOLAAS RUDOLF ,  KOPPELAARS NICOLAAS FRANCISCUS ,  SCHOTSMAN JAN-MARIUS ,  VAN DER HAM RONALD ,  UIJTREGT JOHANNES ANTONIUS MARIA MARTINA

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device (1) for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet (1) that has an inner rim (3) at a downstream end of the gas outlet. The inner rim (3) defines a total gas outlet area. The gas outlet is provided with a laminator (4) that has an effective area (A2) out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings (5) and is at least as large as the total gas outlet area.

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