公开(公告)号：AT548679T

公开(公告)日：2012-03-15

申请号：AT09159532

申请日：2009-05-06

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS ,  VERMEULEN JOHANNES ,  DIRECKS DANIEL ,  PHILIPS DANNY ,  VAN PUTTEN ARNOLD

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL2005062A

公开(公告)日：2011-02-15

申请号：NL2005062

申请日：2010-07-09

Applicant: ASML NETHERLANDS BV

Inventor： HOL SVEN ,  EIJK JAN ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  NAAIJKENS GEERT-JAN ,  KESSELS MARIJN ,  HOBBELEN DANIEL GODFRIED EMMA

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2003854A

公开(公告)日：2010-06-23

申请号：NL2003854

申请日：2009-11-24

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES

IPC: G03F9/00

公开(公告)号：NL2003845A

公开(公告)日：2010-06-22

申请号：NL2003845

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES

IPC: G03F9/00