公开(公告)号：EP2309020B1

公开(公告)日：2014-03-05

申请号：EP10178148.2

申请日：2010-09-22

Applicant: FEI COMPANY

Inventor： Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

IPC: C23C14/00 ,  C23C14/04 ,  C23C14/22 ,  C23C14/46 ,  C23C14/54 ,  C23C14/58

CPC classification number: C23C14/0031 ,  C23C14/04 ,  C23C14/048 ,  C23C14/221 ,  C23C14/46 ,  C23C14/54 ,  C23C14/548 ,  C23C14/5846 ,  C23C14/5873

公开(公告)号：EP2284524B1

公开(公告)日：2014-01-15

申请号：EP10171817.9

申请日：2010-08-04

Applicant: FEI Company

Inventor： Toth, Milos ,  Scheinfein, Michael ,  Narum, David ,  Silver, Eric

IPC: G01N23/20 ,  G01N23/225 ,  H01J37/244 ,  H01J37/256

CPC classification number: G01N23/20033 ,  H01J37/244 ,  H01J37/256 ,  H01J2237/2442

公开(公告)号：EP2450935B1

公开(公告)日：2014-01-08

申请号：EP11187989.6

申请日：2011-11-07

Applicant: FEI Company

Inventor： Novak, Libor ,  Uncovsky, Marek ,  Toth, Milos ,  Cafourek, Martin ,  Parker, N. William

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/244

CPC classification number: H01J37/20 ,  H01J37/18 ,  H01J37/244 ,  H01J2237/024 ,  H01J2237/2001 ,  H01J2237/2003 ,  H01J2237/2445

Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.

公开(公告)号：EP2226830B1

公开(公告)日：2014-01-08

申请号：EP10155688.4

申请日：2010-03-05

Applicant: FEI Company

Inventor： Toth, Milos ,  Young, Richard ,  Henstra, Alexander ,  De Jong, Alan ,  Mulders, Johannes

IPC: H01J37/04 ,  H01J37/30 ,  H01J37/302 ,  H01J37/305 ,  B81C99/00

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

公开(公告)号：EP2570519A2

公开(公告)日：2013-03-20

申请号：EP12184772.7

申请日：2012-09-18

Applicant: FEI COMPANY

Inventor： Botman, Aurelien ,  Toth, Milos ,  Randolph, Steven ,  Narum, David

IPC: C25D5/02 ,  C25D5/04 ,  C25D17/00 ,  C25D5/00

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract translation: 电荷转移机制用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改诸如集成电路或微机电系统的小结构。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。

公开(公告)号：EP2226830A2

公开(公告)日：2010-09-08

申请号：EP10155688.4

申请日：2010-03-05

Applicant: FEI Company

Inventor： Toth, Milos ,  Young, Richard ,  Henstra, Alexander ,  De Jong, Alan ,  Mulders, Johannes

IPC: H01J37/04 ,  H01J37/30 ,  H01J37/302

CPC classification number: H01J37/3056 ,  B81C99/0095 ,  H01J37/045 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/04756 ,  H01J2237/2001 ,  H01J2237/24535 ,  H01J2237/30472

Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate (54). The beam (12,13) preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.

Abstract translation: 电子束诱导的与前体气体的化学反应是通过吸附物消耗控制来控制的。 可以通过控制束电流来控制吸附物消耗，优选通过快速消隐光束，以及通过冷却衬底（54）来控制。 梁（12,13）优选地具有低能量以减小相互作用体积。 通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。

公开(公告)号：EP2006249A3

公开(公告)日：2010-06-16

申请号：EP08158646.3

申请日：2008-06-20

Applicant: FEI COMPANY

Inventor： Toth, Milos ,  Smith, Noel

IPC: B81C1/00

CPC classification number: B05C21/005 ,  B81C1/00531 ,  B81C2201/0132 ,  B81C2201/0143 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/3174 ,  H01J2237/31744 ,  H01J2237/31749

Abstract: A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.