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    CHARGED PARTICLE BEAM EMITTING ASSEMBLY
    31.
    发明申请
    CHARGED PARTICLE BEAM EMITTING ASSEMBLY 审中-公开
    充电颗粒光束发射组件

    公开(公告)号：WO9916101A3

    公开(公告)日：1999-06-17

    申请号：PCT/GB9802882

    申请日：1998-09-24

    Applicant: WELDING INST ,  SANDERSON ALLAN

    Inventor： SANDERSON ALLAN

    IPC: H01J37/063 ,  H01J37/065 ,  H01J37/075 ,  H01J37/301

    CPC classification number: H01J37/075 ,  H01J37/063 ,  H01J37/065 ,  H01J37/301 ,  H01J2237/3104

    Abstract: A charged particle emitting assembly comprises an emitter member (5) for emitting charged particles of one polarity. A tubular shield electrode (6) circumferentially surrounds the emitter member and is held in use at the same polarity as the charged particles. A tubular accelerating electrode (7) is positioned substantially coaxially with the shield electrode (6) and is held in use at the opposite polarity to the shield electrode. The arrangement is such that charged particles from the emitter member (5) initially spread laterally outwardly and then are focused into a beam which passes through the tubular accelerating electrode (7).

    Abstract translation: 带电粒子发射组件包括用于发射一个极性的带电粒子的发射器件（5）。 管状屏蔽电极（6）周向地围绕发射器件并且以与带电粒子相同的极性保持在使用中。 管状加速电极（7）与屏蔽电极（6）基本同轴地定位，并以与屏蔽电极相反的极性保持使用。 该布置使得来自发射器件（5）的带电粒子最初横向向外扩展，然后聚焦成穿过管状加速电极（7）的光束。

    Electron gun for electron beam exposure device
    36.
    发明专利
    Electron gun for electron beam exposure device 失效
    电子束曝光装置用电子枪

    公开(公告)号：JPS59196543A

    公开(公告)日：1984-11-07

    申请号：JP7043283

    申请日：1983-04-21

    Applicant: Toshiba Corp

    Inventor： TAKIGAWA TADAHIRO ,  SASAKI ISAO

    IPC: H01J37/06 ,  H01J37/063 ,  H01J37/305 ,  H01L21/027

    CPC classification number: H01J37/063

    Abstract: PURPOSE:To improve brightness and the throughput of an exposure device by accelerating an electron beam from an LaB6 cathode through an anode to which the higher voltage than the required acceleration voltage is applied and decelerating this electron beam through the anode to which required acceleration voltage is applied. CONSTITUTION:A secondary anode 8 is arranged between a first anode 5 and a cathode 1 (and a Wehnelt electrode 4) and a high voltage power supply 9 with the polarity shown in the figure is connected between this anode 8 and the first anode 5. Then the higher acceleration voltage V2 than the voltage V1 of the first anode 5 is applied to the second anode 8 and an electron from an LaB6 cathode 1 is accelerated through the second anode 8 and then this accelerated electron beam is decelerated through the first anode 5. As a result, the brightness of an electron gun is exceedingly increased and the throughput of the electron beam exposure device can be improved.

    Abstract translation: 目的：通过加速来自LaB6阴极的电子束，通过加上比所需的加速电压高的电压的阳极来提高曝光装置的亮度和曝光量，并通过要求加速电压的阳极减速该电子束 应用。 构成：在第一阳极5和阴极1（以及Wehnelt电极4）之间设置次级阳极8，并且在该阳极8和第一阳极5之间连接具有图中所示极性的高压电源9。 然后，比第一阳极5的电压V1高的加速电压V2被施加到第二阳极8，并且来自LaB6阴极1的电子通过第二阳极8被加速，然后该加速电子束通过第一阳极5减速 结果，电子枪的亮度极大地增加，并且可以提高电子束曝光装置的通过量。

    ELECTRON BEAM EMISSION DEVICE
    37.
    发明公开
    ELECTRON BEAM EMISSION DEVICE 审中-公开

    公开(公告)号：EP3193350A4

    公开(公告)日：2018-04-25

    申请号：EP14901416

    申请日：2014-12-19

    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECH

    Inventor： KANG EUN GOO ,  LEE SEOK WOO ,  CHOI HON ZONG

    IPC: H01J29/00 ,  H01J37/063

    CPC classification number: H01J29/84 ,  H01J29/00 ,  H01J29/006 ,  H01J29/04 ,  H01J37/063 ,  H01J2229/0069 ,  H01J2229/4831

    Abstract: The present application relates to an electron beam emission device which is provided with a concave cathode and a holder and may operate more stably and produce a high output by inhibiting the occurrence of an arc, and an exemplary embodiment of the present application discloses an electron beam emission device including: a housing which defines a space in which electron beams are emitted; a cathode which is disposed at one side in the housing, and emits the electrons; an anode which is positioned in the housing so as to be spaced apart from the cathode toward the other side, and accelerates the electrons emitted from the cathode; and an insulation holder which insulates a portion between the cathode and the housing, and fixes the cathode, in which the cathode has a surface which faces the anode and is formed concavely to have a gradient, and a rim of the surface of the cathode, which has the gradient, is formed to be rounded.

    Apparatus for generating a plurality of beamlets
    38.
    发明公开
    Apparatus for generating a plurality of beamlets 审中-公开
    用于生成多个子束的设备

    公开(公告)号：EP2503587A3

    公开(公告)日：2017-08-23

    申请号：EP12172592.3

    申请日：2004-03-10

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Kruit, Pieter

    IPC: H01J37/317 ,  H01J37/063 ,  H01J3/02 ,  H01J37/153 ,  H01J37/12 ,  H01J3/07

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets and a charged particle beam lithography system comprising such an apparatus, said apparatus comprising:
    a charged particle source (1) for generating a diverging charged particle beam;
    a collimating means (4) for collimating said diverging charged particle beam, wherein said collimating means comprises at least one deflector array,
    said deflector array adapted for having a voltage applied to each deflector of said deflector array for deflecting a beamlet (8),

    wherein at least one deflector of said deflector array is adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.

    Abstract translation: 本发明涉及用于产生多个带电粒子小射束的设备和包括这种设备的带电粒子束光刻系统，所述设备包括：用于产生发散带电粒子束的带电粒子源（1） 准直所述发散带电粒子束的准直装置（4），其中所述准直装置包括至少一个偏转器阵列，所述偏转器阵列适于使施加到所述偏转器阵列的每个偏转器上的电压偏转小射束（8），其中 所述偏转器阵列的至少一个偏转器适于确定与其相对于光束的光轴的距离成比例的偏转效应。

    Simplified particle emitter and method of operating thereof
    39.
    发明公开
    Simplified particle emitter and method of operating thereof 有权
    Vereinfachter Partikelemitter und Betriebsverfahrendafür

    公开(公告)号：EP2444990A1

    公开(公告)日：2012-04-25

    申请号：EP10187979.9

    申请日：2010-10-19

    Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

    Inventor： Lanio, Stefan ,  Frosien, Jürgen

    IPC: H01J37/063 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/16

    CPC classification number: H01J37/063 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/06375

    Abstract: An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.

    Abstract translation: 描述了用于沿光轴发射带电粒子束的发射器组件。 发射器组件被容纳在枪室中并且包括具有发射极尖端的发射器，其中发射极尖端位于垂直于光轴的第一平面处，并且其中发射器被配置为偏置到第一电位，提取器具有 开口，其中所述开口位于垂直于所述光轴的第二平面处，并且其中所述提取器构造成被偏置到第二电位，其中所述第二平面具有距离所述第一平面2.25mm及以上的第一距离。

    Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
    40.
    发明公开
    Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus 审中-公开
    Elektronenkanone，Lithographievorrichtung，Artikelherstellungsverfahren undElektronenstrahlgerät

    公开(公告)号：EP2390896A1

    公开(公告)日：2011-11-30

    申请号：EP11167638.3

    申请日：2011-05-26

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Imaoka, Nobuo

    IPC: H01J37/063 ,  H01J37/065 ,  H01J1/02 ,  G03F7/20

    CPC classification number: H01J37/063 ,  H01J1/02 ,  H01J37/065 ,  H01J2237/06308 ,  H01J2237/06316

    Abstract: An electron gun includes a cathode (1), a bias electrode (4a,4b), and an anode (6) disposed along a common axis in order thereof. In the electron gun, an electron emitting surface of the cathode has such an aspherical shape that brightness of a crossover is more uniform than that in a case that both a first region including a point on the axis and a second region located outside the first region have a first radius of curvature.

    Abstract translation: 电子枪包括阴极（1），偏置电极（4a，4b）和阳极（6），其沿着公共轴依次布置。 在电子枪中，阴极的电子发射表面具有这样的非球面形状，使得交叉的亮度比在包括轴上的点的第一区域和位于第一区域之外的第二区域的情况下都更均匀 具有第一曲率半径。

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