公开(公告)号：MY171072A

公开(公告)日：2019-09-24

申请号：MYPI2015000076

申请日：2013-07-12

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  HONCIUC ANDREI ,  PANCERA SABRINA MONTERO ,  BAAN ZOLTAN

Abstract: Aqueous composition for developing photoresists applied to semiconductor substrates, said aqueous composition comprising a quaternary ammonium compound of formula I Wherein a) R1 is selected from a C4 to C30 organic radical of formula -X-CR10R11R12, wherein R10, R11 and R12 are independently selected from a C1 to C20 alkyl and two or three of R10, R11 and R12 may together form a ring system, and R2, R3 and R4 are selected from R1 or a C1 to C10 alkyl, C1 to C10 hydroxyalkyl C1 to C30 aminoalkyl or C1 to C20 alkoxyalkyl, and X is a chemical bond or a C1 to C4 divalent organic radical, or b) R1 and R2 are independently selected from an organic radical of formula Ila or lib wherein Y1 is C4 to C20 alkanediyl, Y2 is a one-, two- or tricyclic C5 to C20 carbocyclic or heterocyclic aromatic system, and R3 and R4 are selected from R1 or a C1 to C10 alkyl, C1 to C10 hydroxyalkyl, C1 to C30 aminoalkyl, or C1 to C20 alkoxyalkyl, and X is a chemical bond or a C1 to C4 divalent organic radical, and X is a chemical bond or a C1 to C4 divalent organic radical, or c) at least two of R1, R2, R3, and R4 together form a saturated mono, bi or tricyclic C5 to C30 organic ring system and the remaining R3 and R4, if any, together form a monocyclic C5 to C30 organic ring system or are selected from a C1 to C10 alkyl, C1 to C10 hydroxyalkyl, C1 to C30 aminoalkyl, or C1 to C20 alkoxyalkyl, and X is a chemical bond or a C1 to C4 divalent organic radical, or d) a combination thereof, and wherein Z is a counter-ion and z is an integer, which is chosen so that the overall bulky quaternary ammonium compound is electrically uncharged.

公开(公告)号：MY163493A

公开(公告)日：2017-09-15

申请号：MYPI2012005247

申请日：2011-07-12

Applicant: BASF SE

Inventor： MELLIES RAIMUND ,  KLIPP ANDREAS

IPC: C11D1/62 ,  C11D1/34 ,  C11D3/06 ,  C11D3/20 ,  C11D3/30 ,  C11D3/34 ,  C11D3/37 ,  C11D11/00

Abstract: AQUEOUS ALKALINE CLEANING COMPOSITION FREE FROM ORGANIC SOLVENTS AND METAL ION-FREE SILICATES, THE SAID COMPOSITIONS COMPRISING (A) A THIOAMINO ACID HAVING AT LEAST ONE PRIMARY AMINO GROUP AND AT LEAST ONE MERCAPTO GROUP, (B) A QUATERNARY AMMONIUM HYDROXIDE, (C) A CHELATING AND/OR CORROSION INHIBITING AGENT SELECTED FROM THE GROUP CONSISTING OF ALIPHATIC AND CYCLOALIPHATIC AMINES HAVING AT LEAST TWO PRIMARY AMINO GROUPS, AND ALIPHATIC AND CYCLOALIPHATIC AMINES HAVING AT LEAST ONE HYDROXY GROUP, (D) A NONIONIC SURFACTANT SELECTED FROM THE GROUP OF ACETYLENIC ALCOHOLS, ALKYLOXYLATED ACETYLENIC ALCOHOLS AND ALKYLOXYLATED SORBITAN MONOCARBOXYLIC ACID MONO ESTERS; THE USE OF THE ALKALINE CLEANING COMPOSITION FOR THE PROCESSING OF SUBSTRATES USEFUL FOR FABRICATING ELECTRICAL AND OPTICAL DEVICES; AND A METHOD FOR PROCESSING SUBSTRATES USEFUL FOR FABRICATING ELECTRICAL AND OPTICAL DEVICES MAKING USE OF THE SAID AQUEOUS ALKALINE CLEANING COMPOSITION.

公开(公告)号：RU2551841C2

公开(公告)日：2015-05-27

申请号：RU2011149552

申请日：2010-04-20

Applicant: BASF SE

Inventor： KLIPP ANDREAS

IPC: G03F7/42 ,  H01L21/02

Abstract: Изобретениеотноситсяк способуизготовленияэлектрическихустройств, содержащемустадии: 1) нанесениеизоляционногодиэлектрическогослоя, состоящегоизпоменьшеймереодногоматериалас низкойилиультранизкойдиэлектрическойпроницаемостью, наповерхностьподложки, 2) нанесениепозитивногоилинегативногослоярезистанаповерхностьизоляционногодиэлектрическогослоя, 3) подверганиеслоярезистаселективномувоздействиюэлектромагнитногоизлученияиликорпускулярногоизлучения, 4) проявлениеселективноподвергнутогоизлучениюслоярезистадляобразованиярисункав резисте, 5) сухоетравлениеизоляционногодиэлектрическогослояс использованиемрисункав резистев качествемаскидляобразованияпроводныхканавоки/илисквозныхотверстий, сообщающихсяс поверхностьюподложки, 6) выборпоменьшеймереодногополярногоорганическогорастворителя (А) изгруппы, состоящейиз: диэтилентриамина, N-метилимидазола, 3-амино-1-пропанола, 5-амино-1-пентанолаи диметилсульфоксида, проявляющегов присутствииот 0,06 до 4 мас. % растворенногогидроксидатетраметиламмония (В), массоваядолякотороговзята, исходяизполноговесасоответствующеготестируемогораствора, постояннуюинтенсивностьудаленияпри 50°C дляполимерногобарьерногопросветляющегослоятолщиной 30 нм, содержащегохромофорныегруппы, поглощающиедальнееУФ-излучение, 7) обеспечениепоменьшеймереоднойкомпозициидляудалениярезиста, несодержащей N-алкилпирролидонаи гидроксиламинаи производныхгидроксиламинаи обладающейдинамическойсдвиговойвязкостьюпри 50°C от 1 до 10 мПа·с, измереннойметодомротационнойвискозиметрии, исодержащей, исхо�

公开(公告)号：SG192847A1

公开(公告)日：2013-09-30

申请号：SG2013062880

申请日：2012-02-29

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  OETTER GUENTER ,  MONTERO PANCERA SABRINA ,  HONCIUC ANDREI ,  BITTNER CHRISTIAN

Abstract: A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.

公开(公告)号：SG175820A1

公开(公告)日：2011-12-29

申请号：SG2011079381

申请日：2010-04-20

Applicant: BASF SE

Inventor： KLIPP ANDREAS

Abstract: A liquid composition free from N-alkylpyrrolidones and hydroxyl amine and its derivatives, having a dynamic shear viscosity at 50°C of from 1 to 10 mPas as measured by rotational viscometry and comprising based on the complete weight of the composition, (A) of from 40 to 99.95% by weight of a polar organic solvent exhibiting in the presence of dissolved tetramethylammonium hydroxide (B) a constant removal rate at 50°C for a 30 nm thick polymeric barrier anti-reflective layer containing deep UV absorbing chromophoric groups, (B) of from 0.05 to

公开(公告)号：SG172360A1

公开(公告)日：2011-08-29

申请号：SG2011046331

申请日：2010-01-06

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  HUNG TING HSU ,  SU KUOCHEN ,  TU SHENG-HUNG

Abstract: The present invention relates to a composition for post chemical-mechanical polishing (CMP) cleaning. The composition is alkaline, which can remove azole-type corrosion inhibitors on the wafer surface after CMP. This composition can effectively remove azole compounds, increase wettability of the Cu surface, and significantly improve the defect removal after CMP.

公开(公告)号：EP2611881A4

公开(公告)日：2017-08-30

申请号：EP11821199

申请日：2011-08-25

Applicant: BASF SE

Inventor： BRAUN SIMON ,  KLIPP ANDREAS ,  RÖGER-GÖPFERT CORNELIA ,  BITTNER CHRISTIAN ,  SHEN MEICHIN ,  LIN CHENGWEI

IPC: C09K13/08 ,  H01L21/302

CPC classification number: H01L21/30604 ,  C09K13/08 ,  H01L21/30608 ,  H01L31/022425 ,  H01L31/02363 ,  H01L31/18 ,  Y02E10/50 ,  Y10T428/24355

公开(公告)号：EP3019569A4

公开(公告)日：2017-05-03

申请号：EP14823844

申请日：2014-07-01

Applicant: BASF SE

Inventor： REICHARDT ROBERT ,  KALLER MARTIN ,  LAUTER MICHAEL ,  LI YUZHUO ,  KLIPP ANDREAS

IPC: C09G1/02 ,  C09G1/00 ,  C09G1/04 ,  H01L21/02 ,  H01L21/321

CPC classification number: C09K3/1463 ,  C09G1/02 ,  H01L21/3212

Abstract: A chemical-mechanical polishing (CMP) composition is provided comprising (A) one or more compounds selected from the group of benzotriazole derivatives which act as corrosion inhibitors and (B) inorganic particles, organic particles, or a composite or mixture thereof. The invention also relates to the use of certain compounds selected from the group of benzotriazole derivatives as corrosion inhibitors, especially for increasing the selectivity of a chemical mechanical polishing (CMP) composition for the removal of tantalum or tantalum nitride from a substrate for the manufacture of a semiconductor device in the presence of copper on said substrate.

Abstract translation: 提供化学机械抛光（CMP）组合物，其包含（A）一种或多种选自苯并三唑衍生物（用作腐蚀抑制剂）和（B）无机颗粒，有机颗粒或其复合物或混合物的化合物。 本发明还涉及选自苯并三唑衍生物的某些化合物作为腐蚀抑制剂的用途，尤其是用于提高化学机械抛光（CMP）组合物用于从基底去除钽或氮化钽的选择性，用于制造 在所述衬底上存在铜的情况下的半导体器件。

公开(公告)号：EP3033408A4

公开(公告)日：2017-04-26

申请号：EP14822568

申请日：2014-07-08

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  HONCIUC ANDREI ,  YANG CHU-YA

IPC: G03F1/68 ,  G03F1/82 ,  G03F7/00 ,  G03F7/32

CPC classification number: G03F1/82 ,  C11D1/004 ,  G03F1/22 ,  G03F1/24 ,  G03F1/68 ,  G03F7/20 ,  G03F7/32

Abstract: The use of surfactants A, a 1% by weight, aqueous solutions of which exhibit a static surface tension

Abstract translation: 使用表面活性剂A（1重量％，其水溶液表现出<25mN / m的静态表面张力），所述表面活性剂A含有至少三个选自三氟甲基，五氟乙基 ，1-七氟丙基，2-七氟丙基和五氟硫烷基，用于清洁具有用于制造半导体基板的图案的光掩模，所述半导体基板包括具有最小线间距尺寸低于60nm的图案。 通过使用包含表面活性剂A的掩模清洁溶液，提高了颗粒去除效率，用于物理力处理的更宽工艺窗口，没有观察到雾霾缺陷，没有水印和没有CD损失。

公开(公告)号：EP2596091A4

公开(公告)日：2017-03-22

申请号：EP11809351

申请日：2011-07-12

Applicant: BASF SE

Inventor： MELLIES RAIMUND ,  KLIPP ANDREAS

IPC: C11D3/30 ,  C11D1/66 ,  C11D1/72 ,  C11D3/00 ,  C11D3/34 ,  C11D11/00 ,  H01L21/02 ,  H05K3/26

CPC classification number: C11D3/349 ,  C11D1/345 ,  C11D1/66 ,  C11D1/667 ,  C11D1/72 ,  C11D3/0073 ,  C11D3/06 ,  C11D3/2068 ,  C11D3/2086 ,  C11D3/30 ,  C11D3/3757 ,  C11D3/378 ,  C11D11/0017 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/0064 ,  H01L21/02074 ,  H05K3/1208 ,  H05K2203/0793

Abstract: Aqueous alkaline composition free from organic solvents and metal ion-free silicates, the said compositions comprising (A) a thioamino acid having at least one primary amino group and at least one mercapto group, (B) a quaternary ammonium hydroxide, (C) a chelating and/or corrosion inhibiting agent selected from the group consisting of aliphatic and cycloaliphatic amines having at least two primary amino groups, and aliphatic and cycloaliphatic amines having at least one hydroxy group, (D) a nonionic surfactant selected from the group of acetylenic alcohols, alkyloxylated acetylenic alcohols and alkyloxylated sorbitan monocarboxylic acid mono esters; the use of the alkaline composition for the processing of substrates useful for fabricating electrical and optical devices; and a method for processing substrates useful for fabricating electrical and optical devices making use of the said aqueous alkaline composition.