Abstract:
PROBLEM TO BE SOLVED: To reduce a time required for copying of a storage device by specifying a block that is not a copying target and not performing the copying when copying data recorded in the storage device in block units. SOLUTION: This copying device copies the data recorded in the storage device that is a copying source to a storage device that is a copying destination in the block units. The copying device has: an out-of-target block identification information acquisition part for acquiring out-of-target block identification information for identifying a block recording contents of an out-of-target file that is not the copying target among files recorded in the storage device that is the copying source; and a target block copying part for copying each of a plurality of blocks of the storage device that is the copying source to the storage device that is the copying destination under the condition that block identification information about the block does not coincide with the out-of-target block identification information. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a copolymer to be used in a photoresist composition for lithography, particularly a chemical amplification photoresist. SOLUTION: The copolymer is preferably substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength shorter than 250 nm, including 157 nm, 193 nm and 248 nm radiation and has improved sensitivity and resolution. In one embodiment, the copolymer is composed of an α-cyano or an α-trifluoro-methacrylate monomer unit and a vinyl ether monomer unit. A lithographic photoresist composition containing the fluorinated copolymer is also provided, as is a process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a clustering system with improved processing efficiency by eliminating, transfer of management data for fail over among the respective server machines. SOLUTION: The respective server machines 11 to 14 are provided with management data storage parts 60 to 61 to store the management data of processings to be executed in the server machines, batteries 70 to 73 to supply power to interface parts 50 to 53 to electrically and mechanically connect at least the management data storage parts 60 to 61 and the server machines with a communication line 110 when a fault occurs in the server machines, the interface parts 50 to 53 to receive power supply by a battery in the first server machine transfer the management data read from the management data storage parts 60 to 61 to a second server machine and continues service to a client based on the management data received by the second server machine when the fault occurs in a first server machine among the respective server machines.
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which forms a resist structure having high resolution and excellent in etching resistance by imaging with radiation of 193 nm and development. SOLUTION: The acid catalyst type positive resist composition contains a combination of (a) an imaging polymer containing a monomer selected from the group comprising cycloolefins, acrylates and methacrylates, (b) a radiation sensitive acid generating agent and (c) a bulky anhydride additive. The imaging polymer is preferably a cycloolefin polymer.
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition which is imaged with 193 nm radiation and developed to form a resist structure having high resolution and excellent etching resistance. SOLUTION: The acid catalyst type positive type resist composition contains a combination of (a) an imaging polymer containing a monomer selected from the group comprising cycloolefins, acrylates and methacrylates, (b) a radiation sensitive acid generating agent and (c) a lactone additive. The lactone additive preferably contains at least 10 carbon atoms and more preferably contains at least one saturated alicyclic moiety. The imaging polymer is preferably a cycloolefin polymer.
Abstract:
PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation, having excellent basic properties as a resist, e.g. sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a structure of formula (1) (where R1 is H, a monovalent acid dissociable group, an alkyl having no acid dissociable group or an alkylcarbonyl having no acid dissociable group; X1 is a 1-4C linear or branched fluoroalkyl; and R2 is H, a linear or branched alkyl or a linear or branched fluoroalkyl) and (B) a radiation sensitive acid generating agent.
Abstract:
PROBLEM TO BE SOLVED: To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development. SOLUTION: The photoresist composition comprises a combination of a cyclic olefin polymer, a photosensitive acid-generating agent and a substantially transparent bulky hydrophobic additive. The cyclic olefin polymer contains a cyclic olefin unit having a polar functional group which promotes dissolution in an aqueous alkali solution and the cyclic olefin unit having an acid-labile group which inhibits the dissolution in the aqueous alkali solution. The hydrophobic additive is selected from the group comprising a saturated steroid compound, a non-steroid cycloaliphatic compound and a non-steroid polycycloaliphatic compound having an acid-labile bond.
Abstract:
PROBLEM TO BE SOLVED: To maintain computer security by using plural passwords and to make passwords easy to memorize and hard to be stolen. SOLUTION: When a computer is actuated, a password input part 26 displays a password input image. A password management part 24 selects one password Sc that index data 1c indicates out of set ciphered passwords Sc1 to ScN. When a user inputs a password PW, a ciphering part 22 ciphers the inputted password PW by a hash function h(x), etc., to generate a ciphered password S1. A password comparison and authentication part 28 compares the ciphered passwords Se and S1 and authenticates the user when the both match each other. The password management part 24 sets the value of the index data Ic to (IemodNmnx+1) according to the authentication of the password and makes the set ciphered passwords Se1 to SeN cyclically effective.
Abstract:
PURPOSE: To display an image of constant quality in a liquid crystal display device independently of dispersion of the capacity characteristic of a liquid crystal display device and the signal condition for displaying image. CONSTITUTION: Signal J1, J2, J3 are input from a system 44 to a gate timing control circuit 50 of a driving circuit 42. The signal J1, J2, which are previously stored in the timing control circuit 50, include the information for selecting any one of plural data, which show each different timing for turning on and off a gate line 28 of a LCD 10, and the timing control circuit 50 selects any one of the plural data on the basis of the signal J1, J2, and generates the gate line control signal YOE on the basis of the selected data, and output this signal to a gate line driver 30. The gate line driver 30 drives the gate line 28 in a timing based on the gate line control signal YOE.
Abstract:
PROBLEM TO BE SOLVED: To provide a novel radiation sensitive resin composition having high transparency to radiation, excellent basic physical properties for a resist pattern such as in sensitivity, resolution, and pattern shapes, without causing development defects during fine machining, to manufacture semiconductor elements at a high yield. SOLUTION: The radiation-sensitive resin compositions comprises (A) a resin containing an acid dissociable group obtained by the open ring polymerization of the norbornene derivative having a structure shown by the following general formula (1), and (B) a radiation-sensitive acid generator. In the general formula (1), R 1 represents a hydrogen atom and a univalent acid dissociation group, X 1 a low-grade fluorinated alkyl group, and R 2 a hydrogen atom, an alkyl group or a fluorinated alkyl group. COPYRIGHT: (C)2011,JPO&INPIT