61.
    发明专利
    未知

    公开(公告)号:DE4427630A1

    公开(公告)日:1996-02-08

    申请号:DE4427630

    申请日:1994-08-04

    Applicant: BASF AG

    Abstract: A process is disclosed for preparing polymers with hydroxamic acid, hydroxamic acid ether and/or hydrazide groups in the side chain, by reacting (a) polymers which contain ester, amide, imide and/or acetal groups in the main chain and carboxyl, ester, imide, amide and/or anhydride groups and/or halogen as side chain, or a polysuccinimide with (b) hydroxylamine, hydroxylamine alkyl ethers with 1 to 18 C atoms in the alkyl group, N-monoalkylhydroxylamines with 1 to 18 C atoms in the alkyl group and/or in salts of said compounds and/or (c) hydrazine and/or hydrazine salts in an aqueous medium or alcohols at pH values of at least 7. Also disclosed is the use of the thus obtained modified polymers as additives to washing and cleaning agents, as complexing agents for alkaline earth and heavy metal ions, as pigment dispersants and as scale inhibitors.

    64.
    发明专利
    未知

    公开(公告)号:DE58908529D1

    公开(公告)日:1994-11-24

    申请号:DE58908529

    申请日:1989-11-06

    Applicant: BASF AG

    Abstract: The use of copolymers which contain as essential copolymerised units (a) 50 to 99 mol% of units of monoethylenically unsaturated (a) C3- to C8-monocarboxylic acids, monoethylenically unsaturated C4- to C8-dicarboxylic acids, hemiesters of monoethylenically unsaturated C4- to C8-dicarboxylic acids, esters of monoethylenically unsaturated C3- to C8-carboxylic acids, C2- to C30-olefins, styrene, C1- to C3-alkylstyrenes, C1- to C28-alkyl vinyl ethers, vinyl esters of saturated C1- to C8- carboxylic acids or mixtures of units of these monomers and (b) 50 to 1 mol% of units of amides of monoethylenically unsaturated C3- to C8-carboxylic acids with amide groups of the structure … … in which R = C8- to C28- alkyl, … … R , R = H, CH3, C2H5 R = C1- to C28-alkyl, n = 2 to 100 and R = H, R have K values of 8 to 200, or of salts of these copolymers, as additive to liquid detergent compositions in an amount of 0.1 to 20% by weight and aqueous liquid detergent compositions which contain these copolymers.

    67.
    发明专利
    未知

    公开(公告)号:DE4242194A1

    公开(公告)日:1994-06-16

    申请号:DE4242194

    申请日:1992-12-15

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

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