公开(公告)号：US20230352265A1

公开(公告)日：2023-11-02

申请号：US18345618

申请日：2023-06-30

Applicant: Axcelis Technologies, Inc.

Inventor： Neil K. Colvin ,  Neil Bassom ,  Edward Moore

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01J2237/05

Abstract: An ion implantation system, ion source, and method are provided having a gaseous aluminum-based ion source material. The gaseous aluminum-based ion source material can be, or include, dimethylaluminum chloride (DMAC), where the DMAC is a liquid that transitions into vapor phase at room temperature. An ion source receives and ionizes the gaseous aluminum-based ion source material to form an ion beam. A low-pressure gas bottle supplies the DMAC as a gas to an arc chamber of the ion source by a primary gas line. A separate, secondary gas line supplies a co-gas, such as a fluorine-containing molecule, to the ion source, where the co-gas and DMAC reduce an energetic carbon cross-contamination and/or increase doubly charged aluminum.

公开(公告)号：US20230170176A1

公开(公告)日：2023-06-01

申请号：US17921587

申请日：2021-04-28

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE PARIS-SACLAY

Inventor： Daniel COMPARAT ,  Nicholas BARRETT ,  Lionel AMIAUD ,  Yan PICARD ,  Anne LAFOSSE ,  Raphaël HAHN ,  Olena FEDCHENKO ,  Gerd SCHOENHENSE

IPC: H01J37/06 ,  H01J37/26 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/06 ,  H01J37/26 ,  H01J37/244 ,  H01J37/22 ,  H01J2237/24475 ,  H01J2237/05 ,  H01J2237/083

Abstract: A system for performing surface analysis on a material, includes a pulsed electron source that forms a monochromatic beam of incident electrons; means for conveying the incident electrons to the surface of a sample of material, so as to form backscattered electrons, and the backscattered electrons to detecting means, the conveying means comprising at least one electron optical system; means for detecting the backscattered electrons; the pulsed electron source comprising: a source of atoms; a continuous-wave laser beam configured to form a laser excitation zone able to excite the atoms to Rydberg states; a pulsed electric field on either side of the laser excitation zone, the pulsed electric field being configured to ionize at least the excited atoms and to form a monochromatic beam of electrons.

公开(公告)号：US20170207059A1

公开(公告)日：2017-07-20

申请号：US15411194

申请日：2017-01-20

Applicant: Gatan, Inc.

Inventor： Colin Trevor ,  Matthew Lent ,  Alexander Jozef Gubbens ,  Edward James ,  Ray Dudley Twesten ,  Roice Joseph ,  SanJay Parekh ,  Thomas Sha

IPC: H01J37/05 ,  H01J37/244 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/05 ,  H01J2237/057 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/2802

Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

公开(公告)号：US08598526B2

公开(公告)日：2013-12-03

申请号：US13036757

申请日：2011-02-28

Applicant: Gerd Benner

Inventor： Gerd Benner

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J2237/0492 ,  H01J2237/05 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: A transmission electron microscope in which a sample is positioned in a sample plane 9b comprises an objective lens 11b, a first projection lens system 61b having plural lenses, a second projection lens 63b system having plural lenses, and an analyzing system.The sample plane 9b is imaged into an intermediate image plane 71, a diffraction plane 15b of the objective lens 11b is imaged into an intermediate diffraction plane 67b, and either a) the intermediate image plane is imaged into an entrance image plane of the analyzing system and the intermediate diffraction plane is imaged into an entrance pupil plane of the analyzing system, or b) the intermediate image plane 71 is imaged into the entrance pupil plane 65b and the intermediate diffraction plane 67b is imaged into the entrance image plane 21b.

Abstract translation: 样品位于样品平面9b中的透射电子显微镜包括物镜11b，具有多个透镜的第一投影透镜系统61b，具有多个透镜的第二投影透镜63b系统和分析系统。 将样品平面9b成像为中间像面71，将物镜11b的衍射面15b成像为中间衍射面67b，将中间像平面成像为分析系统的入射像面 中间衍射面成像为分析系统的入射光瞳面，或者b）将中间像面71成像为入射光瞳面65b，将中间衍射面67b成像为入射像面21b。

公开(公告)号：US08592762B2

公开(公告)日：2013-11-26

申请号：US13096865

申请日：2011-04-28

Applicant: Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

Inventor： Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

IPC: H01J37/26

CPC classification number: H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/05 ,  H01J2237/221 ,  H01J2237/2446

Abstract: A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the center of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.

Abstract translation: 在TEM中使用直接电子检测器的方法，其中具有高强度峰的图像，例如衍射图或EELS光谱，在所述检测器上成像。 众所周知，高强度峰值可能会损坏检测器。 为了避免这种损伤，图像的中心被移动，结果是检测器的一个位置没有暴露于高强度，但是高强度被污染在检测器上，在损坏结果之前移位高强度峰值。

公开(公告)号：US20130277548A1

公开(公告)日：2013-10-24

申请号：US13851731

申请日：2013-03-27

Applicant: Micromass UK Limited

Inventor： Emmanuelle Claude ,  Mark W. Towers ,  Kieran Neeson ,  Richard Denny ,  Jeffery M. Brown ,  Paul Murray ,  Mark McDowall

IPC: H01J49/00 ,  H01J49/26

CPC classification number: H01J49/0031 ,  G01N27/622 ,  H01J49/0027 ,  H01J49/0036 ,  H01J49/004 ,  H01J49/005 ,  H01J49/26 ,  H01J49/40 ,  H01J49/446 ,  H01J2237/05

Abstract: The present invention relates to a method of mass spectrometry, an apparatus adapted to perform the method and a mass spectrometer. More particularly, but not exclusively, the present invention relates to a method of mass spectrometry comprising the step of associating parent and fragmentation ions from a sample by measuring the parent and fragmentation ions from two or more different areas of the sample and identifying changes in the number of parent ions between the areas in the sample, and corresponding changes in the number of fragmentation ions between the two areas.

公开(公告)号：US08481931B2

公开(公告)日：2013-07-09

申请号：US12482577

申请日：2009-06-11

Applicant: Simon Page

Inventor： Simon Page

IPC: G21K5/00 ,  H01J37/26

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract translation: 本发明提供了一种包括用于照射样品的高能粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子能谱装置（12） 用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。 在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。 气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。

公开(公告)号：US20110266439A1

公开(公告)日：2011-11-03

申请号：US13096865

申请日：2011-04-28

Applicant: Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

Inventor： Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

IPC: H01J37/295

CPC classification number: H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/05 ,  H01J2237/221 ,  H01J2237/2446

Abstract: A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.

Abstract translation: 在TEM中使用直接电子检测器的方法，其中具有高强度峰的图像，例如衍射图或EELS光谱，在所述检测器上成像。 众所周知，高强度峰值可能会损坏检测器。 为了避免这种损伤，图像的中心被移动，结果是检测器的一个位置没有暴露于高强度，但是高强度被污染在检测器上，在损坏结果之前移位高强度峰值。

公开(公告)号：US07994488B2

公开(公告)日：2011-08-09

申请号：US12108890

申请日：2008-04-24

Applicant: Yongzhang Huang

Inventor： Yongzhang Huang

IPC: G21K1/00

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/3007 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/24528

Abstract: An ion implantation system comprising an ion source that generates an ion beam along a beam path, a mass analyzer component downstream of the ion source that performs mass analysis and angle correction on the ion beam, a resolving aperture electrode comprising at least one electrode downstream of the mass analyzer component and along the beam path having a size and shape according to a selected mass resolution and a beam envelope, a deflection element downstream of the resolving aperture electrode that changes the path of the ion beam exiting the deflection element, a deceleration electrode downstream of the deflection element that decelerates the ion beam, a support platform within an end station for retaining and positioning a workpiece which is implanted with charged ions, and wherein the end station is mounted approximately eight degrees counterclockwise so that the deflected ion beam is perpendicular to the workpiece.

Abstract translation: 一种离子注入系统，包括沿光束路径产生离子束的离子源，离子源下游的质量分析器组件，其对离子束执行质量分析和角度校正;分辨孔径电极，包括至少一个电极 所述质量分析器部件并且沿着所述光束路径具有根据所选择的质量分辨率和光束包络的尺寸和形状;在所述分辨孔径电极下游的偏转元件改变离开偏转元件的离子束的路径;减速电极 在偏转元件的下游，使离子束减速，在终端站内的支撑平台，用于保持和定位植入有带电离子的工件，并且其中终端站逆时针安装大约八度，使得偏转的离子束垂直 到工件。

公开(公告)号：US07728312B2

公开(公告)日：2010-06-01

申请号：US11957914

申请日：2007-12-17

Applicant: Kyong Bong Rouh ,  Dong Seok Kim

Inventor： Kyong Bong Rouh ,  Dong Seok Kim

IPC: H01J37/317 ,  H01J37/08 ,  G21K5/10

CPC classification number: H01J37/3171 ,  H01J37/3172 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/05 ,  H01L21/26513

Abstract: An apparatus and method for partial ion implantation, which desirably provide control over the energy of the implanted dopants, generally includes an ion beam generator, and first and second deceleration units. The first deceleration unit decelerates the energy of an ion beam generated by the ion beam generator; and a subsequent, second deceleration unit further decelerates the energy into different energy levels according to regions of a wafer into which the ions are to be implanted.

Abstract translation: 用于部分离子注入的装置和方法，其期望地提供对注入的掺杂剂的能量的控制，通常包括离子束发生器以及第一和第二减速单元。 第一减速单元减速由离子束发生器产生的离子束的能量; 并且随后的第二减速单元根据要离子注入的晶片的区域进一步将能量减速到不同的能级。